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Class Information
Number: 204/298.27
Name: Chemistry: electrical and wave energy > Apparatus > Coating, forming or etching by sputtering > Coating > Moving workpiece or target > Plural modes of movement (e.g., planetary, epicyclic, etc.)
Description: Apparatus including means for moving the target or workpiece in plural modes (e.g., directions), such as planetary or epicyclic motion.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7625472 |
Plasma-assisted sputter deposition system |
Dec. 1, 2009 |
| 7575662 |
Method for operating a sputter cathode with a target |
Aug. 18, 2009 |
| 7563349 |
Sputtering device |
Jul. 21, 2009 |
| 7229532 |
Sputtering apparatus |
Jun. 12, 2007 |
| 7182814 |
Sample holder for physical vapor deposition equipment |
Feb. 27, 2007 |
| 7153367 |
Drive mechanism for a vacuum treatment apparatus |
Dec. 26, 2006 |
| 7153399 |
Method and apparatus for producing uniform isotropic stresses in a sputtered film |
Dec. 26, 2006 |
| 6905578 |
Apparatus and method for multi-target physical-vapor deposition of a multi-layer material structure |
Jun. 14, 2005 |
| 6905582 |
Configurable vacuum system and method |
Jun. 14, 2005 |
| 6858119 |
Mobile plating system and method |
Feb. 22, 2005 |
| 6858085 |
Two-compartment chamber for sequential processing |
Feb. 22, 2005 |
| 6843883 |
Vacuum processing apparatus and method for producing an object to be processed |
Jan. 18, 2005 |
| 6841048 |
Coating apparatus for disk-shaped workpieces |
Jan. 11, 2005 |
| 6837940 |
Film-forming device with a substrate rotating mechanism |
Jan. 4, 2005 |
| 6827789 |
Isolation chamber arrangement for serial processing of semiconductor wafers for the electronic industry |
Dec. 7, 2004 |
| 6818108 |
Chamber for the transport of workpieces in a vacuum atmosphere, a chamber combination and a method for transporting a workpiece |
Nov. 16, 2004 |
| 6797069 |
Gas driven planetary rotation apparatus and methods for forming silicon carbide layers |
Sep. 28, 2004 |
| 6761772 |
Workpiece support |
Jul. 13, 2004 |
| 6676989 |
Method and system for improving the effectiveness of medical stents by the application of gas cluster ion beam technology |
Jan. 13, 2004 |
| 6669824 |
Dual-scan thin film processing system |
Dec. 30, 2003 |
| 6656330 |
Coating installation for disk-form workpieces |
Dec. 2, 2003 |
| 6649208 |
Apparatus and method for thin film deposition onto substrates |
Nov. 18, 2003 |
| 6632282 |
Planetary multi-substrate holder system for material deposition |
Oct. 14, 2003 |
| 6616818 |
Apparatus and method for coating substrates |
Sep. 9, 2003 |
| 6592675 |
Rotating susceptor |
Jul. 15, 2003 |
| 6579420 |
Apparatus and method for uniformly depositing thin films over substrates |
Jun. 17, 2003 |
| 6517692 |
Apparatus for flow-line treatment of articles in an artificial medium |
Feb. 11, 2003 |
| 6503379 |
Mobile plating system and method |
Jan. 7, 2003 |
| 6495010 |
Differentially-pumped material processing system |
Dec. 17, 2002 |
| 6494997 |
Radio frequency magnetron sputtering for lighting applications |
Dec. 17, 2002 |
| 6485616 |
System and method for coating substrates with improved capacity and uniformity |
Nov. 26, 2002 |
| 6461484 |
Sputtering device |
Oct. 8, 2002 |
| 6454908 |
Vacuum treatment system |
Sep. 24, 2002 |
| 6425988 |
Method and system using power modulation for maskless vapor deposition of spatially graded thin film and multilayer coatings with atomic-level precision and accuracy |
Jul. 30, 2002 |
| 6395156 |
Sputtering chamber with moving table producing orbital motion of target for improved uniformity |
May. 28, 2002 |
| 6361669 |
Apparatus and method for plating wafers, substrates and other articles |
Mar. 26, 2002 |
| 6355146 |
Sputtering process and apparatus for coating powders |
Mar. 12, 2002 |
| 6338775 |
Apparatus and method for uniformly depositing thin films over substrates |
Jan. 15, 2002 |
| 6315877 |
Device for applying layers of hard material by dusting |
Nov. 13, 2001 |
| 6303008 |
Rotating film carrier and aperture for precision deposition of sputtered alloy films |
Oct. 16, 2001 |
| 6238531 |
Method and apparatus to improve the properties of ion beam deposited films in an ion beam sputtering system |
May. 29, 2001 |
| 6235172 |
System for and method of providing a controlled deposition on wafers |
May. 22, 2001 |
| 6235171 |
Vacuum film forming/processing apparatus and method |
May. 22, 2001 |
| 6228236 |
Sputter magnetron having two rotation diameters |
May. 8, 2001 |
| 6224718 |
Target assembly for ion beam sputter deposition with multiple paddles each having targets on both sides |
May. 1, 2001 |
| 6203677 |
Sputtering device for coating an essentially flat disk-shaped substrate |
Mar. 20, 2001 |
| 6193853 |
Magnetron sputtering method and apparatus |
Feb. 27, 2001 |
| 6176987 |
System for and method of providing a controlled deposition of wafers |
Jan. 23, 2001 |
| 6143148 |
Device for feeding substrates to vacuum systems for deposit of surface coating on the substrates |
Nov. 7, 2000 |
| 6142097 |
Optical membrane forming apparatus and optical device produced by the same |
Nov. 7, 2000 |
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