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Class Information
Number: 204/298.07
Name: Chemistry: electrical and wave energy > Apparatus > Coating, forming or etching by sputtering > Coating > Specified gas feed or withdrawal
Description: Apparatus including significant specified means for feeding or withdrawing reactive or inert gases from the coating chamber.










Patents under this class:
1 2 3 4 5 6 7 8

Patent Number Title Of Patent Date Issued
5879461 Metered gas control in a substrate processing apparatus Mar. 9, 1999
5876573 High magnetic flux cathode apparatus and method for high productivity physical-vapor deposition Mar. 2, 1999
5873942 Apparatus and method for low pressure chemical vapor deposition using multiple chambers and vacuum pumps Feb. 23, 1999
5873989 Methods and apparatus for linear scan magnetron sputtering Feb. 23, 1999
5855745 Plasma processing system utilizing combined anode/ ion source Jan. 5, 1999
5851365 Low pressure reactive magnetron sputtering apparatus and method Dec. 22, 1998
5851294 Gas injection system for semiconductor processing Dec. 22, 1998
5849162 Sputtering device and method for reactive for reactive sputtering Dec. 15, 1998
5830330 Method and apparatus for low pressure sputtering Nov. 3, 1998
5827409 Method and apparatus for forming thin film for liquid crystal display Oct. 27, 1998
5824158 Chemical vapor deposition using inductively coupled plasma and system therefor Oct. 20, 1998
5810982 Preferential sputtering of insulators from conductive targets Sep. 22, 1998
5804089 Plasma processing apparatus and method Sep. 8, 1998
5800686 Chemical vapor deposition chamber with substrate edge protection Sep. 1, 1998
5798029 Target for sputtering equipment Aug. 25, 1998
5792272 Plasma enhanced chemical processing reactor and method Aug. 11, 1998
5792324 Method and apparatus of forming a thin film Aug. 11, 1998
5792269 Gas distribution for CVD systems Aug. 11, 1998
5788825 Vacuum pumping system for a sputtering device Aug. 4, 1998
5789324 Uniform gas flow arrangements Aug. 4, 1998
5789322 Low volume gas distribution assembly for a chemical downstream etch tool Aug. 4, 1998
5783023 Gas injector for use in semiconductor etching process Jul. 21, 1998
5778682 Reactive PVD with NEG pump Jul. 14, 1998
5772771 Deposition chamber for improved deposition thickness uniformity Jun. 30, 1998
5755888 Method and apparatus of forming thin films May. 26, 1998
5755886 Apparatus for preventing deposition gases from contacting a selected region of a substrate during deposition processing May. 26, 1998
5747362 Method of manufacturing a semiconductor device in which a layer of material is deposited on the surface of a semiconductor wafer from a process gas May. 5, 1998
5744016 Sputtering apparatus Apr. 28, 1998
5741363 Interiorly partitioned vapor injector for delivery of source reagent vapor mixtures for chemical vapor deposition Apr. 21, 1998
5736019 Sputtering cathode Apr. 7, 1998
5733418 Sputtering method and apparatus Mar. 31, 1998
5728278 Plasma processing apparatus Mar. 17, 1998
5728260 Low volume gas distribution assembly and method for a chemical downstream etch tool Mar. 17, 1998
5718815 Apparatus for coating a substrate from an electrically conductive target Feb. 17, 1998
5716484 Contaminant reduction improvements for plasma etch chambers Feb. 10, 1998
5716500 Method and an apparatus for generation of a discharge in own vapors of a radio frequency electrode for sustained self-sputtering and evaporation of the electrode Feb. 10, 1998
5707451 Method and apparatus for cleaning a throttle valve Jan. 13, 1998
5705044 Modular sputtering machine having batch processing and serial thin film sputtering Jan. 6, 1998
5702573 Method and apparatus for improved low pressure collimated magnetron sputter deposition of metal films Dec. 30, 1997
5690796 Method and apparatus for layer depositions Nov. 25, 1997
5688389 Method and apparatus for thin film coating an article Nov. 18, 1997
5685963 In situ getter pump system and method Nov. 11, 1997
5683537 Plasma processing apparatus Nov. 4, 1997
5676205 Quasi-infinite heat source/sink Oct. 14, 1997
5672255 Sputtering device Sep. 30, 1997
5667650 High flow gas manifold for high rate, off-axis sputter deposition Sep. 16, 1997
5662784 Apparatus for applying thin layers to a substrate Sep. 2, 1997
5660693 Ion vapour deposition apparatus and method Aug. 26, 1997
5660740 Treatment apparatus control method Aug. 26, 1997
5656138 Very high vacuum magnetron sputtering method and apparatus for precision optical coatings Aug. 12, 1997

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