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Class Information
Number: 204/298.07
Name: Chemistry: electrical and wave energy > Apparatus > Coating, forming or etching by sputtering > Coating > Specified gas feed or withdrawal
Description: Apparatus including significant specified means for feeding or withdrawing reactive or inert gases from the coating chamber.

Patents under this class:
1 2 3 4 5 6 7 8

Patent Number Title Of Patent Date Issued
6475354 Deposited film producing process, photovoltaic device producing process, and deposited film producing system Nov. 5, 2002
6464843 Contamination controlling method and apparatus for a plasma processing chamber Oct. 15, 2002
6461483 Method and apparatus for performing high pressure physical vapor deposition Oct. 8, 2002
6458251 Pressure modulation method to obtain improved step coverage of seed layer Oct. 1, 2002
6454920 Magnetron sputtering source Sep. 24, 2002
6451184 Thin film forming apparatus and process for forming thin film using same Sep. 17, 2002
6436509 Electrically insulating sealing structure and its method of use in a semiconductor manufacturing apparatus Aug. 20, 2002
6432203 Heated and cooled vacuum chamber shield Aug. 13, 2002
6432260 Inductively coupled ring-plasma source apparatus for processing gases and materials and method thereof Aug. 13, 2002
6416634 Method and apparatus for reducing target arcing during sputter deposition Jul. 9, 2002
6395157 Method and apparatus for sputter etch conditioning a ceramic body May. 28, 2002
6375810 Plasma vapor deposition with coil sputtering Apr. 23, 2002
6365013 Coating method and device Apr. 2, 2002
6363624 Apparatus for cleaning a semiconductor process chamber Apr. 2, 2002
6350320 Heater for processing chamber Feb. 26, 2002
6337001 Process for sputter coating, a sputter coating source, and sputter coating apparatus with at least one such source Jan. 8, 2002
6319371 Film forming apparatus Nov. 20, 2001
6315877 Device for applying layers of hard material by dusting Nov. 13, 2001
6315879 Modular deposition system having batch processing and serial thin film deposition Nov. 13, 2001
6299746 Getter system for purifying the confinement volume in process chambers Oct. 9, 2001
6296712 Chemical vapor deposition hardware and process Oct. 2, 2001
6296747 Baffled perforated shield in a plasma sputtering reactor Oct. 2, 2001
6296742 Method and apparatus for magnetically enhanced sputtering Oct. 2, 2001
6287435 Method and apparatus for ionized physical vapor deposition Sep. 11, 2001
6280585 Sputtering apparatus for filling pores of a circular substrate Aug. 28, 2001
6258217 Rotating magnet array and sputter source Jul. 10, 2001
6251187 Gas distribution in deposition chambers Jun. 26, 2001
6251230 Method and device for manufacturing a thin film and magnestic recording medium Jun. 26, 2001
6248176 Apparatus and method for delivering a gas Jun. 19, 2001
6248223 Sputtering apparatus Jun. 19, 2001
6238527 Thin film forming apparatus and method of forming thin film of compound by using the same May. 29, 2001
6238526 Ion-beam source with channeling sputterable targets and a method for channeled sputtering May. 29, 2001
6231672 Apparatus for depositing thin films on semiconductor wafer by continuous gas injection May. 15, 2001
6228234 Apparatus for sputtering May. 8, 2001
6224724 Physical vapor processing of a surface with non-uniformity compensation May. 1, 2001
6221217 Physical vapor deposition system having reduced thickness backing plate Apr. 24, 2001
6217730 Sputtering device Apr. 17, 2001
6217719 Process for thin film formation by sputtering Apr. 17, 2001
6207006 Vacuum processing apparatus Mar. 27, 2001
6206976 Deposition apparatus and related method with controllable edge exclusion Mar. 27, 2001
6200431 Reactive sputtering apparatus and process for forming thin film using same Mar. 13, 2001
6187158 Device for coating plate-shaped substrates Feb. 13, 2001
6176980 Sputtering method and apparatus Jan. 23, 2001
6176982 Method of applying a coating to a metallic article and an apparatus for applying a coating to a metallic article Jan. 23, 2001
6171454 Method for coating surfaces using a facility having sputter electrodes Jan. 9, 2001
6171458 Method for manufacturing an absorbent layer for solar collectors, a device for performing the method and an absorbent layer for solar collectors Jan. 9, 2001
6171461 Sputtering cathode Jan. 9, 2001
6168698 Apparatus for coating a substrate Jan. 2, 2001
6156164 Virtual shutter method and apparatus for preventing damage to gallium arsenide substrates during processing Dec. 5, 2000
6153061 Method of synthesizing cubic boron nitride films Nov. 28, 2000

1 2 3 4 5 6 7 8

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