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Browse by Category: Main > Chemistry
Class Information
Number: 204/192.12
Name: Chemistry: electrical and wave energy > Processes and products > Coating, forming or etching by sputtering > Glow discharge sputter deposition (e.g., cathode sputtering, etc.)
Description: Processes for the deposition of target material onto a surface (or substrate) wherein material is sputtered from the target in the presence of a glow discharge, e.g., cathode sputtering, etc.


Sub-classes under this class:

Class Number Class Name Patents
204/192.14 Coating inorganic material onto polymeric material 169
204/192.13 Measuring or testing (e.g., of operating parameters, property of article, etc.) 358
204/192.15 Specified deposition material or use 1,466


Patents under this class:

Patent Number Title Of Patent Date Issued
7608172 High-purity ferromagnetic sputter targets and method of manufacture Oct. 27, 2009
7604716 Methods and apparatus for generating high-density plasma Oct. 20, 2009
7601246 Methods of sputtering a protective coating on a semiconductor substrate Oct. 13, 2009
7588667 Depositing rhuthenium films using ionized physical vapor deposition (IPVD) Sep. 15, 2009
7582193 Method for producing multilayer film perpendicular magnetic recording medium Sep. 1, 2009
7578908 Sputter coating system Aug. 25, 2009
7575662 Method for operating a sputter cathode with a target Aug. 18, 2009
7575661 Reactive sputtering method Aug. 18, 2009
7566438 Method for manufacturing nanostructured manganese oxide having dendritic structure, and oxygen reduction electrode comprising nanostructured transition metal oxide having dendritic structure Jul. 28, 2009
7566384 System and apparatus for real-time monitoring and control of sputter target erosion Jul. 28, 2009
7563346 Molds having multilayer diamond-like carbon film and method for manufacturing same Jul. 21, 2009
7556721 Thiosilicate phosphor compositions and deposition methods using barium-silicon vacuum deposition sources for deposition of thiosilicate phosphor films Jul. 7, 2009
7550066 Staggered target tiles Jun. 23, 2009
7537676 Cathode apparatus to selectively bias pallet during sputtering May. 26, 2009
7527713 Variable quadruple electromagnet array in plasma processing May. 5, 2009
7520965 Magnetron sputtering apparatus and method for depositing a coating using same Apr. 21, 2009
7517436 Magneto-optical recording medium and manufacturing method thereof Apr. 14, 2009
7514146 Multilayer substrate, method for producing a multilayer substrate, and device Apr. 7, 2009
7504006 Self-ionized and capacitively-coupled plasma for sputtering and resputtering Mar. 17, 2009
7501161 Methods and apparatus for reducing arcing during plasma processing Mar. 10, 2009
7498587 Bi-directional filtered arc plasma source Mar. 3, 2009
7491301 Methods and apparatuses for depositing film on both sides of a pane Feb. 17, 2009
7485210 Sputtering target fixture Feb. 3, 2009
7465378 Method for reactive sputtering deposition Dec. 16, 2008
7455755 Vacuum plasma generator Nov. 25, 2008
7445695 Method and system for conditioning a vapor deposition target Nov. 4, 2008
7438955 Titanium nitride thin film formation on metal substrate by chemical vapor deposition in a magnetized sheet plasma source Oct. 21, 2008
7422664 Method for plasma ignition Sep. 9, 2008
7421973 System and method for performing SIMOX implants using an ion shower Sep. 9, 2008
7416815 Negative electrode member for lithium battery and process for producing the same Aug. 26, 2008
7413636 Method for manufacturing a dual spin valve sensor having a longitudinal bias stack Aug. 19, 2008
7407565 Method and apparatus for ionized plasma deposition Aug. 5, 2008
7404879 Ionized physical vapor deposition apparatus using helical self-resonant coil Jul. 29, 2008
7399385 Alternating current rotatable sputter cathode Jul. 15, 2008
7390381 Information recording medium and method of manufacturing the same Jun. 24, 2008
7381661 Method for the production of a substrate with a magnetron sputter coating and unit for the same Jun. 3, 2008
7378356 Biased pulse DC reactive sputtering of oxide films May. 27, 2008
7378002 Aluminum sputtering while biasing wafer May. 27, 2008
7378001 Magnetron sputtering May. 27, 2008
7374648 Single piece coil support assemblies, coil constructions and methods of assembling coil constructions May. 20, 2008
7368041 Method for controlling plasma density or the distribution thereof May. 6, 2008
7354505 Epitaxial ferromagnetic Ni.sub.3FeN Apr. 8, 2008
7347919 Sputter source, sputtering device, and sputtering method Mar. 25, 2008
7338582 Method for manufacturing manganese oxide nanostructure and oxygen reduction electrode using said manganese oxide nanostructure Mar. 4, 2008
7338581 Sputtering apparatus Mar. 4, 2008
7335426 High strength vacuum deposited nitinol alloy films and method of making same Feb. 26, 2008
7335282 Sputtering using an unbalanced magnetron Feb. 26, 2008
7332061 Integration of multiple frequency band FBAR filters Feb. 19, 2008
7316867 Method for manufacturing a multi-layered thin film for use as an anode in a lithium secondary battery Jan. 8, 2008
7316763 Multiple target tiles with complementary beveled edges forming a slanted gap therebetween Jan. 8, 2008



 
 
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