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Browse by Category: Main > Chemistry
Class Information
Number: 204/298.07
Name: Chemistry: electrical and wave energy > Apparatus > Coating, forming or etching by sputtering > Coating > Specified gas feed or withdrawal
Description: Apparatus including significant specified means for feeding or withdrawing reactive or inert gases from the coating chamber.










Patents under this class:
1 2 3 4 5 6 7 8

Patent Number Title Of Patent Date Issued
6136160 Process for producing a carbon film on a substrate Oct. 24, 2000
6132563 Reactive sputtering process Oct. 17, 2000
6132569 Method for producing photovoltaic element Oct. 17, 2000
6126792 Method for the application of a scratch protection layer and an antireflection coating system and apparatus for its execution Oct. 3, 2000
6116185 Gas injector for plasma enhanced chemical vapor deposition Sep. 12, 2000
6113749 Sputtering method in multi-chambered device Sep. 5, 2000
6113754 Sputtering apparatus having a target backing plate equipped with a cooling line and sputtering method using the same Sep. 5, 2000
6113760 Power supply apparatus for sputtering and a sputtering apparatus using the power supply apparatus Sep. 5, 2000
6110287 Plasma processing method and plasma processing apparatus Aug. 29, 2000
6110336 High pressure magnetron cathode assembly and sputtering apparatus utilizing same Aug. 29, 2000
6110330 Process for bonding lubricant to magnetic disk Aug. 29, 2000
6103069 Chamber design with isolation valve to preserve vacuum during maintenance Aug. 15, 2000
6103079 Anti-leakage apparatus Aug. 15, 2000
6093281 Baffle plate design for decreasing conductance lost during precipitation of polymer precursors in plasma etching chambers Jul. 25, 2000
6093293 Magnetron sputtering source Jul. 25, 2000
6090209 Thermal conditioning apparatus Jul. 18, 2000
6090247 Apparatus for coating substrates Jul. 18, 2000
6083321 Fluid delivery system and method Jul. 4, 2000
6083361 Sputter device Jul. 4, 2000
6083365 Method for forming a thin film and apparatus for the same Jul. 4, 2000
6080284 Sputtering apparatus and method for manufacturing compound thin film Jun. 27, 2000
6080286 Sputtering method and apparatus using a trigger gas feed Jun. 27, 2000
6068738 Method and apparatus for thin film coating an article May. 30, 2000
6066240 Method and device for manufacturing a thin film and magnetic recording medium May. 23, 2000
6059940 Method for fabricating dual layer protective barrier copper metallization May. 9, 2000
6051113 Apparatus and method for multi-target physical-vapor deposition of a multi-layer material structure using target indexing Apr. 18, 2000
6045667 Process and system for the treatment of substrates using ions from a low-voltage arc discharge Apr. 4, 2000
6039848 Ultra-high vacuum apparatus and method for high productivity physical vapor deposition. Mar. 21, 2000
6030508 Sputter etching chamber having a gas baffle with improved uniformity Feb. 29, 2000
6022461 Sputtering apparatus Feb. 8, 2000
6013159 Particle trap in a magnetron sputtering chamber Jan. 11, 2000
5996528 Method and apparatus for flowing gases into a manifold at high potential Dec. 7, 1999
5993594 Particle controlling method and apparatus for a plasma processing chamber Nov. 30, 1999
5993622 Apparatus for coating a web on a rotating drum by plasma assisted vapor deposition Nov. 30, 1999
5985033 Apparatus and method for delivering a gas Nov. 16, 1999
5980687 Plasma processing apparatus comprising a compensating-process-gas supply means in synchronism with a rotating magnetic field Nov. 9, 1999
5975011 Apparatus for fabricating spherical shaped semiconductor integrated circuits Nov. 2, 1999
5976308 High density plasma CVD and etching reactor Nov. 2, 1999
5972183 Getter pump module and system Oct. 26, 1999
5968276 Heat exchange passage connection Oct. 19, 1999
5951834 Vacuum processing apparatus Sep. 14, 1999
5942089 Method for sputtering compounds on a substrate Aug. 24, 1999
5942074 Single-piece gas director for plasma reactors Aug. 24, 1999
5935395 Substrate processing apparatus with non-evaporable getter pump Aug. 10, 1999
5925227 Multichamber sputtering apparatus Jul. 20, 1999
5922181 Black matrix laminated film and reactive sputtering apparatus Jul. 13, 1999
5914017 Apparatus for, and method of, removing hydrocarbons from the surface of a substrate Jun. 22, 1999
5907220 Magnetron for low pressure full face erosion May. 25, 1999
5895530 Method and apparatus for directing fluid through a semiconductor processing chamber Apr. 20, 1999
5885358 Gas injection slit nozzle for a plasma process reactor Mar. 23, 1999

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