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Class Information
Number: 204/298.21
Name: Chemistry: electrical and wave energy > Apparatus > Coating, forming or etching by sputtering > Coating > Magnetically enhanced > Flux passes through target surface > Cylindrical or curved magnetron target
Description: Apparatus including a magnetically enhanced curved sputtering target surface which may be of cylindrical geometry.
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7578908 |
Sputter coating system |
Aug. 25, 2009 |
| 7575662 |
Method for operating a sputter cathode with a target |
Aug. 18, 2009 |
| 7560011 |
Sputtering target and method/apparatus for cooling the target |
Jul. 14, 2009 |
| 7520965 |
Magnetron sputtering apparatus and method for depositing a coating using same |
Apr. 21, 2009 |
| 7504011 |
Sputtering target and method/apparatus for cooling the target |
Mar. 17, 2009 |
| 7399385 |
Alternating current rotatable sputter cathode |
Jul. 15, 2008 |
| 7320331 |
In-situ plasma cleaning device for cylindrical surfaces |
Jan. 22, 2008 |
| 7166199 |
Magnetron sputtering systems including anodic gas distribution systems |
Jan. 23, 2007 |
| 7075030 |
Shielded beam delivery apparatus and method |
Jul. 11, 2006 |
| 7052583 |
Magnetron cathode and magnetron sputtering apparatus comprising the same |
May. 30, 2006 |
| 7030335 |
Plasma reactor with overhead RF electrode tuned to the plasma with arcing suppression |
Apr. 18, 2006 |
| 7014741 |
Cylindrical magnetron with self cleaning target |
Mar. 21, 2006 |
| 6929720 |
Sputtering source for ionized physical vapor deposition of metals |
Aug. 16, 2005 |
| 6841051 |
High-power ion sputtering magnetron |
Jan. 11, 2005 |
| 6837975 |
Asymmetric rotating sidewall magnet ring for magnetron sputtering |
Jan. 4, 2005 |
| 6835290 |
System and method for controlling thin film defects |
Dec. 28, 2004 |
| 6793784 |
Tube target |
Sep. 21, 2004 |
| 6790326 |
Magnetron for a vault shaped sputtering target having two opposed sidewall magnets |
Sep. 14, 2004 |
| 6787011 |
Cylindrical target and its production method |
Sep. 7, 2004 |
| 6767436 |
Method and apparatus of plasma-enhanced coaxial magnetron for sputter-coating interior surfaces |
Jul. 27, 2004 |
| 6768079 |
Susceptor with built-in plasma generation electrode and manufacturing method therefor |
Jul. 27, 2004 |
| 6761804 |
Inverted magnetron |
Jul. 13, 2004 |
| 6743342 |
Sputtering target with a partially enclosed vault |
Jun. 1, 2004 |
| 6736948 |
Cylindrical AC/DC magnetron with compliant drive system and improved electrical and thermal isolation |
May. 18, 2004 |
| 6689253 |
Facing target assembly and sputter deposition apparatus |
Feb. 10, 2004 |
| 6673221 |
Cylindrical magnetron target and apparatus for affixing the target to a rotatable spindle assembly |
Jan. 6, 2004 |
| 6645358 |
Hollow cylindrical cathode sputtering target and process for producing it |
Nov. 11, 2003 |
| 6613199 |
Apparatus and method for physical vapor deposition using an open top hollow cathode magnetron |
Sep. 2, 2003 |
| 6551477 |
Interlocking cylindrical magnetron cathodes and targets |
Apr. 22, 2003 |
| 6497803 |
Unbalanced plasma generating apparatus having cylindrical symmetry |
Dec. 24, 2002 |
| 6497796 |
Apparatus and method for controlling plasma uniformity across a substrate |
Dec. 24, 2002 |
| 6471831 |
Apparatus and method for improving film uniformity in a physical vapor deposition system |
Oct. 29, 2002 |
| 6454920 |
Magnetron sputtering source |
Sep. 24, 2002 |
| 6444105 |
Physical vapor deposition reactor including magnet to control flow of ions |
Sep. 3, 2002 |
| 6436252 |
Method and apparatus for magnetron sputtering |
Aug. 20, 2002 |
| 6406599 |
Magnetron with a rotating center magnet for a vault shaped sputtering target |
Jun. 18, 2002 |
| 6383565 |
Vapor deposition coating apparatus |
May. 7, 2002 |
| 6375814 |
Magnetron with parallel race track and modified end portions thereof |
Apr. 23, 2002 |
| 6375815 |
Cylindrical magnetron target and apparatus for affixing the target to a rotatable spindle assembly |
Apr. 23, 2002 |
| 6365010 |
Sputtering apparatus and process for high rate coatings |
Apr. 2, 2002 |
| 6340417 |
Reactor and method for ionized metal deposition |
Jan. 22, 2002 |
| 6337001 |
Process for sputter coating, a sputter coating source, and sputter coating apparatus with at least one such source |
Jan. 8, 2002 |
| 6277250 |
Dual cathode arrangement for physical vapor deposition of materials onto a round substrate with high aspect ratio features |
Aug. 21, 2001 |
| 6277249 |
Integrated process for copper via filling using a magnetron and target producing highly energetic ions |
Aug. 21, 2001 |
| 6264803 |
Apparatus and method for sputtering |
Jul. 24, 2001 |
| 6251242 |
Magnetron and target producing an extended plasma region in a sputter reactor |
Jun. 26, 2001 |
| 6238526 |
Ion-beam source with channeling sputterable targets and a method for channeled sputtering |
May. 29, 2001 |
| 6228236 |
Sputter magnetron having two rotation diameters |
May. 8, 2001 |
| 6207028 |
Sputtering device with a cathode with permanent magnet system |
Mar. 27, 2001 |
| 6193853 |
Magnetron sputtering method and apparatus |
Feb. 27, 2001 |
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