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Class Information
Number: 204/298.05
Name: Chemistry: electrical and wave energy > Apparatus > Coating, forming or etching by sputtering > Coating > Ion plating
Description: Apparatus additionally including means for ionizing at least a portion of the evaporated coated material and for applying a potential to the workpiece, whereby the workpiece is simultaneously subjected to electrostatically aided deposition and sputter etching due to ionic bombardment.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7485372 |
Multi-layer coating having excellent adhesion and sliding properties and production method thereof |
Feb. 3, 2009 |
| 6905582 |
Configurable vacuum system and method |
Jun. 14, 2005 |
| 6878248 |
Method of manufacturing an object in a vacuum recipient |
Apr. 12, 2005 |
| 6858119 |
Mobile plating system and method |
Feb. 22, 2005 |
| 6758947 |
Damage-free sculptured coating deposition |
Jul. 6, 2004 |
| 6651582 |
Method and device for irradiating an ion beam, and related method and device thereof |
Nov. 25, 2003 |
| 6524431 |
Apparatus for automatically cleaning mask |
Feb. 25, 2003 |
| 6521104 |
Configurable vacuum system and method |
Feb. 18, 2003 |
| 6516233 |
Pulse plating rectifiers and methods, systems and computer program products for controlling pulse plating rectifiers in master/slave mode |
Feb. 4, 2003 |
| 6503379 |
Mobile plating system and method |
Jan. 7, 2003 |
| 6447652 |
Thin-film forming method and thin-film forming apparatus |
Sep. 10, 2002 |
| 6435130 |
Plasma CVD apparatus and plasma processing method |
Aug. 20, 2002 |
| 6394025 |
Vacuum film growth apparatus |
May. 28, 2002 |
| 6294479 |
Film forming method and apparatus |
Sep. 25, 2001 |
| 6261634 |
Apparatus and method for forming film |
Jul. 17, 2001 |
| 6238532 |
Radio-frequency coil for use in an ionized physical vapor deposition apparatus |
May. 29, 2001 |
| 6217951 |
Impurity introduction method and apparatus thereof and method of manufacturing semiconductor device |
Apr. 17, 2001 |
| 6182604 |
Hollow cathode for plasma doping system |
Feb. 6, 2001 |
| 6149783 |
Vacuum treatment apparatus |
Nov. 21, 2000 |
| 6120660 |
Removable liner design for plasma immersion ion implantation |
Sep. 19, 2000 |
| 6089186 |
Vacuum coating forming device |
Jul. 18, 2000 |
| 6086959 |
Boron and nitrogen containing coating and method for making |
Jul. 11, 2000 |
| 6054185 |
Substrate with superhard coating containing boron and nitrogen and method of making the same |
Apr. 25, 2000 |
| 6035805 |
Method and apparatus for vacuum deposition of highly ionized media in an electromagnetic controlled environment |
Mar. 14, 2000 |
| 5970908 |
Apparatus and improved polymerization gun for coating objects by vacuum deposit |
Oct. 26, 1999 |
| 5964989 |
Ionized PVD device and method of manufacturing semiconductor device |
Oct. 12, 1999 |
| 5948224 |
Method of controlling a treatment process and vacuum treatment apparatus |
Sep. 7, 1999 |
| 5919342 |
Method for depositing golden titanium nitride |
Jul. 6, 1999 |
| 5910220 |
Apparatus and method for selective area deposition of thin films on electrically biased substrates |
Jun. 8, 1999 |
| 5895531 |
Apparatus and polymerization gun for coating objects by vacuum deposit |
Apr. 20, 1999 |
| 5891312 |
Enhanced vacuum arc vapor deposition electrode |
Apr. 6, 1999 |
| 5879741 |
Apparatus and method for forming film |
Mar. 9, 1999 |
| 5868913 |
Electrode and preparation thereof |
Feb. 9, 1999 |
| 5855686 |
Method and apparatus for vacuum deposition of highly ionized media in an electromagnetic controlled environment |
Jan. 5, 1999 |
| 5840167 |
Sputtering deposition apparatus and method utilizing charged particles |
Nov. 24, 1998 |
| 5800688 |
Apparatus for ionized sputtering |
Sep. 1, 1998 |
| 5755937 |
Apparatus for applying layers of metal onto a surface |
May. 26, 1998 |
| 5733418 |
Sputtering method and apparatus |
Mar. 31, 1998 |
| 5730847 |
Arc ion plating device and arc ion plating system |
Mar. 24, 1998 |
| 5716500 |
Method and an apparatus for generation of a discharge in own vapors of a radio frequency electrode for sustained self-sputtering and evaporation of the electrode |
Feb. 10, 1998 |
| 5677012 |
Plasma processing method and plasma processing apparatus |
Oct. 14, 1997 |
| 5656141 |
Apparatus for coating substrates |
Aug. 12, 1997 |
| 5571332 |
Electron jet vapor deposition system |
Nov. 5, 1996 |
| 5556519 |
Magnetron sputter ion plating |
Sep. 17, 1996 |
| 5525158 |
Thin film deposition apparatus |
Jun. 11, 1996 |
| 5514260 |
Apparatus for simultaneous plating |
May. 7, 1996 |
| 5482611 |
Physical vapor deposition employing ion extraction from a plasma |
Jan. 9, 1996 |
| 5474611 |
Plasma vapor deposition apparatus |
Dec. 12, 1995 |
| 5427671 |
Ion vapor deposition apparatus and method |
Jun. 27, 1995 |
| 5427668 |
Thin film deposition system |
Jun. 27, 1995 |
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