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Class Information
Number: 204/298.34
Name: Chemistry: electrical and wave energy > Apparatus > Coating, forming or etching by sputtering > Etching > Auxiliary electrode, bias means or specified power supply
Description: Apparatus including electrode means in addition to an anode and cathode (e.g., auxiliary electrode, etc.), workpiece biasing means, or significant specified power supply means.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7422664 |
Method for plasma ignition |
Sep. 9, 2008 |
| 7413639 |
Energy and media connection for a coating installation comprising several chambers |
Aug. 19, 2008 |
| 7316764 |
System and method for performing sputter etching using independent ion and electron sources and a substrate biased with an a-symmetric bi-polar DC pulse signal |
Jan. 8, 2008 |
| 7294283 |
Penning discharge plasma source |
Nov. 13, 2007 |
| 7288173 |
Ion beam processing system and ion beam processing method |
Oct. 30, 2007 |
| 7276140 |
Plasma accelerating apparatus for semiconductor substrate processing and plasma processing system having the same |
Oct. 2, 2007 |
| 7270729 |
System for, and method of, etching a surface on a wafer |
Sep. 18, 2007 |
| 7256134 |
Selective etching of carbon-doped low-k dielectrics |
Aug. 14, 2007 |
| 7104217 |
Plasma processing apparatus |
Sep. 12, 2006 |
| 7084369 |
Harmonic multiplexer |
Aug. 1, 2006 |
| 6991701 |
Plasma treatment method and apparatus |
Jan. 31, 2006 |
| 6951821 |
Processing system and method for chemically treating a substrate |
Oct. 4, 2005 |
| 6949174 |
Milling apparatus |
Sep. 27, 2005 |
| 6896775 |
High-power pulsed magnetically enhanced plasma processing |
May. 24, 2005 |
| 6887317 |
Reduced friction lift pin |
May. 3, 2005 |
| 6777881 |
Power supply apparatus for generating plasma |
Aug. 17, 2004 |
| 6773558 |
Fluorine generator |
Aug. 10, 2004 |
| 6756737 |
Plasma processing apparatus and method |
Jun. 29, 2004 |
| 6740207 |
Electric supply unit and method for reducing arcing during sputtering |
May. 25, 2004 |
| 6736931 |
Inductively coupled RF plasma reactor and plasma chamber enclosure structure therefor |
May. 18, 2004 |
| 6679981 |
Inductive plasma loop enhancing magnetron sputtering |
Jan. 20, 2004 |
| 6631336 |
Nondestructive method of quality control of high-voltage systems and device for use of the method |
Oct. 7, 2003 |
| 6562190 |
System, apparatus, and method for processing wafer using single frequency RF power in plasma processing chamber |
May. 13, 2003 |
| 6554979 |
Method and apparatus for bias deposition in a modulating electric field |
Apr. 29, 2003 |
| 6511575 |
Treatment apparatus and method utilizing negative hydrogen ion |
Jan. 28, 2003 |
| 6454898 |
Inductively coupled RF Plasma reactor having an overhead solenoidal antenna and modular confinement magnet liners |
Sep. 24, 2002 |
| 6444085 |
Inductively coupled RF plasma reactor having an antenna adjacent a window electrode |
Sep. 3, 2002 |
| 6436253 |
Sputter etching chamber with improved uniformity |
Aug. 20, 2002 |
| 6432260 |
Inductively coupled ring-plasma source apparatus for processing gases and materials and method thereof |
Aug. 13, 2002 |
| 6422172 |
Plasma processing apparatus and plasma processing method |
Jul. 23, 2002 |
| 6395157 |
Method and apparatus for sputter etch conditioning a ceramic body |
May. 28, 2002 |
| 6390020 |
Dual face shower head magnetron, plasma generating apparatus and method of coating substrate |
May. 21, 2002 |
| 6388382 |
Plasma processing apparatus and method |
May. 14, 2002 |
| 6375860 |
Controlled potential plasma source |
Apr. 23, 2002 |
| 6364958 |
Plasma assisted semiconductor substrate processing chamber having a plurality of ground path bridges |
Apr. 2, 2002 |
| 6361645 |
Method and device for compensating wafer bias in a plasma processing chamber |
Mar. 26, 2002 |
| 6345588 |
Use of variable RF generator to control coil voltage distribution |
Feb. 12, 2002 |
| 6312569 |
Chemical vapor deposition apparatus and cleaning method thereof |
Nov. 6, 2001 |
| 6280563 |
Plasma device including a powered non-magnetic metal member between a plasma AC excitation source and the plasma |
Aug. 28, 2001 |
| 6270618 |
Plasma processing apparatus |
Aug. 7, 2001 |
| 6254737 |
Active shield for generating a plasma for sputtering |
Jul. 3, 2001 |
| 6254746 |
Recessed coil for generating a plasma |
Jul. 3, 2001 |
| 6254738 |
Use of variable impedance having rotating core to control coil sputter distribution |
Jul. 3, 2001 |
| 6251241 |
Inductive-coupled plasma apparatus employing shield and method for manufacturing the shield |
Jun. 26, 2001 |
| 6248251 |
Apparatus and method for electrostatically shielding an inductively coupled RF plasma source and facilitating ignition of a plasma |
Jun. 19, 2001 |
| 6239403 |
Power segmented electrode |
May. 29, 2001 |
| 6235169 |
Modulated power for ionized metal plasma deposition |
May. 22, 2001 |
| 6231727 |
Process for stripping the surface of a substrate and apparatus for implementing this process |
May. 15, 2001 |
| 6228429 |
Methods and apparatus for processing insulating substrates |
May. 8, 2001 |
| 6220204 |
Film deposition method for forming copper film |
Apr. 24, 2001 |
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