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Class Information
Number: 204/298.06
Name: Chemistry: electrical and wave energy > Apparatus > Coating, forming or etching by sputtering > Coating > Triode, tetrode, auxiliary electrode or biased workpiece
Description: Apparatus including electrode means (e.g., thermionic filament, screen grid, auxiliary electrode, etc.) in addition to an anode and a cathode, or including workpiece biasing means.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7604716 |
Methods and apparatus for generating high-density plasma |
Oct. 20, 2009 |
| 7591935 |
Enhanced reliability deposition baffle for iPVD |
Sep. 22, 2009 |
| 7571698 |
Low-frequency bias power in HDP-CVD processes |
Aug. 11, 2009 |
| 7544276 |
Biased pulse DC reactive sputtering of oxide films |
Jun. 9, 2009 |
| 7537676 |
Cathode apparatus to selectively bias pallet during sputtering |
May. 26, 2009 |
| 7531070 |
Sputtering power-supply unit |
May. 12, 2009 |
| 7527713 |
Variable quadruple electromagnet array in plasma processing |
May. 5, 2009 |
| 7504006 |
Self-ionized and capacitively-coupled plasma for sputtering and resputtering |
Mar. 17, 2009 |
| 7504272 |
Method for producing color-converting light-emitting device using electrophoresis |
Mar. 17, 2009 |
| 7491301 |
Methods and apparatuses for depositing film on both sides of a pane |
Feb. 17, 2009 |
| 7420182 |
Combined radio frequency and hall effect ion source and plasma accelerator system |
Sep. 2, 2008 |
| 7407565 |
Method and apparatus for ionized plasma deposition |
Aug. 5, 2008 |
| 7404879 |
Ionized physical vapor deposition apparatus using helical self-resonant coil |
Jul. 29, 2008 |
| 7374648 |
Single piece coil support assemblies, coil constructions and methods of assembling coil constructions |
May. 20, 2008 |
| 7332061 |
Integration of multiple frequency band FBAR filters |
Feb. 19, 2008 |
| 7244343 |
Sputtering apparatus |
Jul. 17, 2007 |
| 7244344 |
Physical vapor deposition plasma reactor with VHF source power applied through the workpiece |
Jul. 17, 2007 |
| 7211179 |
Dual anode AC supply for continuous deposition of a cathode material |
May. 1, 2007 |
| 7182842 |
Device for amplifying the current of an abnormal electrical discharge and system for using an abnormal electrical discharge comprising one such device |
Feb. 27, 2007 |
| 7179350 |
Reactive sputtering of silicon nitride films by RF supported DC magnetron |
Feb. 20, 2007 |
| 7156960 |
Method and device for continuous cold plasma deposition of metal coatings |
Jan. 2, 2007 |
| 7147759 |
High-power pulsed magnetron sputtering |
Dec. 12, 2006 |
| 7094316 |
Externally excited torroidal plasma source |
Aug. 22, 2006 |
| 7041202 |
Timing apparatus and method to selectively bias during sputtering |
May. 9, 2006 |
| 7041201 |
Sidewall magnet improving uniformity of inductively coupled plasma and shields used therewith |
May. 9, 2006 |
| 7012263 |
Ion source apparatus and electronic energy optimized method therefor |
Mar. 14, 2006 |
| 7011733 |
Method and apparatus for depositing films |
Mar. 14, 2006 |
| 6972079 |
Dual magnetron sputtering apparatus utilizing control means for delivering balanced power |
Dec. 6, 2005 |
| 6964731 |
Soil-resistant coating for glass surfaces |
Nov. 15, 2005 |
| 6962648 |
Back-biased face target sputtering |
Nov. 8, 2005 |
| 6946063 |
Deterioration resistant chambers for inductively coupled plasma production |
Sep. 20, 2005 |
| 6936144 |
High frequency plasma source |
Aug. 30, 2005 |
| 6929720 |
Sputtering source for ionized physical vapor deposition of metals |
Aug. 16, 2005 |
| 6929725 |
Sputter ions source |
Aug. 16, 2005 |
| 6923891 |
Copper interconnects |
Aug. 2, 2005 |
| 6911123 |
Facing-targets-type sputtering apparatus and method |
Jun. 28, 2005 |
| 6899799 |
Method and apparatus for improving sidewall coverage during sputtering in a chamber having an inductively coupled plasma |
May. 31, 2005 |
| 6896773 |
High deposition rate sputtering |
May. 24, 2005 |
| 6878248 |
Method of manufacturing an object in a vacuum recipient |
Apr. 12, 2005 |
| 6878249 |
High frequency sputtering device |
Apr. 12, 2005 |
| 6863785 |
Sputtering apparatus and sputter film deposition method |
Mar. 8, 2005 |
| 6843892 |
Apparatus and method for selectively and controllably electrically biasing a plurality of substrates on a pallet |
Jan. 18, 2005 |
| 6827824 |
Enhanced collimated deposition |
Dec. 7, 2004 |
| 6824658 |
Partial turn coil for generating a plasma |
Nov. 30, 2004 |
| 6824653 |
Magnetron with controlled DC power |
Nov. 30, 2004 |
| 6818103 |
Method and apparatus for substrate biasing in multiple electrode sputtering systems |
Nov. 16, 2004 |
| 6814838 |
Vacuum treatment chamber and method for treating surfaces |
Nov. 9, 2004 |
| 6808607 |
High peak power plasma pulsed supply with arc handling |
Oct. 26, 2004 |
| 6806653 |
Method and structure to segment RF coupling to silicon electrode |
Oct. 19, 2004 |
| 6802949 |
Method for manufacturing half-metallic magnetic oxide and plasma sputtering apparatus used in the same |
Oct. 12, 2004 |
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