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Class Information
Number: 204/298.37
Name: Chemistry: electrical and wave energy > Apparatus > Coating, forming or etching by sputtering > Etching > Magnetically enhanced
Description: Apparatus including means for magnetic enhancement of workpiece sputtering, plasma shaping or confinement, or control of etching parameters.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7556718 |
Highly ionized PVD with moving magnetic field envelope for uniform coverage of feature structure and wafer |
Jul. 7, 2009 |
| 7327089 |
Beam plasma source |
Feb. 5, 2008 |
| 7320331 |
In-situ plasma cleaning device for cylindrical surfaces |
Jan. 22, 2008 |
| 7118992 |
Wafer thinning using magnetic mirror plasma |
Oct. 10, 2006 |
| 7052583 |
Magnetron cathode and magnetron sputtering apparatus comprising the same |
May. 30, 2006 |
| 7015413 |
Plasma generation system having a refractor |
Mar. 21, 2006 |
| 6988306 |
High purity ferromagnetic sputter target, assembly and method of manufacturing same |
Jan. 24, 2006 |
| 6951821 |
Processing system and method for chemically treating a substrate |
Oct. 4, 2005 |
| 6949174 |
Milling apparatus |
Sep. 27, 2005 |
| 6937127 |
Apparatus for manipulating magnetic fields |
Aug. 30, 2005 |
| 6927358 |
Vacuum seal protection in a dielectric break |
Aug. 9, 2005 |
| 6903511 |
Generation of uniformly-distributed plasma |
Jun. 7, 2005 |
| 6896775 |
High-power pulsed magnetically enhanced plasma processing |
May. 24, 2005 |
| 6864773 |
Variable field magnet apparatus |
Mar. 8, 2005 |
| 6825437 |
Apparatus enabling particle detection utilizing wide view lens |
Nov. 30, 2004 |
| 6805779 |
Plasma generation using multi-step ionization |
Oct. 19, 2004 |
| 6773558 |
Fluorine generator |
Aug. 10, 2004 |
| 6767436 |
Method and apparatus of plasma-enhanced coaxial magnetron for sputter-coating interior surfaces |
Jul. 27, 2004 |
| 6764575 |
Magnetron plasma processing apparatus |
Jul. 20, 2004 |
| 6551445 |
Plasma processing system and method for manufacturing a semiconductor device by using the same |
Apr. 22, 2003 |
| 6524448 |
Configuration for the execution of a plasma based sputter process |
Feb. 25, 2003 |
| 6521082 |
Magnetically enhanced plasma apparatus and method with enhanced plasma uniformity and enhanced ion energy control |
Feb. 18, 2003 |
| 6514377 |
Apparatus for and method of processing an object to be processed |
Feb. 4, 2003 |
| 6475333 |
Discharge plasma processing device |
Nov. 5, 2002 |
| 6454898 |
Inductively coupled RF Plasma reactor having an overhead solenoidal antenna and modular confinement magnet liners |
Sep. 24, 2002 |
| 6422172 |
Plasma processing apparatus and plasma processing method |
Jul. 23, 2002 |
| 6396024 |
Permanent magnet ECR plasma source with integrated multipolar magnetic confinement |
May. 28, 2002 |
| 6392350 |
Plasma processing method |
May. 21, 2002 |
| 6380684 |
Plasma generating apparatus and semiconductor manufacturing method |
Apr. 30, 2002 |
| 6375860 |
Controlled potential plasma source |
Apr. 23, 2002 |
| 6354240 |
Plasma etch reactor having a plurality of magnets |
Mar. 12, 2002 |
| 6332947 |
Plasma processing apparatus and plasma processing method using the same |
Dec. 25, 2001 |
| 6322661 |
Method and apparatus for controlling the volume of a plasma |
Nov. 27, 2001 |
| 6267075 |
Apparatus for cleaning items using gas plasma |
Jul. 31, 2001 |
| 6261428 |
Magnetron plasma process apparatus |
Jul. 17, 2001 |
| 6248219 |
Process and apparatus for sputter etching or sputter coating |
Jun. 19, 2001 |
| 6228236 |
Sputter magnetron having two rotation diameters |
May. 8, 2001 |
| 6197151 |
Plasma processing apparatus and plasma processing method |
Mar. 6, 2001 |
| 6194680 |
Microwave plasma processing method |
Feb. 27, 2001 |
| 6116186 |
Apparatus for cooling a plasma generator |
Sep. 12, 2000 |
| 6110395 |
Method and structure for controlling plasma uniformity |
Aug. 29, 2000 |
| 6085688 |
Method and apparatus for improving processing and reducing charge damage in an inductively coupled plasma reactor |
Jul. 11, 2000 |
| 6076484 |
Apparatus and method for microwave plasma process |
Jun. 20, 2000 |
| 6074512 |
Inductively coupled RF plasma reactor having an overhead solenoidal antenna and modular confinement magnet liners |
Jun. 13, 2000 |
| 6066241 |
Pickling (etching) process and device |
May. 23, 2000 |
| 6042707 |
Multiple-coil electromagnet for magnetically orienting thin films |
Mar. 28, 2000 |
| 6040547 |
Gas discharge device |
Mar. 21, 2000 |
| 6034346 |
Method and apparatus for plasma processing apparatus |
Mar. 7, 2000 |
| 6030486 |
Magnetically confined plasma reactor for processing a semiconductor wafer |
Feb. 29, 2000 |
| 6028286 |
Method for igniting a plasma inside a plasma processing reactor |
Feb. 22, 2000 |
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