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Class Information
Number: 204/192.32
Name: Chemistry: electrical and wave energy > Processes and products > Coating, forming or etching by sputtering > Sputter etching
Description: Processes for removing materials from a substrate wherein the substrate is subjected to bombardment by atomic particles (e.g., ions) and the activation energy is supplied at least in part by momentum transfer.
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7611610 |
Method and apparatus for controlling topographical variation on a milled cross-section of a structure |
Nov. 3, 2009 |
| 7601246 |
Methods of sputtering a protective coating on a semiconductor substrate |
Oct. 13, 2009 |
| 7582490 |
Controlled fabrication of gaps in electrically conducting structures |
Sep. 1, 2009 |
| 7560658 |
Method for forming nanoscale features |
Jul. 14, 2009 |
| 7550174 |
Low contact resistance bonding method for bipolar plates in a PEM fuel cell |
Jun. 23, 2009 |
| 7509729 |
Method for making a perpendicular magnetic recording write head |
Mar. 31, 2009 |
| 7494575 |
Method for manufacturing a split probe |
Feb. 24, 2009 |
| 7423957 |
Optical information recording medium and method of manufacturing thereof, manufacturing apparatus, recording/reproducing method, and recording/reproducing apparatus |
Sep. 9, 2008 |
| 7403095 |
Thin film resistor structure and method of fabricating a thin film resistor structure |
Jul. 22, 2008 |
| 7386934 |
Double layer patterning and technique for milling patterns for a servo recording head |
Jun. 17, 2008 |
| 7378003 |
Thin-film magnetic recording head manufacture using selective imaging |
May. 27, 2008 |
| 7367999 |
Ultrafine particles and method and apparatus for producing the same |
May. 6, 2008 |
| RE40264 |
Multi-temperature processing |
Apr. 29, 2008 |
| H2209 |
Large area metallization pretreatment and surface activation system |
Feb. 5, 2008 |
| 7316764 |
System and method for performing sputter etching using independent ion and electron sources and a substrate biased with an a-symmetric bi-polar DC pulse signal |
Jan. 8, 2008 |
| 7313854 |
Method of manufacturing a tactile sensor |
Jan. 1, 2008 |
| 7300684 |
Method and system for coating internal surfaces of prefabricated process piping in the field |
Nov. 27, 2007 |
| 7270729 |
System for, and method of, etching a surface on a wafer |
Sep. 18, 2007 |
| 7259372 |
Processing method using probe of scanning probe microscope |
Aug. 21, 2007 |
| 7241397 |
Honeycomb optical window deposition shield and method for a plasma processing system |
Jul. 10, 2007 |
| 7238294 |
Procedure for etching of materials at the surface with focussed electron beam induced chemical reactions at said surface |
Jul. 3, 2007 |
| 7213322 |
Method for manufacturing surface acoustic wave device |
May. 8, 2007 |
| 7166233 |
Pulsed plasma processing method and apparatus |
Jan. 23, 2007 |
| 7159302 |
Method for manufacturing a perpendicular write head |
Jan. 9, 2007 |
| 7152305 |
Method for fabricating a magnetoresistive (MR) read head |
Dec. 26, 2006 |
| 7118657 |
Pulsed ion beam control of solid state features |
Oct. 10, 2006 |
| 7112286 |
Thin film resistor structure and method of fabricating a thin film resistor structure |
Sep. 26, 2006 |
| 7097745 |
Method of forming a tunneling magnetoresistive head |
Aug. 29, 2006 |
| 7007374 |
Method of making a magnetic head |
Mar. 7, 2006 |
| 6953519 |
Method of manufacturing the multi-tip probe, a multi-tip probe, and surface characteristic analysis apparatus |
Oct. 11, 2005 |
| 6942764 |
Arc-sprayed shield for pre-sputter etching chamber |
Sep. 13, 2005 |
| 6929721 |
Ion beam modification of residual stress gradients in thin film polycrystalline silicon membranes |
Aug. 16, 2005 |
| 6923891 |
Copper interconnects |
Aug. 2, 2005 |
| 6899918 |
Method for manufacturing electrode for lithium secondary battery |
May. 31, 2005 |
| 6896973 |
Method for manufacturing a recording medium |
May. 24, 2005 |
| 6896775 |
High-power pulsed magnetically enhanced plasma processing |
May. 24, 2005 |
| 6868856 |
Enhanced remote plasma cleaning |
Mar. 22, 2005 |
| 6852203 |
Three-dimensional periodical structure, its manufacturing method, and method of manufacturing film |
Feb. 8, 2005 |
| 6821624 |
Amorphous carbon covered member |
Nov. 23, 2004 |
| 6810566 |
Method of manufacturing a surface acoustic wave element |
Nov. 2, 2004 |
| 6802944 |
High density plasma CVD process for gapfill into high aspect ratio features |
Oct. 12, 2004 |
| 6800180 |
Resputtering to achieve better step coverage |
Oct. 5, 2004 |
| 6789297 |
Method of manufacturing a surface acoustic wave element |
Sep. 14, 2004 |
| 6783643 |
Control of solid state dimensional features |
Aug. 31, 2004 |
| 6753538 |
Electron beam processing |
Jun. 22, 2004 |
| 6746540 |
Wafer support plate assembly having recessed upper pad and vacuum processing apparatus comprising the same |
Jun. 8, 2004 |
| 6746727 |
Metal to ILD adhesion improvement by reactive sputtering |
Jun. 8, 2004 |
| 6740207 |
Electric supply unit and method for reducing arcing during sputtering |
May. 25, 2004 |
| 6730605 |
Redistribution of copper deposited films |
May. 4, 2004 |
| 6723213 |
Titanium target assembly for sputtering and method for preparing the same |
Apr. 20, 2004 |
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