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Class Information
Number: 204/298.16
Name: Chemistry: electrical and wave energy > Apparatus > Coating, forming or etching by sputtering > Coating > Magnetically enhanced
Description: Apparatus including significant means for magnetic enhancement of target sputtering, plasma shaping or confinement, or control of deposition parameters or deposit characteristics.










Sub-classes under this class:

Class Number Class Name Patents
204/298.17 Flux passes through target surface 146


Patents under this class:
1 2 3 4 5 6 7 8

Patent Number Title Of Patent Date Issued
8691063 Methods and apparatus for forming diamond-like coatings Apr. 8, 2014
8685214 Magnetic shunting pads for optimizing target erosion in sputtering processes Apr. 1, 2014
8668816 Self-ionized and inductively-coupled plasma for sputtering and resputtering Mar. 11, 2014
8628645 Manufacturing method for thin film battery Jan. 14, 2014
8617363 Magnetron sputtering apparatus Dec. 31, 2013
8597479 Sputtering system Dec. 3, 2013
8585873 Methods and apparatus for sputtering Nov. 19, 2013
8574410 Method and apparatus for improved high power impulse magnetron sputtering Nov. 5, 2013
8568577 Magnetron sputtering apparatus Oct. 29, 2013
8562798 Physical vapor deposition plasma reactor with RF source power applied to the target and having a magnetron Oct. 22, 2013
8500975 Method and apparatus for sputtering onto large flat panels Aug. 6, 2013
8496792 Rotary magnet sputtering apparatus Jul. 30, 2013
8486242 Deposition apparatus and methods to reduce deposition asymmetry Jul. 16, 2013
8470141 High power cathode Jun. 25, 2013
8470145 Cathode unit and sputtering apparatus provided with the same Jun. 25, 2013
8460522 Method of forming thin film and apparatus for forming thin film Jun. 11, 2013
8414968 In-line film forming apparatus and manufacturing method of magnetic recording medium Apr. 9, 2013
8388819 Magnet target and magnetron sputtering apparatus having the same Mar. 5, 2013
8382967 Magnetic device and magnetron sputtering device using the same Feb. 26, 2013
8377269 Sputtering apparatus Feb. 19, 2013
8377270 Plasma processing apparatus, magnetoresistive device manufacturing apparatus, magnetic thin film forming method, and film formation control program Feb. 19, 2013
8361283 Method and apparatus for cleaning a target of a sputtering apparatus Jan. 29, 2013
8349156 Microwave-assisted rotatable PVD Jan. 8, 2013
8343318 Magnetic lensing to improve deposition uniformity in a physical vapor deposition (PVD) process Jan. 1, 2013
8273221 Sputter target utilization Sep. 25, 2012
8246798 Substrate processing apparatus and apparatus and method of manufacturing magnetic device Aug. 21, 2012
8231767 Magnetic field generating apparatus and plasma processing apparatus Jul. 31, 2012
8206562 Apparatus and method for the application of a material layer to display devices Jun. 26, 2012
8157974 Magnet unit for magnetron sputtering system Apr. 17, 2012
8137518 Magnetic shunts in tubular targets Mar. 20, 2012
8137517 Dual position DC magnetron assembly Mar. 20, 2012
8101049 Method for producing low cost media Jan. 24, 2012
8097133 Evacuable magnetron chamber Jan. 17, 2012
8088263 Phased magnetic cathode Jan. 3, 2012
8070925 Physical vapor deposition reactor with circularly symmetric RF feed and DC feed to the sputter target Dec. 6, 2011
8057649 Microwave rotatable sputtering deposition Nov. 15, 2011
8043488 Rotatable sputter target Oct. 25, 2011
8038850 Sputter deposition method for forming integrated circuit Oct. 18, 2011
8016982 Sputtering apparatus and sputtering method Sep. 13, 2011
7932678 Magnetic mirror plasma source and method using same Apr. 26, 2011
7931787 Electron-assisted deposition process and apparatus Apr. 26, 2011
7846310 Encapsulated and water cooled electromagnet array Dec. 7, 2010
7799179 Sputtering cathode and device and method for coating a substrate with several layers Sep. 21, 2010
7744730 Rotating pallet in sputtering system Jun. 29, 2010
7744735 Ionized PVD with sequential deposition and etching Jun. 29, 2010
7718042 Method for manufacturing sputter-coated substrates, magnetron source and sputtering chamber with such source May. 18, 2010
7691243 Internal antennae for plasma processing with metal plasma Apr. 6, 2010
7686926 Multi-step process for forming a metal barrier in a sputter reactor Mar. 30, 2010
7686928 Pressure switched dual magnetron Mar. 30, 2010
7682495 Oscillating magnet in sputtering system Mar. 23, 2010

1 2 3 4 5 6 7 8










 
 
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