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Class Information
Number: 204/298.18
Name: Chemistry: electrical and wave energy > Apparatus > Coating, forming or etching by sputtering > Coating > Magnetically enhanced > Flux passes through target surface > Focusing target (e.g., conical target, plural inclined targets, etc.)
Description: Apparatus including a magnetically enhanced sputtering target surface of conical or other particle flux focusing geometry.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7578908 |
Sputter coating system |
Aug. 25, 2009 |
| 7575661 |
Reactive sputtering method |
Aug. 18, 2009 |
| 7510634 |
Apparatus and methods for deposition and/or etch selectivity |
Mar. 31, 2009 |
| 7399387 |
Target for sputtering and a method for manufacturing a magnetic recording medium using the target |
Jul. 15, 2008 |
| 7300557 |
Device for targeted application of deposition material to a substrate |
Nov. 27, 2007 |
| 7235160 |
Hollow cathode sputtering apparatus and related method |
Jun. 26, 2007 |
| 7179350 |
Reactive sputtering of silicon nitride films by RF supported DC magnetron |
Feb. 20, 2007 |
| 7179351 |
Methods and apparatus for magnetron sputtering |
Feb. 20, 2007 |
| 7141145 |
Gas injection for uniform composition reactively sputter-deposited thin films |
Nov. 28, 2006 |
| 7135097 |
Box-shaped facing-targets sputtering apparatus and method for producing compound thin film |
Nov. 14, 2006 |
| 7018515 |
Selectable dual position magnetron |
Mar. 28, 2006 |
| 6881311 |
Facing-targets-type sputtering apparatus |
Apr. 19, 2005 |
| 6872285 |
System for depositing a film |
Mar. 29, 2005 |
| 6860977 |
Method for manufacturing a workpiece using a magnetron sputter source |
Mar. 1, 2005 |
| 6837975 |
Asymmetric rotating sidewall magnet ring for magnetron sputtering |
Jan. 4, 2005 |
| 6830664 |
Cluster tool with a hollow cathode array |
Dec. 14, 2004 |
| 6790326 |
Magnetron for a vault shaped sputtering target having two opposed sidewall magnets |
Sep. 14, 2004 |
| 6776881 |
Magnetron atomization source and method of use thereof |
Aug. 17, 2004 |
| 6761804 |
Inverted magnetron |
Jul. 13, 2004 |
| 6752911 |
Device and method for coating objects at a high temperature |
Jun. 22, 2004 |
| 6749730 |
Sputter device |
Jun. 15, 2004 |
| 6743342 |
Sputtering target with a partially enclosed vault |
Jun. 1, 2004 |
| 6733642 |
System for unbalanced magnetron sputtering with AC power |
May. 11, 2004 |
| 6730196 |
Auxiliary electromagnets in a magnetron sputter reactor |
May. 4, 2004 |
| 6719886 |
Method and apparatus for ionized physical vapor deposition |
Apr. 13, 2004 |
| 6689253 |
Facing target assembly and sputter deposition apparatus |
Feb. 10, 2004 |
| 6689254 |
Sputtering apparatus with isolated coolant and sputtering target therefor |
Feb. 10, 2004 |
| 6682637 |
Magnetron sputter source |
Jan. 27, 2004 |
| 6660140 |
Sputtering apparatus |
Dec. 9, 2003 |
| 6649036 |
Mirrortron sputtering apparatus |
Nov. 18, 2003 |
| 6641702 |
Sputtering device |
Nov. 4, 2003 |
| 6620298 |
Magnetron sputtering method and apparatus |
Sep. 16, 2003 |
| 6620299 |
Process and device for the coating of substrates by means of bipolar pulsed magnetron sputtering and the use thereof |
Sep. 16, 2003 |
| 6613199 |
Apparatus and method for physical vapor deposition using an open top hollow cathode magnetron |
Sep. 2, 2003 |
| 6605198 |
Apparatus for, and method of, depositing a film on a substrate |
Aug. 12, 2003 |
| 6589408 |
Non-planar copper alloy target for plasma vapor deposition systems |
Jul. 8, 2003 |
| 6497803 |
Unbalanced plasma generating apparatus having cylindrical symmetry |
Dec. 24, 2002 |
| 6497796 |
Apparatus and method for controlling plasma uniformity across a substrate |
Dec. 24, 2002 |
| 6485617 |
Sputtering method utilizing an extended plasma region |
Nov. 26, 2002 |
| 6471831 |
Apparatus and method for improving film uniformity in a physical vapor deposition system |
Oct. 29, 2002 |
| 6461484 |
Sputtering device |
Oct. 8, 2002 |
| 6458252 |
High target utilization magnetic arrangement for a truncated conical sputtering target |
Oct. 1, 2002 |
| 6454920 |
Magnetron sputtering source |
Sep. 24, 2002 |
| 6444105 |
Physical vapor deposition reactor including magnet to control flow of ions |
Sep. 3, 2002 |
| 6432286 |
Conical sputtering target |
Aug. 13, 2002 |
| 6413392 |
Sputtering device |
Jul. 2, 2002 |
| 6406599 |
Magnetron with a rotating center magnet for a vault shaped sputtering target |
Jun. 18, 2002 |
| 6340417 |
Reactor and method for ionized metal deposition |
Jan. 22, 2002 |
| 6337001 |
Process for sputter coating, a sputter coating source, and sputter coating apparatus with at least one such source |
Jan. 8, 2002 |
| 6328856 |
Method and apparatus for multilayer film deposition utilizing rotating multiple magnetron cathode device |
Dec. 11, 2001 |
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