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Class Information
Number: 204/298.19
Name: Chemistry: electrical and wave energy > Apparatus > Coating, forming or etching by sputtering > Coating > Magnetically enhanced > Flux passes through target surface > Planar magnetron
Description: Apparatus including a magnetically enhanced generally flat planar sputtering target surface wherein lines of magnetic flux emerge from and return to the flat planar sputtering target surface.
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7625471 |
Sacrificial cathode target for sputtering cathode assembly |
Dec. 1, 2009 |
| 7604716 |
Methods and apparatus for generating high-density plasma |
Oct. 20, 2009 |
| 7585399 |
Rotating magnet arrays for magnetron sputtering apparatus |
Sep. 8, 2009 |
| 7578908 |
Sputter coating system |
Aug. 25, 2009 |
| 7531071 |
Magnet arrangement for a planar magnetron |
May. 12, 2009 |
| 7513982 |
Two dimensional magnetron scanning for flat panel sputtering |
Apr. 7, 2009 |
| 7485210 |
Sputtering target fixture |
Feb. 3, 2009 |
| 7411352 |
Dual plasma beam sources and method |
Aug. 12, 2008 |
| 7378001 |
Magnetron sputtering |
May. 27, 2008 |
| 7368041 |
Method for controlling plasma density or the distribution thereof |
May. 6, 2008 |
| 7327089 |
Beam plasma source |
Feb. 5, 2008 |
| 7316763 |
Multiple target tiles with complementary beveled edges forming a slanted gap therebetween |
Jan. 8, 2008 |
| 7223322 |
Moving magnetic/cathode arrangement and method |
May. 29, 2007 |
| 7186319 |
Multi-track magnetron exhibiting more uniform deposition and reduced rotational asymmetry |
Mar. 6, 2007 |
| 7182843 |
Rotating sputtering magnetron |
Feb. 27, 2007 |
| 7179350 |
Reactive sputtering of silicon nitride films by RF supported DC magnetron |
Feb. 20, 2007 |
| 7179351 |
Methods and apparatus for magnetron sputtering |
Feb. 20, 2007 |
| 7166199 |
Magnetron sputtering systems including anodic gas distribution systems |
Jan. 23, 2007 |
| 7156960 |
Method and device for continuous cold plasma deposition of metal coatings |
Jan. 2, 2007 |
| 7147759 |
High-power pulsed magnetron sputtering |
Dec. 12, 2006 |
| 7135097 |
Box-shaped facing-targets sputtering apparatus and method for producing compound thin film |
Nov. 14, 2006 |
| 7135820 |
Vane structure of magnetron |
Nov. 14, 2006 |
| 7115194 |
Magnetron sputtering apparatus |
Oct. 3, 2006 |
| 7087145 |
Sputtering cathode assembly |
Aug. 8, 2006 |
| 7041200 |
Reducing particle generation during sputter deposition |
May. 9, 2006 |
| 7018515 |
Selectable dual position magnetron |
Mar. 28, 2006 |
| 6916407 |
Target comprising thickness profiling for an RF magnetron |
Jul. 12, 2005 |
| 6896773 |
High deposition rate sputtering |
May. 24, 2005 |
| 6887357 |
Sputtering system |
May. 3, 2005 |
| 6881311 |
Facing-targets-type sputtering apparatus |
Apr. 19, 2005 |
| 6875321 |
Auxiliary magnet array in conjunction with magnetron sputtering |
Apr. 5, 2005 |
| 6863699 |
Sputter deposition of lithium phosphorous oxynitride material |
Mar. 8, 2005 |
| 6830664 |
Cluster tool with a hollow cathode array |
Dec. 14, 2004 |
| 6821397 |
Method for controlling plasma density or the distribution thereof |
Nov. 23, 2004 |
| 6822158 |
Thin-film solar cell and manufacture method therefor |
Nov. 23, 2004 |
| 6787010 |
Non-thermionic sputter material transport device, methods of use, and materials produced thereby |
Sep. 7, 2004 |
| 6783638 |
Flat magnetron |
Aug. 31, 2004 |
| 6765466 |
Magnetic field generator for magnetron plasma |
Jul. 20, 2004 |
| 6761804 |
Inverted magnetron |
Jul. 13, 2004 |
| 6761805 |
Cathode arc source with magnetic field generating means positioned above and below the cathode |
Jul. 13, 2004 |
| 6752911 |
Device and method for coating objects at a high temperature |
Jun. 22, 2004 |
| 6749730 |
Sputter device |
Jun. 15, 2004 |
| 6743342 |
Sputtering target with a partially enclosed vault |
Jun. 1, 2004 |
| 6740212 |
Rectangular magnetron sputtering cathode with high target utilization |
May. 25, 2004 |
| 6733642 |
System for unbalanced magnetron sputtering with AC power |
May. 11, 2004 |
| 6723215 |
Sputtering apparatus for forming a metal film using a magnetic field |
Apr. 20, 2004 |
| 6719886 |
Method and apparatus for ionized physical vapor deposition |
Apr. 13, 2004 |
| 6702930 |
Method and means for enhancing utilization of sputtering targets |
Mar. 9, 2004 |
| 6692617 |
Sustained self-sputtering reactor having an increased density plasma |
Feb. 17, 2004 |
| 6689254 |
Sputtering apparatus with isolated coolant and sputtering target therefor |
Feb. 10, 2004 |
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