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Class Information
Number: 204/192.13
Name: Chemistry: electrical and wave energy > Processes and products > Coating, forming or etching by sputtering > Glow discharge sputter deposition (e.g., cathode sputtering, etc.) > Measuring or testing (e.g., of operating parameters, property of article, etc.)
Description: Processes wherein at least one characteristic of the process or the product produced is measured or tested.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7582490 |
Controlled fabrication of gaps in electrically conducting structures |
Sep. 1, 2009 |
| 7569123 |
Optimizing target erosion using multiple erosion regions in a magnetron sputtering apparatus |
Aug. 4, 2009 |
| 7566384 |
System and apparatus for real-time monitoring and control of sputter target erosion |
Jul. 28, 2009 |
| 7556718 |
Highly ionized PVD with moving magnetic field envelope for uniform coverage of feature structure and wafer |
Jul. 7, 2009 |
| 7537676 |
Cathode apparatus to selectively bias pallet during sputtering |
May. 26, 2009 |
| 7498587 |
Bi-directional filtered arc plasma source |
Mar. 3, 2009 |
| 7476302 |
Apparatus and method to deposit magnesium oxide film on a large area |
Jan. 13, 2009 |
| 7476301 |
Procedure and device for the production of a plasma |
Jan. 13, 2009 |
| 7450233 |
Measuring device for the measurement of optical properties of coated substrates |
Nov. 11, 2008 |
| 7445695 |
Method and system for conditioning a vapor deposition target |
Nov. 4, 2008 |
| 7422664 |
Method for plasma ignition |
Sep. 9, 2008 |
| 7388201 |
Radiation detector having coated nanostructure and method |
Jun. 17, 2008 |
| 7378001 |
Magnetron sputtering |
May. 27, 2008 |
| 7338581 |
Sputtering apparatus |
Mar. 4, 2008 |
| 7282122 |
Method and system for target lifetime |
Oct. 16, 2007 |
| 7261797 |
Passive bipolar arc control system and method |
Aug. 28, 2007 |
| 7247221 |
System and apparatus for control of sputter deposition process |
Jul. 24, 2007 |
| 7232506 |
System and method for feedforward control in thin film coating processes |
Jun. 19, 2007 |
| 7216544 |
Ultrasonic inspection reference standard for composite Materials |
May. 15, 2007 |
| 7204915 |
Patterned medium, method for fabricating same and method for evaluating same |
Apr. 17, 2007 |
| 7192505 |
Wafer probe for measuring plasma and surface characteristics in plasma processing environments |
Mar. 20, 2007 |
| 7186319 |
Multi-track magnetron exhibiting more uniform deposition and reduced rotational asymmetry |
Mar. 6, 2007 |
| 7179352 |
Vacuum treatment system and process for manufacturing workpieces |
Feb. 20, 2007 |
| 7172675 |
Observation window of plasma processing apparatus and plasma processing apparatus using the same |
Feb. 6, 2007 |
| 7172681 |
Process for producing rubber-based composite material |
Feb. 6, 2007 |
| 7160475 |
Fabrication of three dimensional structures |
Jan. 9, 2007 |
| 7153399 |
Method and apparatus for producing uniform isotropic stresses in a sputtered film |
Dec. 26, 2006 |
| 7147759 |
High-power pulsed magnetron sputtering |
Dec. 12, 2006 |
| 7105080 |
Vacuum treatment system and method of manufacturing same |
Sep. 12, 2006 |
| 7087142 |
Method for determining a critical size of an inclusion in aluminum or aluminum alloy sputtering target |
Aug. 8, 2006 |
| 7063773 |
High purity sputter targets with target end-of-life indication and method of manufacture |
Jun. 20, 2006 |
| 7048837 |
End point detection for sputtering and resputtering |
May. 23, 2006 |
| 7041200 |
Reducing particle generation during sputter deposition |
May. 9, 2006 |
| 7037595 |
Thin hafnium oxide film and method for depositing same |
May. 2, 2006 |
| 7033461 |
Thin film forming apparatus and method |
Apr. 25, 2006 |
| 7025895 |
Plasma processing apparatus and method |
Apr. 11, 2006 |
| 7018553 |
Optical monitoring and control system and method for plasma reactors |
Mar. 28, 2006 |
| 7008518 |
Method and apparatus for monitoring optical characteristics of thin films in a deposition process |
Mar. 7, 2006 |
| 6974524 |
Apparatus, method and system for monitoring chamber parameters associated with a deposition process |
Dec. 13, 2005 |
| 6911124 |
Method of depositing a TaN seed layer |
Jun. 28, 2005 |
| 6905578 |
Apparatus and method for multi-target physical-vapor deposition of a multi-layer material structure |
Jun. 14, 2005 |
| 6899979 |
Photomask blank, photomask, methods of manufacturing the same, and method of forming micropattern |
May. 31, 2005 |
| 6896773 |
High deposition rate sputtering |
May. 24, 2005 |
| 6872284 |
Target and method of optimizing target profile |
Mar. 29, 2005 |
| 6863785 |
Sputtering apparatus and sputter film deposition method |
Mar. 8, 2005 |
| 6860973 |
Device for the regulation of a plasma impedance |
Mar. 1, 2005 |
| 6852390 |
Ultraphobic surface for high pressure liquids |
Feb. 8, 2005 |
| 6852202 |
Small epicyclic magnetron with controlled radial sputtering profile |
Feb. 8, 2005 |
| 6830663 |
Method for creating radial profiles on a substrate |
Dec. 14, 2004 |
| 6827825 |
Method for detecting the position of a shutter disk in a physical vapor deposition chamber |
Dec. 7, 2004 |
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