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Class Information
Number: 204/298.03
Name: Chemistry: electrical and wave energy > Apparatus > Coating, forming or etching by sputtering > Coating > Measuring, analyzing or testing
Description: Apparatus including means for measuring, analyzing or testing at least one process parameter or product characteristic.

Patents under this class:
1 2 3 4 5 6 7 8

Patent Number Title Of Patent Date Issued
8685213 Method and apparatus for plasma generation Apr. 1, 2014
8679307 Method and apparatus for preparing specimens for microscopy Mar. 25, 2014
8663432 Magnetron sputtering apparatus and magnetron sputtering method Mar. 4, 2014
8658002 System for sputtering and method thereof Feb. 25, 2014
8585877 Multi-step deposition control Nov. 19, 2013
8524099 Methods for accessing a process chamber using a dual zone gas injector with improved optical access Sep. 3, 2013
8470142 Sputtering apparatus and driving method thereof Jun. 25, 2013
8410427 Semiconductor device, method for manufacturing semiconductor device, apparatus for manufacturing semiconductor device, and method for evaluating semiconductor device Apr. 2, 2013
8357266 Method and system for controlling a vapor deposition process Jan. 22, 2013
8323471 Automatic deposition profile targeting Dec. 4, 2012
8262869 Work piece processing by pulsed electric discharges in solid-gas plasma Sep. 11, 2012
8187432 Anodizing apparatus May. 29, 2012
8163140 Reactive sputtering method and device Apr. 24, 2012
8133359 Methods and apparatus for sputtering deposition using direct current Mar. 13, 2012
8123918 Method and a system for operating a physical vapor deposition process Feb. 28, 2012
8114256 Control of arbitrary scan path of a rotating magnetron Feb. 14, 2012
8105466 Biased pulse DC reactive sputtering of oxide films Jan. 31, 2012
8070356 Method for the temperature measurement of substrates, and vacuum processing apparatus Dec. 6, 2011
8057648 Deposition system using noise canceller and its method of control Nov. 15, 2011
8043483 Film forming method by sputtering and sputtering apparatus thereof Oct. 25, 2011
8043481 Sputtering method and apparatus Oct. 25, 2011
8012314 Manufacturing method and apparatus of phase shift mask blank Sep. 6, 2011
7988833 System and method for detecting non-cathode arcing in a plasma generation apparatus Aug. 2, 2011
7981257 Current-based method and apparatus for detecting and classifying arcs Jul. 19, 2011
7972483 Method of fault detection for material process system Jul. 5, 2011
7955480 Sputtering apparatus and film deposition method Jun. 7, 2011
7927472 Optical film thickness controlling method, optical film thickness controlling apparatus, dielectric multilayer film manufacturing apparatus, and dielectric multilayer film manufactured using t Apr. 19, 2011
7922880 Method and apparatus for increasing local plasma density in magnetically confined plasma Apr. 12, 2011
7914654 Method and apparatus for depositing a magnetoresistive multilayer film Mar. 29, 2011
7891536 PVD target with end of service life detection capability Feb. 22, 2011
7857946 Sputtering film forming method, electronic device manufacturing method, and sputtering system Dec. 28, 2010
7768269 Method of multi-location ARC sensing with adaptive threshold comparison Aug. 3, 2010
7750644 System with multi-location arc threshold comparators and communication channels for carrying arc detection flags and threshold updating Jul. 6, 2010
7750645 Method of wafer level transient sensing, threshold comparison and arc flag generation/deactivation Jul. 6, 2010
7744735 Ionized PVD with sequential deposition and etching Jun. 29, 2010
7737702 Apparatus for wafer level arc detection at an electrostatic chuck electrode Jun. 15, 2010
7733095 Apparatus for wafer level arc detection at an RF bias impedance match to the pedestal electrode Jun. 8, 2010
7678239 Sliding anode magnetron sputtering source Mar. 16, 2010
7571698 Low-frequency bias power in HDP-CVD processes Aug. 11, 2009
7566384 System and apparatus for real-time monitoring and control of sputter target erosion Jul. 28, 2009
7544280 Plating analyzing method and apparatus Jun. 9, 2009
7537676 Cathode apparatus to selectively bias pallet during sputtering May. 26, 2009
7510634 Apparatus and methods for deposition and/or etch selectivity Mar. 31, 2009
7504006 Self-ionized and capacitively-coupled plasma for sputtering and resputtering Mar. 17, 2009
7476302 Apparatus and method to deposit magnesium oxide film on a large area Jan. 13, 2009
7450233 Measuring device for the measurement of optical properties of coated substrates Nov. 11, 2008
7445695 Method and system for conditioning a vapor deposition target Nov. 4, 2008
7420182 Combined radio frequency and hall effect ion source and plasma accelerator system Sep. 2, 2008
7413639 Energy and media connection for a coating installation comprising several chambers Aug. 19, 2008
7378001 Magnetron sputtering May. 27, 2008

1 2 3 4 5 6 7 8

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