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Class Information
Number: 204/298.17
Name: Chemistry: electrical and wave energy > Apparatus > Coating, forming or etching by sputtering > Coating > Magnetically enhanced > Flux passes through target surface
Description: Apparatus including means to allow the flux to pass through a target surface.
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7618521 |
Split magnet ring on a magnetron sputter chamber |
Nov. 17, 2009 |
| 7527713 |
Variable quadruple electromagnet array in plasma processing |
May. 5, 2009 |
| 7510634 |
Apparatus and methods for deposition and/or etch selectivity |
Mar. 31, 2009 |
| 7498587 |
Bi-directional filtered arc plasma source |
Mar. 3, 2009 |
| 7135097 |
Box-shaped facing-targets sputtering apparatus and method for producing compound thin film |
Nov. 14, 2006 |
| 6911123 |
Facing-targets-type sputtering apparatus and method |
Jun. 28, 2005 |
| 6875321 |
Auxiliary magnet array in conjunction with magnetron sputtering |
Apr. 5, 2005 |
| 6869509 |
Source for vacuum treatment process |
Mar. 22, 2005 |
| 6863785 |
Sputtering apparatus and sputter film deposition method |
Mar. 8, 2005 |
| 6830664 |
Cluster tool with a hollow cathode array |
Dec. 14, 2004 |
| 6824652 |
Sputtering target assembly and sputtering apparatus using the same |
Nov. 30, 2004 |
| 6824653 |
Magnetron with controlled DC power |
Nov. 30, 2004 |
| 6821552 |
Method and apparatus for determining the pass through flux of magnetic materials |
Nov. 23, 2004 |
| 6821397 |
Method for controlling plasma density or the distribution thereof |
Nov. 23, 2004 |
| 6783638 |
Flat magnetron |
Aug. 31, 2004 |
| 6761804 |
Inverted magnetron |
Jul. 13, 2004 |
| 6758950 |
Controlled magnetron shape for uniformly sputtered thin film |
Jul. 6, 2004 |
| 6758949 |
Magnetically confined metal plasma sputter source with magnetic control of ion and neutral densities |
Jul. 6, 2004 |
| 6740212 |
Rectangular magnetron sputtering cathode with high target utilization |
May. 25, 2004 |
| 6682637 |
Magnetron sputter source |
Jan. 27, 2004 |
| 6649036 |
Mirrortron sputtering apparatus |
Nov. 18, 2003 |
| 6627050 |
Method and apparatus for depositing a tantalum-containing layer on a substrate |
Sep. 30, 2003 |
| 6620298 |
Magnetron sputtering method and apparatus |
Sep. 16, 2003 |
| 6610184 |
Magnet array in conjunction with rotating magnetron for plasma sputtering |
Aug. 26, 2003 |
| 6540883 |
Magnetron sputtering source and method of use thereof |
Apr. 1, 2003 |
| 6497796 |
Apparatus and method for controlling plasma uniformity across a substrate |
Dec. 24, 2002 |
| 6494997 |
Radio frequency magnetron sputtering for lighting applications |
Dec. 17, 2002 |
| 6494999 |
Magnetron sputtering apparatus with an integral cooling and pressure relieving cathode |
Dec. 17, 2002 |
| 6485617 |
Sputtering method utilizing an extended plasma region |
Nov. 26, 2002 |
| 6471831 |
Apparatus and method for improving film uniformity in a physical vapor deposition system |
Oct. 29, 2002 |
| 6458252 |
High target utilization magnetic arrangement for a truncated conical sputtering target |
Oct. 1, 2002 |
| 6454911 |
Method and apparatus for determining the pass through flux of magnetic materials |
Sep. 24, 2002 |
| 6444104 |
Sputtering target having an annular vault |
Sep. 3, 2002 |
| 6444105 |
Physical vapor deposition reactor including magnet to control flow of ions |
Sep. 3, 2002 |
| 6440282 |
Sputtering reactor and method of using an unbalanced magnetron |
Aug. 27, 2002 |
| 6436251 |
Vault-shaped target and magnetron having both distributed and localized magnets |
Aug. 20, 2002 |
| 6432286 |
Conical sputtering target |
Aug. 13, 2002 |
| 6432285 |
Planar magnetron sputtering apparatus |
Aug. 13, 2002 |
| 6423192 |
Sputtering apparatus and film forming method |
Jul. 23, 2002 |
| 6419800 |
Film-forming apparatus and film-forming method |
Jul. 16, 2002 |
| 6413392 |
Sputtering device |
Jul. 2, 2002 |
| 6413382 |
Pulsed sputtering with a small rotating magnetron |
Jul. 2, 2002 |
| 6406599 |
Magnetron with a rotating center magnet for a vault shaped sputtering target |
Jun. 18, 2002 |
| 6372098 |
High target utilization magnet array and associated methods |
Apr. 16, 2002 |
| 6361662 |
Method for fabricating a semiconductor device in a magnetron sputtering system |
Mar. 26, 2002 |
| 6319372 |
Permanent magnet linear microwave plasma source |
Nov. 20, 2001 |
| 6312574 |
Target, magnetron source with said target and process for producing said target |
Nov. 6, 2001 |
| 6287435 |
Method and apparatus for ionized physical vapor deposition |
Sep. 11, 2001 |
| 6277249 |
Integrated process for copper via filling using a magnetron and target producing highly energetic ions |
Aug. 21, 2001 |
| 6274014 |
Method for forming a thin film of a metal compound by vacuum deposition |
Aug. 14, 2001 |
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