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Class Information
Number: 204/298.22
Name: Chemistry: electrical and wave energy > Apparatus > Coating, forming or etching by sputtering > Coating > Magnetically enhanced > Flux passes through target surface > Cylindrical or curved magnetron target > Moving magnetic field or target
Description: Apparatus including means for mechanically moving or electrically shifting the magnetic enhancement means or lines of magnetic flux, or the sputtering surface, relative to each other.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7578908 |
Sputter coating system |
Aug. 25, 2009 |
| 7575662 |
Method for operating a sputter cathode with a target |
Aug. 18, 2009 |
| 7563349 |
Sputtering device |
Jul. 21, 2009 |
| 7560011 |
Sputtering target and method/apparatus for cooling the target |
Jul. 14, 2009 |
| 7556718 |
Highly ionized PVD with moving magnetic field envelope for uniform coverage of feature structure and wafer |
Jul. 7, 2009 |
| 7520965 |
Magnetron sputtering apparatus and method for depositing a coating using same |
Apr. 21, 2009 |
| 7513982 |
Two dimensional magnetron scanning for flat panel sputtering |
Apr. 7, 2009 |
| 7504011 |
Sputtering target and method/apparatus for cooling the target |
Mar. 17, 2009 |
| 7399385 |
Alternating current rotatable sputter cathode |
Jul. 15, 2008 |
| 7351596 |
Method and system for operating a physical vapor deposition process |
Apr. 1, 2008 |
| 7320331 |
In-situ plasma cleaning device for cylindrical surfaces |
Jan. 22, 2008 |
| 7166199 |
Magnetron sputtering systems including anodic gas distribution systems |
Jan. 23, 2007 |
| 7101466 |
Linear sweeping magnetron sputtering cathode and scanning in-line system for arc-free reactive deposition and high target utilization |
Sep. 5, 2006 |
| 7022209 |
PVD method and PVD apparatus |
Apr. 4, 2006 |
| 7014741 |
Cylindrical magnetron with self cleaning target |
Mar. 21, 2006 |
| 6905579 |
Cylindrical magnetron target and spindle apparatus |
Jun. 14, 2005 |
| 6885154 |
Discharge plasma processing system |
Apr. 26, 2005 |
| 6875321 |
Auxiliary magnet array in conjunction with magnetron sputtering |
Apr. 5, 2005 |
| 6864773 |
Variable field magnet apparatus |
Mar. 8, 2005 |
| 6841051 |
High-power ion sputtering magnetron |
Jan. 11, 2005 |
| 6837975 |
Asymmetric rotating sidewall magnet ring for magnetron sputtering |
Jan. 4, 2005 |
| 6835290 |
System and method for controlling thin film defects |
Dec. 28, 2004 |
| 6793785 |
Magnetic control oscillating-scanning sputter |
Sep. 21, 2004 |
| 6793784 |
Tube target |
Sep. 21, 2004 |
| 6790326 |
Magnetron for a vault shaped sputtering target having two opposed sidewall magnets |
Sep. 14, 2004 |
| 6787011 |
Cylindrical target and its production method |
Sep. 7, 2004 |
| 6736948 |
Cylindrical AC/DC magnetron with compliant drive system and improved electrical and thermal isolation |
May. 18, 2004 |
| 6730196 |
Auxiliary electromagnets in a magnetron sputter reactor |
May. 4, 2004 |
| 6689253 |
Facing target assembly and sputter deposition apparatus |
Feb. 10, 2004 |
| 6673221 |
Cylindrical magnetron target and apparatus for affixing the target to a rotatable spindle assembly |
Jan. 6, 2004 |
| 6627050 |
Method and apparatus for depositing a tantalum-containing layer on a substrate |
Sep. 30, 2003 |
| 6610184 |
Magnet array in conjunction with rotating magnetron for plasma sputtering |
Aug. 26, 2003 |
| 6551477 |
Interlocking cylindrical magnetron cathodes and targets |
Apr. 22, 2003 |
| 6500321 |
Control of erosion profile and process characteristics in magnetron sputtering by geometrical shaping of the sputtering target |
Dec. 31, 2002 |
| 6497796 |
Apparatus and method for controlling plasma uniformity across a substrate |
Dec. 24, 2002 |
| 6488824 |
Sputtering apparatus and process for high rate coatings |
Dec. 3, 2002 |
| 6471831 |
Apparatus and method for improving film uniformity in a physical vapor deposition system |
Oct. 29, 2002 |
| 6454920 |
Magnetron sputtering source |
Sep. 24, 2002 |
| 6451177 |
Vault shaped target and magnetron operable in two sputtering modes |
Sep. 17, 2002 |
| 6444105 |
Physical vapor deposition reactor including magnet to control flow of ions |
Sep. 3, 2002 |
| 6444104 |
Sputtering target having an annular vault |
Sep. 3, 2002 |
| 6436251 |
Vault-shaped target and magnetron having both distributed and localized magnets |
Aug. 20, 2002 |
| 6436252 |
Method and apparatus for magnetron sputtering |
Aug. 20, 2002 |
| 6416639 |
Erosion compensated magnetron with moving magnet assembly |
Jul. 9, 2002 |
| 6413382 |
Pulsed sputtering with a small rotating magnetron |
Jul. 2, 2002 |
| 6406599 |
Magnetron with a rotating center magnet for a vault shaped sputtering target |
Jun. 18, 2002 |
| 6402903 |
Magnetic array for sputtering system |
Jun. 11, 2002 |
| 6383565 |
Vapor deposition coating apparatus |
May. 7, 2002 |
| 6375814 |
Magnetron with parallel race track and modified end portions thereof |
Apr. 23, 2002 |
| 6375815 |
Cylindrical magnetron target and apparatus for affixing the target to a rotatable spindle assembly |
Apr. 23, 2002 |
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