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Class Information
Number: 204/192.22
Name: Chemistry: electrical and wave energy > Processes and products > Coating, forming or etching by sputtering > Glow discharge sputter deposition (e.g., cathode sputtering, etc.) > Specified deposition material or use > Insulator or dielectric
Description: Processes wherein the material is characterized by low electrical conductivity.

Sub-classes under this class:

Class Number Class Name Patents
204/192.23 Silicon containing 307

Patents under this class:
1 2 3 4 5 6 7 8

Patent Number Title Of Patent Date Issued
8597474 Substrates coated with mixtures of titanium and aluminum materials, methods for making the substrates, and cathode targets of titanium and aluminum metal Dec. 3, 2013
8557088 Physical vapor deposition with phase shift Oct. 15, 2013
8540851 Physical vapor deposition with impedance matching network Sep. 24, 2013
8454805 Method of depositing amorphus aluminium oxynitride layer by reactive sputtering of an aluminium target in a nitrogen/oxygen atmosphere Jun. 4, 2013
8435388 Reactive sputter deposition processes and equipment May. 7, 2013
8425738 Method for depositing of barrier layers on a plastic substrate as well as coating device therefor and a layer system Apr. 23, 2013
8388815 Coated article and method of making the same Mar. 5, 2013
8357267 Film producing method using atmospheric pressure hydrogen plasma, and method and apparatus for producing refined film Jan. 22, 2013
8337676 Low resistance tunneling magnetoresistive sensor with natural oxidized double MgO barrier Dec. 25, 2012
8329002 Thin films and methods and machines for forming the thin films Dec. 11, 2012
8147657 Sputtering device and film forming method Apr. 3, 2012
8105466 Biased pulse DC reactive sputtering of oxide films Jan. 31, 2012
8025775 Vacuum plasma generator Sep. 27, 2011
8012315 Lanthanoid aluminate film fabrication method Sep. 6, 2011
7959769 Deposition of LiCoO.sub.2 Jun. 14, 2011
7910510 Ceramic dielectric or thin and/or thick layers containing at least one ceramic dielectric method for production and use thereof Mar. 22, 2011
7842168 Method for producing silicon oxide film and method for producing optical multilayer film Nov. 30, 2010
7838133 Deposition of perovskite and other compound ceramic films for dielectric applications Nov. 23, 2010
7837838 Method of fabricating a high dielectric constant transistor gate using a low energy plasma apparatus Nov. 23, 2010
7799181 Method for controlling a multi-pulse record waveform at high velocity in a phase change optical medium Sep. 21, 2010
7780820 Low resistance tunneling magnetoresistive sensor with natural oxidized double MgO barrier Aug. 24, 2010
7686926 Multi-step process for forming a metal barrier in a sputter reactor Mar. 30, 2010
7572658 Method of manufacturing display panel for flexible display device Aug. 11, 2009
7566438 Method for manufacturing nanostructured manganese oxide having dendritic structure, and oxygen reduction electrode comprising nanostructured transition metal oxide having dendritic structure Jul. 28, 2009
7476302 Apparatus and method to deposit magnesium oxide film on a large area Jan. 13, 2009
7452488 Tin oxide-based sputtering target, low resistivity, transparent conductive film, method for producing such film and composition for use therein Nov. 18, 2008
7431808 Sputter target based on titanium dioxide Oct. 7, 2008
7407565 Method and apparatus for ionized plasma deposition Aug. 5, 2008
7404877 Low temperature zirconia based thermal barrier layer by PVD Jul. 29, 2008
7393600 Sputtering target, sintered article, conductive film fabricated by utilizing the same, organic EL device, and substrate for use therein Jul. 1, 2008
7338582 Method for manufacturing manganese oxide nanostructure and oxygen reduction electrode using said manganese oxide nanostructure Mar. 4, 2008
7247227 Buffer layer in flat panel display Jul. 24, 2007
7235160 Hollow cathode sputtering apparatus and related method Jun. 26, 2007
7226528 Methods of making coated articles by sputtering silver in oxygen inclusive atmosphere Jun. 5, 2007
7214295 Method for tantalum pentoxide moisture barrier in film resistors May. 8, 2007
7052584 Method of forming a capacitor May. 30, 2006
7037595 Thin hafnium oxide film and method for depositing same May. 2, 2006
7025859 Coated article with improved barrier layer structure and method of making the same Apr. 11, 2006
7008519 Sputtering target for forming high-resistance transparent conductive film, and method for producing the film Mar. 7, 2006
6991709 Multi-step magnetron sputtering process Jan. 31, 2006
6984294 Method of forming a conductive barrier layer having improved coverage within critical openings Jan. 10, 2006
6930815 Electrochromic contrast plate Aug. 16, 2005
6921464 Method of manufacturing a thin film battery Jul. 26, 2005
6887353 Tailored barrier layer which provides improved copper interconnect electromigration resistance May. 3, 2005
6884465 Process for producing aluminum oxide films at low temperatures Apr. 26, 2005
6878242 Segmented sputtering target and method/apparatus for using same Apr. 12, 2005
6860974 Long-Term sputtering method Mar. 1, 2005
6860975 Barrier layer and method of depositing a barrier layer Mar. 1, 2005
6849165 Indium-tin oxide (ITO) layer and method for producing the same Feb. 1, 2005
6849166 Ferroelectric thin film element and its manufacturing method, thin film capacitor and piezoelectric actuator using same Feb. 1, 2005

1 2 3 4 5 6 7 8

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