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Browse by Category: Main > Chemistry
Class Information
Number: 204/298.11
Name: Chemistry: electrical and wave energy > Apparatus > Coating, forming or etching by sputtering > Coating > Specified mask, shield or shutter
Description: Apparatus including significant specified means for masking, shielding or shuttering of electrodes or workpieces.


Patents under this class:
1 2 3 4 5 6 7 8 9 10 11 12

Patent Number Title Of Patent Date Issued
7591935 Enhanced reliability deposition baffle for iPVD Sep. 22, 2009
7569125 Shields usable with an inductively coupled plasma reactor Aug. 4, 2009
7548304 Chuck plate assembly with cooling means Jun. 16, 2009
7537676 Cathode apparatus to selectively bias pallet during sputtering May. 26, 2009
7531232 Component for vacuum apparatus, production method thereof and apparatus using the same May. 12, 2009
7520969 Notched deposition ring Apr. 21, 2009
7517438 Magnetic recording disk, magnetic recording disk manufacturing method and magnetic recording disk manufacturing system Apr. 14, 2009
7517437 RF powered target for increasing deposition uniformity in sputtering systems Apr. 14, 2009
7498587 Bi-directional filtered arc plasma source Mar. 3, 2009
7489494 Guard wafer for semiconductor structure fabrication Feb. 10, 2009
7462854 Collimator fabrication Dec. 9, 2008
7445697 Method and apparatus for fluid processing a workpiece Nov. 4, 2008
7407565 Method and apparatus for ionized plasma deposition Aug. 5, 2008
7404879 Ionized physical vapor deposition apparatus using helical self-resonant coil Jul. 29, 2008
7374648 Single piece coil support assemblies, coil constructions and methods of assembling coil constructions May. 20, 2008
7372689 Guard wafer for semiconductor structure fabrication May. 13, 2008
7338581 Sputtering apparatus Mar. 4, 2008
7309842 Shielded monolithic microplasma source for prevention of continuous thin film formation Dec. 18, 2007
7306707 Adaptable processing element for a processing system and a method of making the same Dec. 11, 2007
7294242 Collimated and long throw magnetron sputtering of nickel/iron films for magnetic recording head applications Nov. 13, 2007
7294245 Cover ring and shield supporting a wafer ring in a plasma reactor Nov. 13, 2007
7285196 Methods and apparatus for making integrated-circuit wiring from copper, silver, gold, and other metals Oct. 23, 2007
7244344 Physical vapor deposition plasma reactor with VHF source power applied through the workpiece Jul. 17, 2007
7241397 Honeycomb optical window deposition shield and method for a plasma processing system Jul. 10, 2007
7229532 Sputtering apparatus Jun. 12, 2007
7223448 Methods for providing uniformity in plasma-assisted material processes May. 29, 2007
7182816 Particulate reduction using temperature-controlled chamber shield Feb. 27, 2007
7179335 In situ adaptive masks Feb. 20, 2007
7163607 Process kit for improved power coupling through a workpiece in a semiconductor wafer processing system Jan. 16, 2007
7150859 Microarray fabricating device Dec. 19, 2006
7115193 Sputtering target producing very few particles, backing plate or apparatus within sputtering device and roughening method by electric discharge machining Oct. 3, 2006
7097744 Method and apparatus for controlling darkspace gap in a chamber Aug. 29, 2006
7097750 Device for fixing substrate for thin film sputter and method of fixing substrate using the same Aug. 29, 2006
7062348 Dynamic mask for producing uniform or graded-thickness thin films Jun. 13, 2006
7048837 End point detection for sputtering and resputtering May. 23, 2006
7041200 Reducing particle generation during sputter deposition May. 9, 2006
7041201 Sidewall magnet improving uniformity of inductively coupled plasma and shields used therewith May. 9, 2006
7033461 Thin film forming apparatus and method Apr. 25, 2006
7011733 Method and apparatus for depositing films Mar. 14, 2006
7008517 Shutter disk and blade for physical vapor deposition chamber Mar. 7, 2006
7008520 Sputtering device Mar. 7, 2006
7001491 Vacuum-processing chamber-shield and multi-chamber pumping method Feb. 21, 2006
6998033 Sputtering cathode adapter assembly and method Feb. 14, 2006
6955726 Mask and mask frame assembly for evaporation Oct. 18, 2005
6929725 Sputter ions source Aug. 16, 2005
6929724 Shutter Aug. 16, 2005
6929720 Sputtering source for ionized physical vapor deposition of metals Aug. 16, 2005
6911129 Combinatorial synthesis of material chips Jun. 28, 2005
6905578 Apparatus and method for multi-target physical-vapor deposition of a multi-layer material structure Jun. 14, 2005
6902623 Reactor having a movable shutter Jun. 7, 2005

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