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Class Information
Number: 204/298.09
Name: Chemistry: electrical and wave energy > Apparatus > Coating, forming or etching by sputtering > Coating > Specified cooling or heating
Description: Apparatus including significant specified means for cooling or heating of an electrode or work holder.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7588668 |
Thermally conductive dielectric bonding of sputtering targets using diamond powder filler or thermally conductive ceramic fillers |
Sep. 15, 2009 |
| 7560011 |
Sputtering target and method/apparatus for cooling the target |
Jul. 14, 2009 |
| 7548304 |
Chuck plate assembly with cooling means |
Jun. 16, 2009 |
| 7520965 |
Magnetron sputtering apparatus and method for depositing a coating using same |
Apr. 21, 2009 |
| 7513981 |
Manufacturing apparatus of semiconductor device |
Apr. 7, 2009 |
| 7513982 |
Two dimensional magnetron scanning for flat panel sputtering |
Apr. 7, 2009 |
| 7504011 |
Sputtering target and method/apparatus for cooling the target |
Mar. 17, 2009 |
| 7479210 |
Temperature control of pallet in sputtering system |
Jan. 20, 2009 |
| 7413639 |
Energy and media connection for a coating installation comprising several chambers |
Aug. 19, 2008 |
| 7235162 |
Cathode for vacuum sputtering treatment machine |
Jun. 26, 2007 |
| 7156960 |
Method and device for continuous cold plasma deposition of metal coatings |
Jan. 2, 2007 |
| 7156961 |
Sputtering apparatus and film forming method |
Jan. 2, 2007 |
| 7150792 |
Film deposition system and film deposition method using the same |
Dec. 19, 2006 |
| 7101466 |
Linear sweeping magnetron sputtering cathode and scanning in-line system for arc-free reactive deposition and high target utilization |
Sep. 5, 2006 |
| 7087145 |
Sputtering cathode assembly |
Aug. 8, 2006 |
| 7056416 |
Atmospheric pressure plasma processing method and apparatus |
Jun. 6, 2006 |
| 7000418 |
Capacitance sensing for substrate cooling |
Feb. 21, 2006 |
| 6916399 |
Temperature controlled window with a fluid supply system |
Jul. 12, 2005 |
| 6907924 |
Thermally conductive chuck for vacuum processor |
Jun. 21, 2005 |
| 6905578 |
Apparatus and method for multi-target physical-vapor deposition of a multi-layer material structure |
Jun. 14, 2005 |
| 6893544 |
Apparatus and method for depositing thin films on a glass substrate |
May. 17, 2005 |
| 6881311 |
Facing-targets-type sputtering apparatus |
Apr. 19, 2005 |
| 6881310 |
Cooling system for magnetron sputtering apparatus |
Apr. 19, 2005 |
| 6869509 |
Source for vacuum treatment process |
Mar. 22, 2005 |
| 6841202 |
Device and method for the vacuum plasma processing of objects |
Jan. 11, 2005 |
| 6811662 |
Sputtering apparatus and manufacturing method of metal layer/metal compound layer by using thereof |
Nov. 2, 2004 |
| 6806653 |
Method and structure to segment RF coupling to silicon electrode |
Oct. 19, 2004 |
| 6802942 |
Storage plate support for receiving disk-shaped storage plates |
Oct. 12, 2004 |
| 6800177 |
Apparatus and method for fabricating carbon thin film |
Oct. 5, 2004 |
| 6787010 |
Non-thermionic sputter material transport device, methods of use, and materials produced thereby |
Sep. 7, 2004 |
| 6767436 |
Method and apparatus of plasma-enhanced coaxial magnetron for sputter-coating interior surfaces |
Jul. 27, 2004 |
| 6761804 |
Inverted magnetron |
Jul. 13, 2004 |
| 6752911 |
Device and method for coating objects at a high temperature |
Jun. 22, 2004 |
| 6740210 |
Sputtering method for forming film and apparatus therefor |
May. 25, 2004 |
| 6736948 |
Cylindrical AC/DC magnetron with compliant drive system and improved electrical and thermal isolation |
May. 18, 2004 |
| 6699374 |
Low temperature cathodic magnetron sputtering |
Mar. 2, 2004 |
| 6689486 |
Bimorphic, compositionally-graded, sputter-deposited, thin film shape memory device |
Feb. 10, 2004 |
| 6689254 |
Sputtering apparatus with isolated coolant and sputtering target therefor |
Feb. 10, 2004 |
| 6673716 |
Control of the deposition temperature to reduce the via and contact resistance of Ti and TiN deposited using ionized PVD techniques |
Jan. 6, 2004 |
| 6641701 |
Cooling system for magnetron sputtering apparatus |
Nov. 4, 2003 |
| 6635154 |
Method and apparatus for multi-target sputtering |
Oct. 21, 2003 |
| 6623610 |
Magnetron sputtering target for magnetic materials |
Sep. 23, 2003 |
| 6610180 |
Substrate processing device and method |
Aug. 26, 2003 |
| 6602348 |
Substrate cooldown chamber |
Aug. 5, 2003 |
| 6582572 |
Target fabrication method for cylindrical cathodes |
Jun. 24, 2003 |
| 6551471 |
Ionization film-forming method and apparatus |
Apr. 22, 2003 |
| 6514376 |
Thermal control apparatus for inductively coupled RF plasma reactor having an overhead solenoidal antenna |
Feb. 4, 2003 |
| 6500314 |
Plasma etch reactor and method |
Dec. 31, 2002 |
| 6494999 |
Magnetron sputtering apparatus with an integral cooling and pressure relieving cathode |
Dec. 17, 2002 |
| 6495008 |
Method for making polycrystalline thin film and associated oxide superconductor and apparatus therefor |
Dec. 17, 2002 |
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