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Class Information
Number: 204/298.15
Name: Chemistry: electrical and wave energy > Apparatus > Coating, forming or etching by sputtering > Coating > Specified work holder
Description: Apparatus including significant specified means for holding a workpiece.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7571698 |
Low-frequency bias power in HDP-CVD processes |
Aug. 11, 2009 |
| 7520969 |
Notched deposition ring |
Apr. 21, 2009 |
| 7501161 |
Methods and apparatus for reducing arcing during plasma processing |
Mar. 10, 2009 |
| 7485198 |
Tantalum and niobium billets and methods of producing the same |
Feb. 3, 2009 |
| 7479210 |
Temperature control of pallet in sputtering system |
Jan. 20, 2009 |
| 7444955 |
Apparatus for directing plasma flow to coat internal passageways |
Nov. 4, 2008 |
| 7445697 |
Method and apparatus for fluid processing a workpiece |
Nov. 4, 2008 |
| 7407358 |
Interback-type substrate processing device |
Aug. 5, 2008 |
| 7361256 |
Electrolytic reactor |
Apr. 22, 2008 |
| 7273534 |
Optical device substrate film-formation apparatus, optical disk substrate film-formation method, substrate holder manufacture method, substrate holder, optical disk and a phase-change recordin |
Sep. 25, 2007 |
| 7204913 |
In-situ pre-coating of plasma etch chamber for improved productivity and chamber condition control |
Apr. 17, 2007 |
| 7182814 |
Sample holder for physical vapor deposition equipment |
Feb. 27, 2007 |
| 7163607 |
Process kit for improved power coupling through a workpiece in a semiconductor wafer processing system |
Jan. 16, 2007 |
| 7163608 |
Apparatus for synthesis of layers, coatings or films |
Jan. 16, 2007 |
| 7039501 |
Method for determining a position of a robot |
May. 2, 2006 |
| 6946064 |
Sample mount for performing sputter-deposition in a focused ion beam (FIB) tool |
Sep. 20, 2005 |
| 6936546 |
Apparatus for shaping thin films in the near-edge regions of in-process semiconductor substrates |
Aug. 30, 2005 |
| 6905578 |
Apparatus and method for multi-target physical-vapor deposition of a multi-layer material structure |
Jun. 14, 2005 |
| 6905582 |
Configurable vacuum system and method |
Jun. 14, 2005 |
| 6884319 |
Susceptor of apparatus for manufacturing semiconductor device |
Apr. 26, 2005 |
| 6878240 |
Apparatus and method for obtaining symmetrical junctions between a read sensor and hard bias layers |
Apr. 12, 2005 |
| 6869508 |
Physical vapor deposition apparatus and process |
Mar. 22, 2005 |
| 6855236 |
Components for vacuum deposition apparatus and vacuum deposition apparatus therewith, and target apparatus |
Feb. 15, 2005 |
| 6843892 |
Apparatus and method for selectively and controllably electrically biasing a plurality of substrates on a pallet |
Jan. 18, 2005 |
| 6841048 |
Coating apparatus for disk-shaped workpieces |
Jan. 11, 2005 |
| 6841049 |
OPTICAL DEVICE SUBSTRATE FILM-FORMATION APPARATUS, OPTICAL DISK SUBSTRATE FILM-FORMATION METHOD, SUBSTRATE HOLDER MANUFACTURE METHOD, SUBSTRATE HOLDER, OPTICAL DISK AND A PHASE-CHANGE RECORDIN |
Jan. 11, 2005 |
| 6818108 |
Chamber for the transport of workpieces in a vacuum atmosphere, a chamber combination and a method for transporting a workpiece |
Nov. 16, 2004 |
| 6802942 |
Storage plate support for receiving disk-shaped storage plates |
Oct. 12, 2004 |
| 6783596 |
Wafer handling device |
Aug. 31, 2004 |
| 6776887 |
Method and apparatus for thin film center shielding |
Aug. 17, 2004 |
| 6773562 |
Shadow frame for substrate processing |
Aug. 10, 2004 |
| 6749729 |
Method and apparatus for workpiece biassing utilizing non-arcing bias rail |
Jun. 15, 2004 |
| 6746540 |
Wafer support plate assembly having recessed upper pad and vacuum processing apparatus comprising the same |
Jun. 8, 2004 |
| 6743340 |
Sputtering of aligned magnetic materials and magnetic dipole ring used therefor |
Jun. 1, 2004 |
| 6743296 |
Apparatus and method for self-centering a wafer in a sputter chamber |
Jun. 1, 2004 |
| 6723214 |
Apparatus for improved power coupling through a workpiece in a semiconductor wafer processing system |
Apr. 20, 2004 |
| 6719886 |
Method and apparatus for ionized physical vapor deposition |
Apr. 13, 2004 |
| 6709556 |
Plasma processing apparatus |
Mar. 23, 2004 |
| 6699375 |
Method of extending process kit consumable recycling life |
Mar. 2, 2004 |
| 6695954 |
Plasma vapor deposition with coil sputtering |
Feb. 24, 2004 |
| 6689264 |
Semiconductor wafer clamp retainer |
Feb. 10, 2004 |
| 6676812 |
Alignment mark shielding ring without arcing defect and method for using |
Jan. 13, 2004 |
| 6652716 |
Apparatus and method for self-aligning a cover ring in a sputter chamber |
Nov. 25, 2003 |
| 6627056 |
Method and apparatus for ionized plasma deposition |
Sep. 30, 2003 |
| 6616816 |
Substrate processing device and method |
Sep. 9, 2003 |
| 6610180 |
Substrate processing device and method |
Aug. 26, 2003 |
| 6605195 |
Multi-layer deposition process using four ring sputter sources |
Aug. 12, 2003 |
| 6592729 |
In-line sputtering apparatus |
Jul. 15, 2003 |
| 6589352 |
Self aligning non contact shadow ring process kit |
Jul. 8, 2003 |
| 6579421 |
Transverse magnetic field for ionized sputter deposition |
Jun. 17, 2003 |
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