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Class Information
Number: 204/298.16
Name: Chemistry: electrical and wave energy > Apparatus > Coating, forming or etching by sputtering > Coating > Magnetically enhanced
Description: Apparatus including significant means for magnetic enhancement of target sputtering, plasma shaping or confinement, or control of deposition parameters or deposit characteristics.
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7618521 |
Split magnet ring on a magnetron sputter chamber |
Nov. 17, 2009 |
| 7604717 |
Electrochemical device |
Oct. 20, 2009 |
| 7585399 |
Rotating magnet arrays for magnetron sputtering apparatus |
Sep. 8, 2009 |
| 7578908 |
Sputter coating system |
Aug. 25, 2009 |
| 7556718 |
Highly ionized PVD with moving magnetic field envelope for uniform coverage of feature structure and wafer |
Jul. 7, 2009 |
| 7513982 |
Two dimensional magnetron scanning for flat panel sputtering |
Apr. 7, 2009 |
| 7510634 |
Apparatus and methods for deposition and/or etch selectivity |
Mar. 31, 2009 |
| 7504006 |
Self-ionized and capacitively-coupled plasma for sputtering and resputtering |
Mar. 17, 2009 |
| 7498587 |
Bi-directional filtered arc plasma source |
Mar. 3, 2009 |
| 7444955 |
Apparatus for directing plasma flow to coat internal passageways |
Nov. 4, 2008 |
| 7425504 |
Systems and methods for plasma etching |
Sep. 16, 2008 |
| 7378001 |
Magnetron sputtering |
May. 27, 2008 |
| 7294245 |
Cover ring and shield supporting a wafer ring in a plasma reactor |
Nov. 13, 2007 |
| 7294242 |
Collimated and long throw magnetron sputtering of nickel/iron films for magnetic recording head applications |
Nov. 13, 2007 |
| 7182842 |
Device for amplifying the current of an abnormal electrical discharge and system for using an abnormal electrical discharge comprising one such device |
Feb. 27, 2007 |
| 7052583 |
Magnetron cathode and magnetron sputtering apparatus comprising the same |
May. 30, 2006 |
| 7041201 |
Sidewall magnet improving uniformity of inductively coupled plasma and shields used therewith |
May. 9, 2006 |
| 7011733 |
Method and apparatus for depositing films |
Mar. 14, 2006 |
| 7012263 |
Ion source apparatus and electronic energy optimized method therefor |
Mar. 14, 2006 |
| 6988306 |
High purity ferromagnetic sputter target, assembly and method of manufacturing same |
Jan. 24, 2006 |
| 6972079 |
Dual magnetron sputtering apparatus utilizing control means for delivering balanced power |
Dec. 6, 2005 |
| 6962648 |
Back-biased face target sputtering |
Nov. 8, 2005 |
| 6960283 |
Anode and magnetron therewith |
Nov. 1, 2005 |
| 6936144 |
High frequency plasma source |
Aug. 30, 2005 |
| 6937127 |
Apparatus for manipulating magnetic fields |
Aug. 30, 2005 |
| 6923891 |
Copper interconnects |
Aug. 2, 2005 |
| 6905578 |
Apparatus and method for multi-target physical-vapor deposition of a multi-layer material structure |
Jun. 14, 2005 |
| 6899795 |
Sputter chamber as well as vacuum transport chamber and vacuum handling apparatus with such chambers |
May. 31, 2005 |
| 6881311 |
Facing-targets-type sputtering apparatus |
Apr. 19, 2005 |
| 6878241 |
Method of forming deposited film |
Apr. 12, 2005 |
| 6864773 |
Variable field magnet apparatus |
Mar. 8, 2005 |
| 6863699 |
Sputter deposition of lithium phosphorous oxynitride material |
Mar. 8, 2005 |
| 6852202 |
Small epicyclic magnetron with controlled radial sputtering profile |
Feb. 8, 2005 |
| 6846396 |
Active magnetic shielding |
Jan. 25, 2005 |
| 6827824 |
Enhanced collimated deposition |
Dec. 7, 2004 |
| 6824653 |
Magnetron with controlled DC power |
Nov. 30, 2004 |
| 6811662 |
Sputtering apparatus and manufacturing method of metal layer/metal compound layer by using thereof |
Nov. 2, 2004 |
| 6802949 |
Method for manufacturing half-metallic magnetic oxide and plasma sputtering apparatus used in the same |
Oct. 12, 2004 |
| 6790482 |
Arrangement for orienting the magnetization direction of magnetic layers |
Sep. 14, 2004 |
| 6787010 |
Non-thermionic sputter material transport device, methods of use, and materials produced thereby |
Sep. 7, 2004 |
| 6765466 |
Magnetic field generator for magnetron plasma |
Jul. 20, 2004 |
| 6764575 |
Magnetron plasma processing apparatus |
Jul. 20, 2004 |
| 6761805 |
Cathode arc source with magnetic field generating means positioned above and below the cathode |
Jul. 13, 2004 |
| 6752912 |
Laser selection of ions for sputter deposition of titanium containing films |
Jun. 22, 2004 |
| 6749730 |
Sputter device |
Jun. 15, 2004 |
| 6743340 |
Sputtering of aligned magnetic materials and magnetic dipole ring used therefor |
Jun. 1, 2004 |
| 6699374 |
Low temperature cathodic magnetron sputtering |
Mar. 2, 2004 |
| 6695954 |
Plasma vapor deposition with coil sputtering |
Feb. 24, 2004 |
| 6692618 |
Magnetron sputter source with multipart target |
Feb. 17, 2004 |
| 6679981 |
Inductive plasma loop enhancing magnetron sputtering |
Jan. 20, 2004 |
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