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Class Information
Number: 204/298.03
Name: Chemistry: electrical and wave energy > Apparatus > Coating, forming or etching by sputtering > Coating > Measuring, analyzing or testing
Description: Apparatus including means for measuring, analyzing or testing at least one process parameter or product characteristic.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7571698 |
Low-frequency bias power in HDP-CVD processes |
Aug. 11, 2009 |
| 7566384 |
System and apparatus for real-time monitoring and control of sputter target erosion |
Jul. 28, 2009 |
| 7544280 |
Plating analyzing method and apparatus |
Jun. 9, 2009 |
| 7537676 |
Cathode apparatus to selectively bias pallet during sputtering |
May. 26, 2009 |
| 7510634 |
Apparatus and methods for deposition and/or etch selectivity |
Mar. 31, 2009 |
| 7504006 |
Self-ionized and capacitively-coupled plasma for sputtering and resputtering |
Mar. 17, 2009 |
| 7476302 |
Apparatus and method to deposit magnesium oxide film on a large area |
Jan. 13, 2009 |
| 7450233 |
Measuring device for the measurement of optical properties of coated substrates |
Nov. 11, 2008 |
| 7445695 |
Method and system for conditioning a vapor deposition target |
Nov. 4, 2008 |
| 7420182 |
Combined radio frequency and hall effect ion source and plasma accelerator system |
Sep. 2, 2008 |
| 7413639 |
Energy and media connection for a coating installation comprising several chambers |
Aug. 19, 2008 |
| 7378001 |
Magnetron sputtering |
May. 27, 2008 |
| 7314525 |
Plasma CVD apparatus |
Jan. 1, 2008 |
| 7247221 |
System and apparatus for control of sputter deposition process |
Jul. 24, 2007 |
| 7232506 |
System and method for feedforward control in thin film coating processes |
Jun. 19, 2007 |
| 7204915 |
Patterned medium, method for fabricating same and method for evaluating same |
Apr. 17, 2007 |
| 7192505 |
Wafer probe for measuring plasma and surface characteristics in plasma processing environments |
Mar. 20, 2007 |
| 7186319 |
Multi-track magnetron exhibiting more uniform deposition and reduced rotational asymmetry |
Mar. 6, 2007 |
| 7179352 |
Vacuum treatment system and process for manufacturing workpieces |
Feb. 20, 2007 |
| 7172675 |
Observation window of plasma processing apparatus and plasma processing apparatus using the same |
Feb. 6, 2007 |
| 7147759 |
High-power pulsed magnetron sputtering |
Dec. 12, 2006 |
| 7147748 |
Plasma processing method |
Dec. 12, 2006 |
| 7147747 |
Plasma processing apparatus and plasma processing method |
Dec. 12, 2006 |
| 7087142 |
Method for determining a critical size of an inclusion in aluminum or aluminum alloy sputtering target |
Aug. 8, 2006 |
| 7063773 |
High purity sputter targets with target end-of-life indication and method of manufacture |
Jun. 20, 2006 |
| 7048837 |
End point detection for sputtering and resputtering |
May. 23, 2006 |
| 7033461 |
Thin film forming apparatus and method |
Apr. 25, 2006 |
| 7025895 |
Plasma processing apparatus and method |
Apr. 11, 2006 |
| 7008518 |
Method and apparatus for monitoring optical characteristics of thin films in a deposition process |
Mar. 7, 2006 |
| 6974524 |
Apparatus, method and system for monitoring chamber parameters associated with a deposition process |
Dec. 13, 2005 |
| 6905578 |
Apparatus and method for multi-target physical-vapor deposition of a multi-layer material structure |
Jun. 14, 2005 |
| 6899799 |
Method and apparatus for improving sidewall coverage during sputtering in a chamber having an inductively coupled plasma |
May. 31, 2005 |
| 6896773 |
High deposition rate sputtering |
May. 24, 2005 |
| 6878248 |
Method of manufacturing an object in a vacuum recipient |
Apr. 12, 2005 |
| 6869483 |
Coating process and apparatus |
Mar. 22, 2005 |
| 6863785 |
Sputtering apparatus and sputter film deposition method |
Mar. 8, 2005 |
| 6860973 |
Device for the regulation of a plasma impedance |
Mar. 1, 2005 |
| 6858118 |
Apparatus for enhancing the lifetime of stencil masks |
Feb. 22, 2005 |
| 6852202 |
Small epicyclic magnetron with controlled radial sputtering profile |
Feb. 8, 2005 |
| 6846639 |
Method for detecting pathogens attached to specific antibodies |
Jan. 25, 2005 |
| 6835552 |
Impedance measurements for detecting pathogens attached to antibodies |
Dec. 28, 2004 |
| 6833048 |
Apparatus for in-cassette monitoring of semiconductor wafers |
Dec. 21, 2004 |
| 6821552 |
Method and apparatus for determining the pass through flux of magnetic materials |
Nov. 23, 2004 |
| 6811657 |
Device for measuring the profile of a metal film sputter deposition target, and system and method employing same |
Nov. 2, 2004 |
| 6797128 |
Method for regulating sputtering processes |
Sep. 28, 2004 |
| 6783641 |
Vacuum treatment system and process for manufacturing workpieces |
Aug. 31, 2004 |
| 6752911 |
Device and method for coating objects at a high temperature |
Jun. 22, 2004 |
| 6746577 |
Method and apparatus for thickness control and reproducibility of dielectric film deposition |
Jun. 8, 2004 |
| 6743341 |
Apparatus for applying thin layers to a substrate |
Jun. 1, 2004 |
| 6740210 |
Sputtering method for forming film and apparatus therefor |
May. 25, 2004 |
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