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Class Information
Number: 204/298.31
Name: Chemistry: electrical and wave energy > Apparatus > Coating, forming or etching by sputtering > Etching
Description: Apparatus including means for the removal of material from a workpiece (i.e., substrate) by subjecting it to bombardment by atomic particles (e.g., ions), whereby the activation energy of material removal is supplied at least in part by momentum transfer.
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7345429 |
Methods and apparatus for generating strongly-ionized plasmas with ionizational instabilities |
Mar. 18, 2008 |
| 7320331 |
In-situ plasma cleaning device for cylindrical surfaces |
Jan. 22, 2008 |
| 7316764 |
System and method for performing sputter etching using independent ion and electron sources and a substrate biased with an a-symmetric bi-polar DC pulse signal |
Jan. 8, 2008 |
| 7294283 |
Penning discharge plasma source |
Nov. 13, 2007 |
| 7276140 |
Plasma accelerating apparatus for semiconductor substrate processing and plasma processing system having the same |
Oct. 2, 2007 |
| 7270729 |
System for, and method of, etching a surface on a wafer |
Sep. 18, 2007 |
| 7241397 |
Honeycomb optical window deposition shield and method for a plasma processing system |
Jul. 10, 2007 |
| 7012263 |
Ion source apparatus and electronic energy optimized method therefor |
Mar. 14, 2006 |
| 6991701 |
Plasma treatment method and apparatus |
Jan. 31, 2006 |
| 6955741 |
Semiconductor-processing reaction chamber |
Oct. 18, 2005 |
| 6942764 |
Arc-sprayed shield for pre-sputter etching chamber |
Sep. 13, 2005 |
| 6936546 |
Apparatus for shaping thin films in the near-edge regions of in-process semiconductor substrates |
Aug. 30, 2005 |
| 6924455 |
Integrated plasma chamber and inductively-coupled toroidal plasma source |
Aug. 2, 2005 |
| 6896775 |
High-power pulsed magnetically enhanced plasma processing |
May. 24, 2005 |
| 6887317 |
Reduced friction lift pin |
May. 3, 2005 |
| 6786998 |
Wafer temperature control apparatus and method |
Sep. 7, 2004 |
| 6736931 |
Inductively coupled RF plasma reactor and plasma chamber enclosure structure therefor |
May. 18, 2004 |
| 6679981 |
Inductive plasma loop enhancing magnetron sputtering |
Jan. 20, 2004 |
| 6664497 |
Toroidal low-field reactive gas source |
Dec. 16, 2003 |
| 6576860 |
Plasma processing method and apparatus for eliminating damages in a plasma process of a substrate |
Jun. 10, 2003 |
| 6554205 |
Gas polishing method, gas polishing nozzle and polishing apparatus |
Apr. 29, 2003 |
| 6533910 |
Carbonitride coated component of semiconductor processing equipment and method of manufacturing thereof |
Mar. 18, 2003 |
| 6531069 |
Reactive Ion Etching chamber design for flip chip interconnections |
Mar. 11, 2003 |
| 6514376 |
Thermal control apparatus for inductively coupled RF plasma reactor having an overhead solenoidal antenna |
Feb. 4, 2003 |
| 6506312 |
Vapor deposition chamber components and methods of making the same |
Jan. 14, 2003 |
| 6500314 |
Plasma etch reactor and method |
Dec. 31, 2002 |
| 6491784 |
Dry etching device |
Dec. 10, 2002 |
| 6464843 |
Contamination controlling method and apparatus for a plasma processing chamber |
Oct. 15, 2002 |
| 6454898 |
Inductively coupled RF Plasma reactor having an overhead solenoidal antenna and modular confinement magnet liners |
Sep. 24, 2002 |
| 6444085 |
Inductively coupled RF plasma reactor having an antenna adjacent a window electrode |
Sep. 3, 2002 |
| 6439244 |
Pedestal design for a sputter clean chamber to improve aluminum gap filling ability |
Aug. 27, 2002 |
| 6436253 |
Sputter etching chamber with improved uniformity |
Aug. 20, 2002 |
| 6432260 |
Inductively coupled ring-plasma source apparatus for processing gases and materials and method thereof |
Aug. 13, 2002 |
| 6409896 |
Method and apparatus for semiconductor wafer process monitoring |
Jun. 25, 2002 |
| 6395157 |
Method and apparatus for sputter etch conditioning a ceramic body |
May. 28, 2002 |
| 6375860 |
Controlled potential plasma source |
Apr. 23, 2002 |
| 6337003 |
Vacuum apparatus and driving mechanism therefor |
Jan. 8, 2002 |
| 6312569 |
Chemical vapor deposition apparatus and cleaning method thereof |
Nov. 6, 2001 |
| 6307174 |
Method for high-density plasma etching |
Oct. 23, 2001 |
| 6254719 |
Method for controlled removal of material from a solid surface |
Jul. 3, 2001 |
| 6254737 |
Active shield for generating a plasma for sputtering |
Jul. 3, 2001 |
| 6251232 |
Method of removing accumulated films from the surface of substrate holders in film deposition apparatus, and film deposition apparatus |
Jun. 26, 2001 |
| 6248219 |
Process and apparatus for sputter etching or sputter coating |
Jun. 19, 2001 |
| 6248251 |
Apparatus and method for electrostatically shielding an inductively coupled RF plasma source and facilitating ignition of a plasma |
Jun. 19, 2001 |
| 6231727 |
Process for stripping the surface of a substrate and apparatus for implementing this process |
May. 15, 2001 |
| 6221221 |
Apparatus for providing RF return current path control in a semiconductor wafer processing system |
Apr. 24, 2001 |
| 6221200 |
Instrument for production of semiconductor device and process for production thereof |
Apr. 24, 2001 |
| 6207006 |
Vacuum processing apparatus |
Mar. 27, 2001 |
| 6194680 |
Microwave plasma processing method |
Feb. 27, 2001 |
| 6190518 |
Device for reducing plasma etch damage and method for manufacturing same |
Feb. 20, 2001 |
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