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Class Information
Number: 204/192.12
Name: Chemistry: electrical and wave energy > Processes and products > Coating, forming or etching by sputtering > Glow discharge sputter deposition (e.g., cathode sputtering, etc.)
Description: Processes for the deposition of target material onto a surface (or substrate) wherein material is sputtered from the target in the presence of a glow discharge, e.g., cathode sputtering, etc.
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7608172 |
High-purity ferromagnetic sputter targets and method of manufacture |
Oct. 27, 2009 |
| 7604716 |
Methods and apparatus for generating high-density plasma |
Oct. 20, 2009 |
| 7601246 |
Methods of sputtering a protective coating on a semiconductor substrate |
Oct. 13, 2009 |
| 7588667 |
Depositing rhuthenium films using ionized physical vapor deposition (IPVD) |
Sep. 15, 2009 |
| 7582193 |
Method for producing multilayer film perpendicular magnetic recording medium |
Sep. 1, 2009 |
| 7578908 |
Sputter coating system |
Aug. 25, 2009 |
| 7575662 |
Method for operating a sputter cathode with a target |
Aug. 18, 2009 |
| 7575661 |
Reactive sputtering method |
Aug. 18, 2009 |
| 7566438 |
Method for manufacturing nanostructured manganese oxide having dendritic structure, and oxygen reduction electrode comprising nanostructured transition metal oxide having dendritic structure |
Jul. 28, 2009 |
| 7566384 |
System and apparatus for real-time monitoring and control of sputter target erosion |
Jul. 28, 2009 |
| 7563346 |
Molds having multilayer diamond-like carbon film and method for manufacturing same |
Jul. 21, 2009 |
| 7556721 |
Thiosilicate phosphor compositions and deposition methods using barium-silicon vacuum deposition sources for deposition of thiosilicate phosphor films |
Jul. 7, 2009 |
| 7550066 |
Staggered target tiles |
Jun. 23, 2009 |
| 7537676 |
Cathode apparatus to selectively bias pallet during sputtering |
May. 26, 2009 |
| 7527713 |
Variable quadruple electromagnet array in plasma processing |
May. 5, 2009 |
| 7520965 |
Magnetron sputtering apparatus and method for depositing a coating using same |
Apr. 21, 2009 |
| 7517436 |
Magneto-optical recording medium and manufacturing method thereof |
Apr. 14, 2009 |
| 7514146 |
Multilayer substrate, method for producing a multilayer substrate, and device |
Apr. 7, 2009 |
| 7504006 |
Self-ionized and capacitively-coupled plasma for sputtering and resputtering |
Mar. 17, 2009 |
| 7501161 |
Methods and apparatus for reducing arcing during plasma processing |
Mar. 10, 2009 |
| 7498587 |
Bi-directional filtered arc plasma source |
Mar. 3, 2009 |
| 7491301 |
Methods and apparatuses for depositing film on both sides of a pane |
Feb. 17, 2009 |
| 7485210 |
Sputtering target fixture |
Feb. 3, 2009 |
| 7465378 |
Method for reactive sputtering deposition |
Dec. 16, 2008 |
| 7455755 |
Vacuum plasma generator |
Nov. 25, 2008 |
| 7445695 |
Method and system for conditioning a vapor deposition target |
Nov. 4, 2008 |
| 7438955 |
Titanium nitride thin film formation on metal substrate by chemical vapor deposition in a magnetized sheet plasma source |
Oct. 21, 2008 |
| 7422664 |
Method for plasma ignition |
Sep. 9, 2008 |
| 7421973 |
System and method for performing SIMOX implants using an ion shower |
Sep. 9, 2008 |
| 7416815 |
Negative electrode member for lithium battery and process for producing the same |
Aug. 26, 2008 |
| 7413636 |
Method for manufacturing a dual spin valve sensor having a longitudinal bias stack |
Aug. 19, 2008 |
| 7407565 |
Method and apparatus for ionized plasma deposition |
Aug. 5, 2008 |
| 7404879 |
Ionized physical vapor deposition apparatus using helical self-resonant coil |
Jul. 29, 2008 |
| 7399385 |
Alternating current rotatable sputter cathode |
Jul. 15, 2008 |
| 7390381 |
Information recording medium and method of manufacturing the same |
Jun. 24, 2008 |
| 7381661 |
Method for the production of a substrate with a magnetron sputter coating and unit for the same |
Jun. 3, 2008 |
| 7378356 |
Biased pulse DC reactive sputtering of oxide films |
May. 27, 2008 |
| 7378002 |
Aluminum sputtering while biasing wafer |
May. 27, 2008 |
| 7378001 |
Magnetron sputtering |
May. 27, 2008 |
| 7374648 |
Single piece coil support assemblies, coil constructions and methods of assembling coil constructions |
May. 20, 2008 |
| 7368041 |
Method for controlling plasma density or the distribution thereof |
May. 6, 2008 |
| 7354505 |
Epitaxial ferromagnetic Ni.sub.3FeN |
Apr. 8, 2008 |
| 7347919 |
Sputter source, sputtering device, and sputtering method |
Mar. 25, 2008 |
| 7338582 |
Method for manufacturing manganese oxide nanostructure and oxygen reduction electrode using said manganese oxide nanostructure |
Mar. 4, 2008 |
| 7338581 |
Sputtering apparatus |
Mar. 4, 2008 |
| 7335426 |
High strength vacuum deposited nitinol alloy films and method of making same |
Feb. 26, 2008 |
| 7335282 |
Sputtering using an unbalanced magnetron |
Feb. 26, 2008 |
| 7332061 |
Integration of multiple frequency band FBAR filters |
Feb. 19, 2008 |
| 7316867 |
Method for manufacturing a multi-layered thin film for use as an anode in a lithium secondary battery |
Jan. 8, 2008 |
| 7316763 |
Multiple target tiles with complementary beveled edges forming a slanted gap therebetween |
Jan. 8, 2008 |
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