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Class Information
Number: 204/298.07
Name: Chemistry: electrical and wave energy > Apparatus > Coating, forming or etching by sputtering > Coating > Specified gas feed or withdrawal
Description: Apparatus including significant specified means for feeding or withdrawing reactive or inert gases from the coating chamber.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7601246 |
Methods of sputtering a protective coating on a semiconductor substrate |
Oct. 13, 2009 |
| 7588668 |
Thermally conductive dielectric bonding of sputtering targets using diamond powder filler or thermally conductive ceramic fillers |
Sep. 15, 2009 |
| 7582194 |
Method and apparatus for forming fluoride thin film |
Sep. 1, 2009 |
| 7575661 |
Reactive sputtering method |
Aug. 18, 2009 |
| 7513981 |
Manufacturing apparatus of semiconductor device |
Apr. 7, 2009 |
| 7444955 |
Apparatus for directing plasma flow to coat internal passageways |
Nov. 4, 2008 |
| 7413639 |
Energy and media connection for a coating installation comprising several chambers |
Aug. 19, 2008 |
| 7407565 |
Method and apparatus for ionized plasma deposition |
Aug. 5, 2008 |
| 7338581 |
Sputtering apparatus |
Mar. 4, 2008 |
| 7314525 |
Plasma CVD apparatus |
Jan. 1, 2008 |
| 7306707 |
Adaptable processing element for a processing system and a method of making the same |
Dec. 11, 2007 |
| 7300558 |
Rapid cycle time gas burster |
Nov. 27, 2007 |
| 7285196 |
Methods and apparatus for making integrated-circuit wiring from copper, silver, gold, and other metals |
Oct. 23, 2007 |
| 7282112 |
Method and apparatus for an improved baffle plate in a plasma processing system |
Oct. 16, 2007 |
| 7279201 |
Methods and apparatus for forming precursors |
Oct. 9, 2007 |
| 7235160 |
Hollow cathode sputtering apparatus and related method |
Jun. 26, 2007 |
| 7232506 |
System and method for feedforward control in thin film coating processes |
Jun. 19, 2007 |
| 7166233 |
Pulsed plasma processing method and apparatus |
Jan. 23, 2007 |
| 7166199 |
Magnetron sputtering systems including anodic gas distribution systems |
Jan. 23, 2007 |
| 7147793 |
Method of and apparatus for tailoring an etch profile |
Dec. 12, 2006 |
| 7141145 |
Gas injection for uniform composition reactively sputter-deposited thin films |
Nov. 28, 2006 |
| 7104217 |
Plasma processing apparatus |
Sep. 12, 2006 |
| 7094313 |
Universal mid-frequency matching network |
Aug. 22, 2006 |
| 6936546 |
Apparatus for shaping thin films in the near-edge regions of in-process semiconductor substrates |
Aug. 30, 2005 |
| 6896773 |
High deposition rate sputtering |
May. 24, 2005 |
| 6884298 |
Method and system for coating and developing |
Apr. 26, 2005 |
| 6881305 |
Heated and cooled vacuum chamber shield |
Apr. 19, 2005 |
| 6881295 |
Air-tight vessel equipped with gas feeder uniformly supplying gaseous component around plural wafers |
Apr. 19, 2005 |
| 6841048 |
Coating apparatus for disk-shaped workpieces |
Jan. 11, 2005 |
| 6837966 |
Method and apparatus for an improved baffle plate in a plasma processing system |
Jan. 4, 2005 |
| 6830664 |
Cluster tool with a hollow cathode array |
Dec. 14, 2004 |
| 6821378 |
Pump baffle and screen to improve etch uniformity |
Nov. 23, 2004 |
| 6818068 |
Conveyor for treating hollow bodies comprising an advanced pressure distribution circuit |
Nov. 16, 2004 |
| 6814837 |
Controlled gas supply line apparatus and process for infilm and onfilm defect reduction |
Nov. 9, 2004 |
| 6806030 |
Information recording medium and method for manufacturing information recording medium |
Oct. 19, 2004 |
| 6802942 |
Storage plate support for receiving disk-shaped storage plates |
Oct. 12, 2004 |
| 6800177 |
Apparatus and method for fabricating carbon thin film |
Oct. 5, 2004 |
| 6787010 |
Non-thermionic sputter material transport device, methods of use, and materials produced thereby |
Sep. 7, 2004 |
| 6783641 |
Vacuum treatment system and process for manufacturing workpieces |
Aug. 31, 2004 |
| 6764658 |
Plasma generator |
Jul. 20, 2004 |
| 6752911 |
Device and method for coating objects at a high temperature |
Jun. 22, 2004 |
| 6743341 |
Apparatus for applying thin layers to a substrate |
Jun. 1, 2004 |
| 6737812 |
Plasma processing apparatus |
May. 18, 2004 |
| 6733621 |
Venting apparatus and method for vacuum system |
May. 11, 2004 |
| 6709556 |
Plasma processing apparatus |
Mar. 23, 2004 |
| 6695954 |
Plasma vapor deposition with coil sputtering |
Feb. 24, 2004 |
| 6692622 |
Plasma processing apparatus with an electrically conductive wall |
Feb. 17, 2004 |
| 6682634 |
Apparatus for sputter deposition |
Jan. 27, 2004 |
| 6669987 |
Method for vacuum treatment of workpieces and vacuum treatment facility |
Dec. 30, 2003 |
| 6649036 |
Mirrortron sputtering apparatus |
Nov. 18, 2003 |
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