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Class Information
Number: 204/298.01
Name: Chemistry: electrical and wave energy > Apparatus > Coating, forming or etching by sputtering
Description: Apparatus specialized for coating, forming, or etching by sputtering within a vacuum environment (i.e., under reduced pressure) involving bombarding a solid or liquid target with atomic particles to cause target material to be ejected therefrom by momentum transfer.

Sub-classes under this class:

Class Number Class Name Patents
204/298.02 Coating 143
204/298.31 Etching 264

Patents under this class:
1 2 3

Patent Number Title Of Patent Date Issued
8702918 Apparatus for enabling concentricity of plasma dark space Apr. 22, 2014
8591709 Sputter deposition shield assembly to reduce cathode shorting Nov. 26, 2013
8568572 Very low pressure high power impulse triggered magnetron sputtering Oct. 29, 2013
8512586 Gas cluster ion beam etching process for achieving target etch process metrics for multiple materials Aug. 20, 2013
8506772 Sputtering apparatus Aug. 13, 2013
8499715 Coating appratus having two coating devices for successively coating same surface of substrate Aug. 6, 2013
8383001 Plasma etching method, plasma etching apparatus and storage medium Feb. 26, 2013
8357272 Quantum dot manipulating method and quantum dot production/manipulation apparatus Jan. 22, 2013
8262898 Nanotube position controlling method, nanotube position controlling flow path pattern and electronic element using nanotube Sep. 11, 2012
8192596 Ultrahigh-purity copper and process for producing the same Jun. 5, 2012
8178471 Hydrogen storage materials and process for the preparation of the same May. 15, 2012
8163144 Magnetron sputtering device Apr. 24, 2012
8101049 Method for producing low cost media Jan. 24, 2012
8092560 Lapping tool and method for manufacturing the same Jan. 10, 2012
8092607 Transporting means and vacuum coating installation for substrates of different sizes Jan. 10, 2012
8088259 Display device and sputtering target for producing the same Jan. 3, 2012
8061299 Formation of photoconductive and photovoltaic films Nov. 22, 2011
8053364 Closed-loop sputtering controlled to enhance electrical characteristics in deposited layer Nov. 8, 2011
7942111 Method and device for vacuum-coating a substrate May. 17, 2011
7883632 Plasma processing method Feb. 8, 2011
7879203 Method and apparatus for cathodic arc ion plasma deposition Feb. 1, 2011
7871470 Substrate support lift mechanism Jan. 18, 2011
7862694 Composite coating device and method of forming overcoat on magnetic head using the same Jan. 4, 2011
7846310 Encapsulated and water cooled electromagnet array Dec. 7, 2010
7763153 Method and apparatus for forming a crystalline silicon thin film Jul. 27, 2010
7758699 Apparatus for and method of continuous HTS tape buffer layer deposition using large scale ion beam assisted deposition Jul. 20, 2010
7744735 Ionized PVD with sequential deposition and etching Jun. 29, 2010
7731825 Manufacturing apparatus of magnetoresistance elements Jun. 8, 2010
RE41266 Composite electrode for plasma processes Apr. 27, 2010
7695599 Discharging power source, sputtering power source, and sputtering device Apr. 13, 2010
7691243 Internal antennae for plasma processing with metal plasma Apr. 6, 2010
7678198 Vertical-offset coater Mar. 16, 2010
7674360 Mechanism for varying the spacing between sputter magnetron and target Mar. 9, 2010
7674446 Hafnium silicide target for forming gate oxide film, and method for preparation thereof Mar. 9, 2010
7659197 Selective resputtering of metal seed layers Feb. 9, 2010
7628899 Apparatus and method of positioning a multizone magnetron assembly Dec. 8, 2009
7585386 Plasma processing apparatus, electrode plate for plasma processing apparatus, and electrode plate manufacturing method Sep. 8, 2009
7586730 Electron bombardment heating apparatus and temperature controlling apparatus Sep. 8, 2009
7582166 Holder for supporting wafers during semiconductor manufacture Sep. 1, 2009
7582194 Method and apparatus for forming fluoride thin film Sep. 1, 2009
7579067 Process chamber component with layered coating and method Aug. 25, 2009
7566368 Method and apparatus for an improved upper electrode plate in a plasma processing system Jul. 28, 2009
7556718 Highly ionized PVD with moving magnetic field envelope for uniform coverage of feature structure and wafer Jul. 7, 2009
7513982 Two dimensional magnetron scanning for flat panel sputtering Apr. 7, 2009
7501161 Methods and apparatus for reducing arcing during plasma processing Mar. 10, 2009
7476302 Apparatus and method to deposit magnesium oxide film on a large area Jan. 13, 2009
7473332 Method for processing semiconductor Jan. 6, 2009
7435300 Dynamic film thickness control system/method and its utilization Oct. 14, 2008
7422655 Apparatus for performing semiconductor processing on target substrate Sep. 9, 2008
7381293 Convex insert ring for etch chamber Jun. 3, 2008

1 2 3

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