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Class Information
Number: 204/298.04
Name: Chemistry: electrical and wave energy > Apparatus > Coating, forming or etching by sputtering > Coating > Ion beam sputter deposition
Description: Apparatus wherein a beam of ions generated by a separate ion source remote from the target is employed to sputter material from the target so that a coating of target material is deposited on a workpiece.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7579604 |
Beam stop and beam tuning methods |
Aug. 25, 2009 |
| 7547898 |
Particulate prevention in ion implantation |
Jun. 16, 2009 |
| 7547899 |
Charged beam dump and particle attractor |
Jun. 16, 2009 |
| 7485372 |
Multi-layer coating having excellent adhesion and sliding properties and production method thereof |
Feb. 3, 2009 |
| 7420182 |
Combined radio frequency and hall effect ion source and plasma accelerator system |
Sep. 2, 2008 |
| 7264741 |
Coater having substrate cleaning device and coating deposition methods employing such coater |
Sep. 4, 2007 |
| 7241360 |
Method and apparatus for neutralization of ion beam using AC ion source |
Jul. 10, 2007 |
| 7229532 |
Sputtering apparatus |
Jun. 12, 2007 |
| 7023128 |
Dipole ion source |
Apr. 4, 2006 |
| 6946064 |
Sample mount for performing sputter-deposition in a focused ion beam (FIB) tool |
Sep. 20, 2005 |
| 6936144 |
High frequency plasma source |
Aug. 30, 2005 |
| 6923891 |
Copper interconnects |
Aug. 2, 2005 |
| 6911129 |
Combinatorial synthesis of material chips |
Jun. 28, 2005 |
| 6905578 |
Apparatus and method for multi-target physical-vapor deposition of a multi-layer material structure |
Jun. 14, 2005 |
| 6887317 |
Reduced friction lift pin |
May. 3, 2005 |
| 6878240 |
Apparatus and method for obtaining symmetrical junctions between a read sensor and hard bias layers |
Apr. 12, 2005 |
| 6869508 |
Physical vapor deposition apparatus and process |
Mar. 22, 2005 |
| 6858115 |
Process for reforming surface of substrate, reformed substrate and apparatus for the same |
Feb. 22, 2005 |
| 6858118 |
Apparatus for enhancing the lifetime of stencil masks |
Feb. 22, 2005 |
| 6844023 |
Alumina insulation for coating implantable components and other microminiature devices |
Jan. 18, 2005 |
| 6843891 |
Apparatus for sputter deposition |
Jan. 18, 2005 |
| 6835289 |
Particle implantation apparatus and particle implantation method |
Dec. 28, 2004 |
| 6819053 |
Hall effect ion source at high current density |
Nov. 16, 2004 |
| 6809066 |
Ion texturing methods and articles |
Oct. 26, 2004 |
| 6783635 |
Spin valve sensor free layer structure with a cobalt based layer that promotes magnetic stability and high magnetoresistance |
Aug. 31, 2004 |
| 6783637 |
High throughput dual ion beam deposition apparatus |
Aug. 31, 2004 |
| 6761803 |
Large area silicon cone arrays fabrication and cone based nanostructure modification |
Jul. 13, 2004 |
| 6755944 |
Ion beam deposition targets having an interlocking interface and a replaceable insert |
Jun. 29, 2004 |
| 6726812 |
Ion beam sputtering apparatus, method for forming a transparent and electrically conductive film, and process for the production of a semiconductor device |
Apr. 27, 2004 |
| 6716322 |
Method and apparatus for controlling film profiles on topographic features |
Apr. 6, 2004 |
| 6682634 |
Apparatus for sputter deposition |
Jan. 27, 2004 |
| 6669824 |
Dual-scan thin film processing system |
Dec. 30, 2003 |
| 6645301 |
Ion source |
Nov. 11, 2003 |
| 6616818 |
Apparatus and method for coating substrates |
Sep. 9, 2003 |
| 6613204 |
Pretreatment process for a surface texturing process |
Sep. 2, 2003 |
| 6613240 |
Method and apparatus for smoothing thin conductive films by gas cluster ion beam |
Sep. 2, 2003 |
| 6610179 |
System and method for controlling deposition thickness using a mask with a shadow that varies with respect to a target |
Aug. 26, 2003 |
| 6593150 |
Methods and apparatus for depositing magnetic films |
Jul. 15, 2003 |
| 6579420 |
Apparatus and method for uniformly depositing thin films over substrates |
Jun. 17, 2003 |
| 6554968 |
Method for measuring and controlling beam current in ion beam processing |
Apr. 29, 2003 |
| 6547939 |
Adjustable shadow mask for improving uniformity of film deposition using multiple monitoring points along radius of substrate |
Apr. 15, 2003 |
| 6537606 |
System and method for improving thin films by gas cluster ion beam processing |
Mar. 25, 2003 |
| 6500676 |
Methods and apparatus for depositing magnetic films |
Dec. 31, 2002 |
| 6500314 |
Plasma etch reactor and method |
Dec. 31, 2002 |
| 6495010 |
Differentially-pumped material processing system |
Dec. 17, 2002 |
| 6495008 |
Method for making polycrystalline thin film and associated oxide superconductor and apparatus therefor |
Dec. 17, 2002 |
| 6488825 |
Optically coupled sputter apparatus |
Dec. 3, 2002 |
| 6478931 |
Apparatus and method for intra-layer modulation of the material deposition and assist beam and the multilayer structure produced therefrom |
Nov. 12, 2002 |
| 6451176 |
Electrostatic particle trap for ion beam sputter deposition |
Sep. 17, 2002 |
| 6447652 |
Thin-film forming method and thin-film forming apparatus |
Sep. 10, 2002 |
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