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Class Information
Number: 204/298.19
Name: Chemistry: electrical and wave energy > Apparatus > Coating, forming or etching by sputtering > Coating > Magnetically enhanced > Flux passes through target surface > Planar magnetron
Description: Apparatus including a magnetically enhanced generally flat planar sputtering target surface wherein lines of magnetic flux emerge from and return to the flat planar sputtering target surface.










Sub-classes under this class:

Class Number Class Name Patents
204/298.2 Moving magnetic field or target 308


Patents under this class:
1 2 3 4 5 6 7 8 9

Patent Number Title Of Patent Date Issued
8679306 Sputtering apparatus Mar. 25, 2014
8673124 Magnet unit and magnetron sputtering apparatus Mar. 18, 2014
8663430 Magnetron sputtering apparatus and method for manufacturing thin film Mar. 4, 2014
8608918 Magnet structure and cathode electrode unit for magnetron sputtering, and magnetron sputtering system Dec. 17, 2013
8585872 Sputtering apparatus and film-forming processes Nov. 19, 2013
8580094 Magnetron design for RF/DC physical vapor deposition Nov. 12, 2013
8574412 Magnet mounting system and magnetron sputtering device having same Nov. 5, 2013
8574410 Method and apparatus for improved high power impulse magnetron sputtering Nov. 5, 2013
8562798 Physical vapor deposition plasma reactor with RF source power applied to the target and having a magnetron Oct. 22, 2013
8557094 Sputtering chamber having auxiliary backside magnet to improve etch uniformity and magnetron producing sustained self sputtering of ruthenium and tantalum Oct. 15, 2013
8535494 Rotary magnet sputtering apparatus Sep. 17, 2013
8512526 Method of performing physical vapor deposition with RF plasma source power applied to the target using a magnetron Aug. 20, 2013
8512530 Sputtering apparatus Aug. 20, 2013
8500962 Deposition system and methods having improved material utilization Aug. 6, 2013
8500975 Method and apparatus for sputtering onto large flat panels Aug. 6, 2013
8496792 Rotary magnet sputtering apparatus Jul. 30, 2013
8480865 Ring cathode for use in a magnetron sputtering device Jul. 9, 2013
8470145 Cathode unit and sputtering apparatus provided with the same Jun. 25, 2013
8454804 Protective offset sputtering Jun. 4, 2013
8440301 Coating apparatus and method May. 14, 2013
8398834 Target utilization improvement for rotatable magnetrons Mar. 19, 2013
8388819 Magnet target and magnetron sputtering apparatus having the same Mar. 5, 2013
8377269 Sputtering apparatus Feb. 19, 2013
8343318 Magnetic lensing to improve deposition uniformity in a physical vapor deposition (PVD) process Jan. 1, 2013
8273221 Sputter target utilization Sep. 25, 2012
8236152 Deposition system Aug. 7, 2012
8221594 Magnetron sputtering apparatus and magnetron sputtering method Jul. 17, 2012
8172993 Magnetron sputtering electrode, and sputtering apparatus provided with magnetron sputtering electrode May. 8, 2012
8157970 Sputtering target fixture Apr. 17, 2012
8152975 Deposition system with improved material utilization Apr. 10, 2012
8048277 Magnet unit and magnetron sputtering apparatus Nov. 1, 2011
8016985 Magnetron sputtering apparatus and method for manufacturing semiconductor device Sep. 13, 2011
7972486 Machine for coating a substrate, and module Jul. 5, 2011
7955480 Sputtering apparatus and film deposition method Jun. 7, 2011
7943016 Magnetron sputtering apparatus May. 17, 2011
7935232 Sputtering apparatus and method, and sputtering control program May. 3, 2011
7931787 Electron-assisted deposition process and apparatus Apr. 26, 2011
7901552 Sputtering target with grooves and intersecting channels Mar. 8, 2011
7892405 Methods and apparatus for magnetron sputtering Feb. 22, 2011
7879209 Cathode for sputter coating Feb. 1, 2011
7837836 Method and apparatus for multi-stage sputter deposition of uniform thickness layers Nov. 23, 2010
7815782 PVD target Oct. 19, 2010
7799190 Target backing plate for sputtering system Sep. 21, 2010
7767064 Position controlled dual magnetron Aug. 3, 2010
7744730 Rotating pallet in sputtering system Jun. 29, 2010
7718042 Method for manufacturing sputter-coated substrates, magnetron source and sputtering chamber with such source May. 18, 2010
7713390 Ground shield for a PVD chamber May. 11, 2010
7686928 Pressure switched dual magnetron Mar. 30, 2010
7678240 Method for controlling plasma density or the distribution thereof Mar. 16, 2010
7641773 Process for producing layers and layer systems, and coated substrate Jan. 5, 2010

1 2 3 4 5 6 7 8 9










 
 
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