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Class Information
Number: 204/298.2
Name: Chemistry: electrical and wave energy > Apparatus > Coating, forming or etching by sputtering > Coating > Magnetically enhanced > Flux passes through target surface > Planar magnetron > Moving magnetic field or target
Description: Apparatus including means for mechanically moving or electrically shifting the magnetic enhancement means or lines of magnetic flux, or the sputtering surface, relative to each other.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7618521 |
Split magnet ring on a magnetron sputter chamber |
Nov. 17, 2009 |
| 7588669 |
Single-process-chamber deposition system |
Sep. 15, 2009 |
| 7585399 |
Rotating magnet arrays for magnetron sputtering apparatus |
Sep. 8, 2009 |
| 7563349 |
Sputtering device |
Jul. 21, 2009 |
| 7556718 |
Highly ionized PVD with moving magnetic field envelope for uniform coverage of feature structure and wafer |
Jul. 7, 2009 |
| 7544276 |
Biased pulse DC reactive sputtering of oxide films |
Jun. 9, 2009 |
| 7531071 |
Magnet arrangement for a planar magnetron |
May. 12, 2009 |
| 7520965 |
Magnetron sputtering apparatus and method for depositing a coating using same |
Apr. 21, 2009 |
| 7513982 |
Two dimensional magnetron scanning for flat panel sputtering |
Apr. 7, 2009 |
| 7504006 |
Self-ionized and capacitively-coupled plasma for sputtering and resputtering |
Mar. 17, 2009 |
| 7485210 |
Sputtering target fixture |
Feb. 3, 2009 |
| 7399385 |
Alternating current rotatable sputter cathode |
Jul. 15, 2008 |
| 7378001 |
Magnetron sputtering |
May. 27, 2008 |
| 7368041 |
Method for controlling plasma density or the distribution thereof |
May. 6, 2008 |
| 7351596 |
Method and system for operating a physical vapor deposition process |
Apr. 1, 2008 |
| 7347919 |
Sputter source, sputtering device, and sputtering method |
Mar. 25, 2008 |
| 7335282 |
Sputtering using an unbalanced magnetron |
Feb. 26, 2008 |
| 7223322 |
Moving magnetic/cathode arrangement and method |
May. 29, 2007 |
| 7208878 |
Method of manufacturing a rotation-magnetron-in-magnetron (RMIM) electrode |
Apr. 24, 2007 |
| 7186319 |
Multi-track magnetron exhibiting more uniform deposition and reduced rotational asymmetry |
Mar. 6, 2007 |
| 7182843 |
Rotating sputtering magnetron |
Feb. 27, 2007 |
| 7179351 |
Methods and apparatus for magnetron sputtering |
Feb. 20, 2007 |
| 7169271 |
Magnetron executing planetary motion adjacent a sputtering target |
Jan. 30, 2007 |
| 7166199 |
Magnetron sputtering systems including anodic gas distribution systems |
Jan. 23, 2007 |
| 7156961 |
Sputtering apparatus and film forming method |
Jan. 2, 2007 |
| 7119489 |
Rotation-magnetron-in-magnetron (RMIM) electrode, method of manufacturing the RMIM electrode, and sputtering apparatus including the RMIM electrode |
Oct. 10, 2006 |
| 7115194 |
Magnetron sputtering apparatus |
Oct. 3, 2006 |
| 7101466 |
Linear sweeping magnetron sputtering cathode and scanning in-line system for arc-free reactive deposition and high target utilization |
Sep. 5, 2006 |
| 7094322 |
Use of self-sustained atmospheric pressure plasma for the scattering and absorption of electromagnetic radiation |
Aug. 22, 2006 |
| 7041200 |
Reducing particle generation during sputter deposition |
May. 9, 2006 |
| 7022209 |
PVD method and PVD apparatus |
Apr. 4, 2006 |
| 7018515 |
Selectable dual position magnetron |
Mar. 28, 2006 |
| 7008520 |
Sputtering device |
Mar. 7, 2006 |
| 6960284 |
Rotational and reciprocal radial movement of a sputtering magnetron |
Nov. 1, 2005 |
| 6949170 |
Deposition methods and apparatus |
Sep. 27, 2005 |
| 6916407 |
Target comprising thickness profiling for an RF magnetron |
Jul. 12, 2005 |
| 6887357 |
Sputtering system |
May. 3, 2005 |
| 6885154 |
Discharge plasma processing system |
Apr. 26, 2005 |
| 6881310 |
Cooling system for magnetron sputtering apparatus |
Apr. 19, 2005 |
| 6860977 |
Method for manufacturing a workpiece using a magnetron sputter source |
Mar. 1, 2005 |
| 6852202 |
Small epicyclic magnetron with controlled radial sputtering profile |
Feb. 8, 2005 |
| 6841050 |
Small planetary magnetron |
Jan. 11, 2005 |
| 6837975 |
Asymmetric rotating sidewall magnet ring for magnetron sputtering |
Jan. 4, 2005 |
| 6821397 |
Method for controlling plasma density or the distribution thereof |
Nov. 23, 2004 |
| 6793785 |
Magnetic control oscillating-scanning sputter |
Sep. 21, 2004 |
| 6790326 |
Magnetron for a vault shaped sputtering target having two opposed sidewall magnets |
Sep. 14, 2004 |
| 6758950 |
Controlled magnetron shape for uniformly sputtered thin film |
Jul. 6, 2004 |
| 6749730 |
Sputter device |
Jun. 15, 2004 |
| 6743342 |
Sputtering target with a partially enclosed vault |
Jun. 1, 2004 |
| 6740209 |
Multilayer film deposition apparatus, and method and apparatus for manufacturing perpendicular-magnetic-recording media |
May. 25, 2004 |
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