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Class Information
Number: 204/298.08
Name: Chemistry: electrical and wave energy > Apparatus > Coating, forming or etching by sputtering > Coating > Specified power supply or matching network
Description: Apparatus including significant specified power supply means or matching network means.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7604716 |
Methods and apparatus for generating high-density plasma |
Oct. 20, 2009 |
| 7588669 |
Single-process-chamber deposition system |
Sep. 15, 2009 |
| 7544276 |
Biased pulse DC reactive sputtering of oxide films |
Jun. 9, 2009 |
| 7531070 |
Sputtering power-supply unit |
May. 12, 2009 |
| 7517437 |
RF powered target for increasing deposition uniformity in sputtering systems |
Apr. 14, 2009 |
| 7455755 |
Vacuum plasma generator |
Nov. 25, 2008 |
| 7445695 |
Method and system for conditioning a vapor deposition target |
Nov. 4, 2008 |
| 7422664 |
Method for plasma ignition |
Sep. 9, 2008 |
| 7420182 |
Combined radio frequency and hall effect ion source and plasma accelerator system |
Sep. 2, 2008 |
| 7413639 |
Energy and media connection for a coating installation comprising several chambers |
Aug. 19, 2008 |
| 7374648 |
Single piece coil support assemblies, coil constructions and methods of assembling coil constructions |
May. 20, 2008 |
| 7309842 |
Shielded monolithic microplasma source for prevention of continuous thin film formation |
Dec. 18, 2007 |
| 7261797 |
Passive bipolar arc control system and method |
Aug. 28, 2007 |
| 7247221 |
System and apparatus for control of sputter deposition process |
Jul. 24, 2007 |
| 7244344 |
Physical vapor deposition plasma reactor with VHF source power applied through the workpiece |
Jul. 17, 2007 |
| 7244343 |
Sputtering apparatus |
Jul. 17, 2007 |
| 7211179 |
Dual anode AC supply for continuous deposition of a cathode material |
May. 1, 2007 |
| 7204921 |
Vacuum apparatus and vacuum processing method |
Apr. 17, 2007 |
| 7186314 |
Plasma processor and plasma processing method |
Mar. 6, 2007 |
| 7179350 |
Reactive sputtering of silicon nitride films by RF supported DC magnetron |
Feb. 20, 2007 |
| 7176634 |
Coaxial type impedance matching device and impedance detecting method for plasma generation |
Feb. 13, 2007 |
| 7166199 |
Magnetron sputtering systems including anodic gas distribution systems |
Jan. 23, 2007 |
| 7156960 |
Method and device for continuous cold plasma deposition of metal coatings |
Jan. 2, 2007 |
| 7153410 |
Methods and apparatus for electrochemical-mechanical processing of microelectronic workpieces |
Dec. 26, 2006 |
| 7150805 |
Plasma process device |
Dec. 19, 2006 |
| 7147759 |
High-power pulsed magnetron sputtering |
Dec. 12, 2006 |
| 7132040 |
Matching unit for semiconductor plasma processing apparatus |
Nov. 7, 2006 |
| 7094313 |
Universal mid-frequency matching network |
Aug. 22, 2006 |
| 7049751 |
Termination of secondary frequencies in RF power delivery |
May. 23, 2006 |
| 6972079 |
Dual magnetron sputtering apparatus utilizing control means for delivering balanced power |
Dec. 6, 2005 |
| 6936144 |
High frequency plasma source |
Aug. 30, 2005 |
| 6923891 |
Copper interconnects |
Aug. 2, 2005 |
| 6911123 |
Facing-targets-type sputtering apparatus and method |
Jun. 28, 2005 |
| 6896773 |
High deposition rate sputtering |
May. 24, 2005 |
| 6888313 |
Impedance matching network with termination of secondary RF frequencies |
May. 3, 2005 |
| 6878248 |
Method of manufacturing an object in a vacuum recipient |
Apr. 12, 2005 |
| 6876205 |
Stored energy arc detection and arc reduction circuit |
Apr. 5, 2005 |
| 6863789 |
Passive bipolar arc control system and method |
Mar. 8, 2005 |
| 6863785 |
Sputtering apparatus and sputter film deposition method |
Mar. 8, 2005 |
| 6860973 |
Device for the regulation of a plasma impedance |
Mar. 1, 2005 |
| 6824658 |
Partial turn coil for generating a plasma |
Nov. 30, 2004 |
| 6824653 |
Magnetron with controlled DC power |
Nov. 30, 2004 |
| 6825618 |
Distributed inductively-coupled plasma source and circuit for coupling induction coils to RF power supply |
Nov. 30, 2004 |
| 6818103 |
Method and apparatus for substrate biasing in multiple electrode sputtering systems |
Nov. 16, 2004 |
| 6819052 |
Coaxial type impedance matching device and impedance detecting method for plasma generation |
Nov. 16, 2004 |
| 6814838 |
Vacuum treatment chamber and method for treating surfaces |
Nov. 9, 2004 |
| 6808607 |
High peak power plasma pulsed supply with arc handling |
Oct. 26, 2004 |
| 6783639 |
Coils for generating a plasma and for sputtering |
Aug. 31, 2004 |
| 6783641 |
Vacuum treatment system and process for manufacturing workpieces |
Aug. 31, 2004 |
| 6777881 |
Power supply apparatus for generating plasma |
Aug. 17, 2004 |
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