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Browse by Category: Main > Chemistry
Class Information
Number: 204/298.07
Name: Chemistry: electrical and wave energy > Apparatus > Coating, forming or etching by sputtering > Coating > Specified gas feed or withdrawal
Description: Apparatus including significant specified means for feeding or withdrawing reactive or inert gases from the coating chamber.










Patents under this class:
1 2 3 4 5 6 7 8

Patent Number Title Of Patent Date Issued
7166233 Pulsed plasma processing method and apparatus Jan. 23, 2007
7166199 Magnetron sputtering systems including anodic gas distribution systems Jan. 23, 2007
7147793 Method of and apparatus for tailoring an etch profile Dec. 12, 2006
7141145 Gas injection for uniform composition reactively sputter-deposited thin films Nov. 28, 2006
7104217 Plasma processing apparatus Sep. 12, 2006
7094313 Universal mid-frequency matching network Aug. 22, 2006
6936546 Apparatus for shaping thin films in the near-edge regions of in-process semiconductor substrates Aug. 30, 2005
6896773 High deposition rate sputtering May. 24, 2005
6884298 Method and system for coating and developing Apr. 26, 2005
6881305 Heated and cooled vacuum chamber shield Apr. 19, 2005
6881295 Air-tight vessel equipped with gas feeder uniformly supplying gaseous component around plural wafers Apr. 19, 2005
6841048 Coating apparatus for disk-shaped workpieces Jan. 11, 2005
6837966 Method and apparatus for an improved baffle plate in a plasma processing system Jan. 4, 2005
6830664 Cluster tool with a hollow cathode array Dec. 14, 2004
6821378 Pump baffle and screen to improve etch uniformity Nov. 23, 2004
6818068 Conveyor for treating hollow bodies comprising an advanced pressure distribution circuit Nov. 16, 2004
6814837 Controlled gas supply line apparatus and process for infilm and onfilm defect reduction Nov. 9, 2004
6806030 Information recording medium and method for manufacturing information recording medium Oct. 19, 2004
6802942 Storage plate support for receiving disk-shaped storage plates Oct. 12, 2004
6800177 Apparatus and method for fabricating carbon thin film Oct. 5, 2004
6787010 Non-thermionic sputter material transport device, methods of use, and materials produced thereby Sep. 7, 2004
6783641 Vacuum treatment system and process for manufacturing workpieces Aug. 31, 2004
6764658 Plasma generator Jul. 20, 2004
6752911 Device and method for coating objects at a high temperature Jun. 22, 2004
6743341 Apparatus for applying thin layers to a substrate Jun. 1, 2004
6737812 Plasma processing apparatus May. 18, 2004
6733621 Venting apparatus and method for vacuum system May. 11, 2004
6709556 Plasma processing apparatus Mar. 23, 2004
6695954 Plasma vapor deposition with coil sputtering Feb. 24, 2004
6692622 Plasma processing apparatus with an electrically conductive wall Feb. 17, 2004
6682634 Apparatus for sputter deposition Jan. 27, 2004
6669987 Method for vacuum treatment of workpieces and vacuum treatment facility Dec. 30, 2003
6649036 Mirrortron sputtering apparatus Nov. 18, 2003
6627056 Method and apparatus for ionized plasma deposition Sep. 30, 2003
6620288 Substrate treatment apparatus Sep. 16, 2003
6605198 Apparatus for, and method of, depositing a film on a substrate Aug. 12, 2003
6592729 In-line sputtering apparatus Jul. 15, 2003
6579421 Transverse magnetic field for ionized sputter deposition Jun. 17, 2003
6572744 Dual collimated deposition apparatus and method of use Jun. 3, 2003
6562200 Thin-film formation system and thin-film formation process May. 13, 2003
6551471 Ionization film-forming method and apparatus Apr. 22, 2003
6537428 Stable high rate reactive sputtering Mar. 25, 2003
6530732 Single substrate load lock with offset cool module and buffer chamber Mar. 11, 2003
6531069 Reactive Ion Etching chamber design for flip chip interconnections Mar. 11, 2003
6511584 Configuration for coating a substrate by means of a sputtering device Jan. 28, 2003
6500314 Plasma etch reactor and method Dec. 31, 2002
6500264 Continuous thermal evaporation system Dec. 31, 2002
6494998 Process apparatus and method for improving plasma distribution and performance in an inductively coupled plasma using an internal inductive element Dec. 17, 2002
6488824 Sputtering apparatus and process for high rate coatings Dec. 3, 2002
6475353 Apparatus and method for sputter depositing dielectric films on a substrate Nov. 5, 2002

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