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Class Information
Number: 204/298.12
Name: Chemistry: electrical and wave energy > Apparatus > Coating, forming or etching by sputtering > Coating > Specified target particulars
Description: Apparatus wherein a significant target feature or particular target construction is specified.


Sub-classes under this class:

Class Number Class Name Patents
204/298.13 Target composition 375


Patents under this class:
1 2 3 4 5 6 7 8 9 10 11

Patent Number Title Of Patent Date Issued
7625471 Sacrificial cathode target for sputtering cathode assembly Dec. 1, 2009
7618520 Physical vapor deposition target constructions Nov. 17, 2009
7601246 Methods of sputtering a protective coating on a semiconductor substrate Oct. 13, 2009
7588668 Thermally conductive dielectric bonding of sputtering targets using diamond powder filler or thermally conductive ceramic fillers Sep. 15, 2009
7588669 Single-process-chamber deposition system Sep. 15, 2009
7585399 Rotating magnet arrays for magnetron sputtering apparatus Sep. 8, 2009
7578909 Method of forming CNT containing wiring material and sputtering target material used for the method Aug. 25, 2009
7575661 Reactive sputtering method Aug. 18, 2009
7575662 Method for operating a sputter cathode with a target Aug. 18, 2009
7566438 Method for manufacturing nanostructured manganese oxide having dendritic structure, and oxygen reduction electrode comprising nanostructured transition metal oxide having dendritic structure Jul. 28, 2009
7563488 Process for the manufacturing of a sputter target Jul. 21, 2009
7550066 Staggered target tiles Jun. 23, 2009
7550055 Elastomer bonding of large area sputtering target Jun. 23, 2009
7540976 Sputtering target for forming thin phosphor film Jun. 2, 2009
7531232 Component for vacuum apparatus, production method thereof and apparatus using the same May. 12, 2009
7521132 Coated tool Apr. 21, 2009
7504008 Refurbishment of sputtering targets Mar. 17, 2009
7476289 Vacuum elastomer bonding apparatus and method Jan. 13, 2009
7468110 Hollow cathode target and methods of making same Dec. 23, 2008
7467741 Method of forming a sputtering target assembly and assembly made therefrom Dec. 23, 2008
7431808 Sputter target based on titanium dioxide Oct. 7, 2008
7399387 Target for sputtering and a method for manufacturing a magnetic recording medium using the target Jul. 15, 2008
7381282 Co alloy target and its production method, soft magnetic film for perpendicular magnetic recording and perpendicular magnetic recording medium Jun. 3, 2008
7371285 Motorized chamber lid May. 13, 2008
7347353 Method for connecting magnetic substance target to backing plate, and magnetic substance target Mar. 25, 2008
7338582 Method for manufacturing manganese oxide nanostructure and oxygen reduction electrode using said manganese oxide nanostructure Mar. 4, 2008
7316763 Multiple target tiles with complementary beveled edges forming a slanted gap therebetween Jan. 8, 2008
7282122 Method and system for target lifetime Oct. 16, 2007
7282123 Composite sputter target and phosphor deposition method Oct. 16, 2007
7241368 Hafnium silicide target for gate oxide film formation and its production method Jul. 10, 2007
7235160 Hollow cathode sputtering apparatus and related method Jun. 26, 2007
7235162 Cathode for vacuum sputtering treatment machine Jun. 26, 2007
7229588 Mechanically alloyed precious metal magnetic sputtering targets fabricated using rapidly solidified alloy powders and elemental Pt metal Jun. 12, 2007
7186324 Hard film cutting tools, cutting tool coated with hard film, process for forming hard film and target used to form hard film Mar. 6, 2007
7175802 Refurbishing spent sputtering targets Feb. 13, 2007
7159537 Device for fixing a gas showerhead or target plate to an electrode in plasma processing systems Jan. 9, 2007
7156963 Tantalum sputtering target and method for preparation thereof Jan. 2, 2007
7156960 Method and device for continuous cold plasma deposition of metal coatings Jan. 2, 2007
7153399 Method and apparatus for producing uniform isotropic stresses in a sputtered film Dec. 26, 2006
7150810 Sputtering target and method for fabricating the same Dec. 19, 2006
7146703 Low temperature sputter target/backing plate method and assembly Dec. 12, 2006
7135097 Box-shaped facing-targets sputtering apparatus and method for producing compound thin film Nov. 14, 2006
7115193 Sputtering target producing very few particles, backing plate or apparatus within sputtering device and roughening method by electric discharge machining Oct. 3, 2006
7090754 Sputtering device Aug. 15, 2006
7087142 Method for determining a critical size of an inclusion in aluminum or aluminum alloy sputtering target Aug. 8, 2006
7087145 Sputtering cathode assembly Aug. 8, 2006
7074506 Method of forming a ceramic coating on a substrate by electron-beam physical vapor deposition Jul. 11, 2006
7063773 High purity sputter targets with target end-of-life indication and method of manufacture Jun. 20, 2006
7063984 Low temperature deposition of complex metal oxides (CMO) memory materials for non-volatile memory integrated circuits Jun. 20, 2006
7041204 Physical vapor deposition components and methods of formation May. 9, 2006

1 2 3 4 5 6 7 8 9 10 11


 
 
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