| |
 |
|
Class Information
Number: 204/298.14
Name: Chemistry: electrical and wave energy > Apparatus > Coating, forming or etching by sputtering > Coating > Specified anode particulars
Description: Apparatus wherein a significant anode feature or particular anode construction is specified.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7550055 |
Elastomer bonding of large area sputtering target |
Jun. 23, 2009 |
| 7537676 |
Cathode apparatus to selectively bias pallet during sputtering |
May. 26, 2009 |
| 7498587 |
Bi-directional filtered arc plasma source |
Mar. 3, 2009 |
| 7368041 |
Method for controlling plasma density or the distribution thereof |
May. 6, 2008 |
| 7361256 |
Electrolytic reactor |
Apr. 22, 2008 |
| 7347919 |
Sputter source, sputtering device, and sputtering method |
Mar. 25, 2008 |
| 7244344 |
Physical vapor deposition plasma reactor with VHF source power applied through the workpiece |
Jul. 17, 2007 |
| 7211179 |
Dual anode AC supply for continuous deposition of a cathode material |
May. 1, 2007 |
| 7182842 |
Device for amplifying the current of an abnormal electrical discharge and system for using an abnormal electrical discharge comprising one such device |
Feb. 27, 2007 |
| 7166199 |
Magnetron sputtering systems including anodic gas distribution systems |
Jan. 23, 2007 |
| 7147759 |
High-power pulsed magnetron sputtering |
Dec. 12, 2006 |
| 7135097 |
Box-shaped facing-targets sputtering apparatus and method for producing compound thin film |
Nov. 14, 2006 |
| 6972079 |
Dual magnetron sputtering apparatus utilizing control means for delivering balanced power |
Dec. 6, 2005 |
| 6969426 |
Forming improved metal nitrides |
Nov. 29, 2005 |
| 6960283 |
Anode and magnetron therewith |
Nov. 1, 2005 |
| 6896773 |
High deposition rate sputtering |
May. 24, 2005 |
| 6869509 |
Source for vacuum treatment process |
Mar. 22, 2005 |
| 6855236 |
Components for vacuum deposition apparatus and vacuum deposition apparatus therewith, and target apparatus |
Feb. 15, 2005 |
| 6818103 |
Method and apparatus for substrate biasing in multiple electrode sputtering systems |
Nov. 16, 2004 |
| 6783638 |
Flat magnetron |
Aug. 31, 2004 |
| 6767436 |
Method and apparatus of plasma-enhanced coaxial magnetron for sputter-coating interior surfaces |
Jul. 27, 2004 |
| 6761804 |
Inverted magnetron |
Jul. 13, 2004 |
| 6752911 |
Device and method for coating objects at a high temperature |
Jun. 22, 2004 |
| 6706155 |
Sputtering apparatus and film manufacturing method |
Mar. 16, 2004 |
| 6699374 |
Low temperature cathodic magnetron sputtering |
Mar. 2, 2004 |
| 6692617 |
Sustained self-sputtering reactor having an increased density plasma |
Feb. 17, 2004 |
| 6676752 |
Forming metal nitrides |
Jan. 13, 2004 |
| 6620298 |
Magnetron sputtering method and apparatus |
Sep. 16, 2003 |
| 6605198 |
Apparatus for, and method of, depositing a film on a substrate |
Aug. 12, 2003 |
| 6592729 |
In-line sputtering apparatus |
Jul. 15, 2003 |
| 6585871 |
Method of film deposition on substrate surface and substrate produced by the method |
Jul. 1, 2003 |
| 6579423 |
Light transmitting electromagnetic wave filter and process for producing the same |
Jun. 17, 2003 |
| 6562200 |
Thin-film formation system and thin-film formation process |
May. 13, 2003 |
| 6554979 |
Method and apparatus for bias deposition in a modulating electric field |
Apr. 29, 2003 |
| 6521099 |
Periodically clearing thin film plasma processing system |
Feb. 18, 2003 |
| 6521105 |
Sputtering apparatus |
Feb. 18, 2003 |
| 6495000 |
System and method for DC sputtering oxide films with a finned anode |
Dec. 17, 2002 |
| 6475353 |
Apparatus and method for sputter depositing dielectric films on a substrate |
Nov. 5, 2002 |
| 6471831 |
Apparatus and method for improving film uniformity in a physical vapor deposition system |
Oct. 29, 2002 |
| 6471836 |
Sputtering apparatus |
Oct. 29, 2002 |
| 6454920 |
Magnetron sputtering source |
Sep. 24, 2002 |
| 6440280 |
Multi-anode device and methods for sputter deposition |
Aug. 27, 2002 |
| 6432286 |
Conical sputtering target |
Aug. 13, 2002 |
| 6423161 |
High purity aluminum materials |
Jul. 23, 2002 |
| 6413392 |
Sputtering device |
Jul. 2, 2002 |
| 6406598 |
System and method for transporting and sputter coating a substrate in a sputter deposition system |
Jun. 18, 2002 |
| 6358376 |
Biased shield in a magnetron sputter reactor |
Mar. 19, 2002 |
| 6352627 |
Method and device for PVD coating |
Mar. 5, 2002 |
| 6352626 |
Sputter ion source for boron and other targets |
Mar. 5, 2002 |
| 6338777 |
Method and apparatus for sputtering thin films |
Jan. 15, 2002 |
|
|
|
