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Class Information
Number: 204/298.01
Name: Chemistry: electrical and wave energy > Apparatus > Coating, forming or etching by sputtering
Description: Apparatus specialized for coating, forming, or etching by sputtering within a vacuum environment (i.e., under reduced pressure) involving bombarding a solid or liquid target with atomic particles to cause target material to be ejected therefrom by momentum transfer.
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7585386 |
Plasma processing apparatus, electrode plate for plasma processing apparatus, and electrode plate manufacturing method |
Sep. 8, 2009 |
| 7586730 |
Electron bombardment heating apparatus and temperature controlling apparatus |
Sep. 8, 2009 |
| 7582166 |
Holder for supporting wafers during semiconductor manufacture |
Sep. 1, 2009 |
| 7582194 |
Method and apparatus for forming fluoride thin film |
Sep. 1, 2009 |
| 7579067 |
Process chamber component with layered coating and method |
Aug. 25, 2009 |
| 7566368 |
Method and apparatus for an improved upper electrode plate in a plasma processing system |
Jul. 28, 2009 |
| 7556718 |
Highly ionized PVD with moving magnetic field envelope for uniform coverage of feature structure and wafer |
Jul. 7, 2009 |
| 7513982 |
Two dimensional magnetron scanning for flat panel sputtering |
Apr. 7, 2009 |
| 7501161 |
Methods and apparatus for reducing arcing during plasma processing |
Mar. 10, 2009 |
| 7476302 |
Apparatus and method to deposit magnesium oxide film on a large area |
Jan. 13, 2009 |
| 7473332 |
Method for processing semiconductor |
Jan. 6, 2009 |
| 7435300 |
Dynamic film thickness control system/method and its utilization |
Oct. 14, 2008 |
| 7422655 |
Apparatus for performing semiconductor processing on target substrate |
Sep. 9, 2008 |
| 7381293 |
Convex insert ring for etch chamber |
Jun. 3, 2008 |
| 7354482 |
Film deposition device |
Apr. 8, 2008 |
| 7353379 |
Methods for configuring a plasma cluster tool |
Apr. 1, 2008 |
| 7341644 |
Method for predicting consumption of consumable part, method for predicting deposited-film thickness, and plasma processor |
Mar. 11, 2008 |
| 7335278 |
Plasma processing apparatus and plasma processing method |
Feb. 26, 2008 |
| 7329328 |
Method for etch processing with end point detection thereof |
Feb. 12, 2008 |
| 7311797 |
Productivity enhancing thermal sprayed yttria-containing coating for plasma reactor |
Dec. 25, 2007 |
| 7300537 |
Productivity enhancing thermal sprayed yttria-containing coating for plasma reactor |
Nov. 27, 2007 |
| 7261796 |
Method and apparatus for aligning a machine tool |
Aug. 28, 2007 |
| 7235155 |
Method and apparatus for monitoring plasma conditions using a monitoring ring |
Jun. 26, 2007 |
| 7220320 |
Systems for producing semiconductors and members therefor |
May. 22, 2007 |
| 7204913 |
In-situ pre-coating of plasma etch chamber for improved productivity and chamber condition control |
Apr. 17, 2007 |
| 7186298 |
Wafer support system |
Mar. 6, 2007 |
| 7166187 |
Segmented cold plate for rapid thermal processing (RTP) tool for conduction cooling |
Jan. 23, 2007 |
| 7166200 |
Method and apparatus for an improved upper electrode plate in a plasma processing system |
Jan. 23, 2007 |
| 7147719 |
Double slit-valve doors for plasma processing |
Dec. 12, 2006 |
| 7132040 |
Matching unit for semiconductor plasma processing apparatus |
Nov. 7, 2006 |
| 7122096 |
Method and apparatus for processing semiconductor |
Oct. 17, 2006 |
| 7070660 |
Wafer holder with stiffening rib |
Jul. 4, 2006 |
| 7070661 |
Uniform gas cushion wafer support |
Jul. 4, 2006 |
| 7067012 |
CVD coating device |
Jun. 27, 2006 |
| 7052552 |
Gas chemistry cycling to achieve high aspect ratio gapfill with HDP-CVD |
May. 30, 2006 |
| 7033443 |
Gas-cooled clamp for RTP |
Apr. 25, 2006 |
| 7033445 |
Gridded susceptor |
Apr. 25, 2006 |
| 7025858 |
Apparatus for supporting wafer in semiconductor process |
Apr. 11, 2006 |
| 6982797 |
Apparatus for devices for determining properties of applied layers |
Jan. 3, 2006 |
| 6958098 |
Semiconductor wafer support lift-pin assembly |
Oct. 25, 2005 |
| 6955741 |
Semiconductor-processing reaction chamber |
Oct. 18, 2005 |
| 6899788 |
Article holders that use gas vortices to hold an article in a desired position |
May. 31, 2005 |
| 6887317 |
Reduced friction lift pin |
May. 3, 2005 |
| 6872289 |
Thin film fabrication method and thin film fabrication apparatus |
Mar. 29, 2005 |
| 6825618 |
Distributed inductively-coupled plasma source and circuit for coupling induction coils to RF power supply |
Nov. 30, 2004 |
| 6789498 |
Elements having erosion resistance |
Sep. 14, 2004 |
| 6651582 |
Method and device for irradiating an ion beam, and related method and device thereof |
Nov. 25, 2003 |
| 6645344 |
Universal backplane assembly and methods |
Nov. 11, 2003 |
| 6605544 |
Bonded sapphire polygon shield |
Aug. 12, 2003 |
| 6537429 |
Diamond coatings on reactor wall and method of manufacturing thereof |
Mar. 25, 2003 |
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