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Class Information
Number: 204/192.1
Name: Chemistry: electrical and wave energy > Processes and products > Coating, forming or etching by sputtering
Description: Processes for coating, forming or etching within a vacuum environment involving bombarding a solid or liquid target material with atomic particles (e.g., ions) to cause some target material to be ejected (i.e., sputtered) by momentum transfer.
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7626183 |
Methods for modifying features of a workpiece using a gas cluster ion beam |
Dec. 1, 2009 |
| 7585386 |
Plasma processing apparatus, electrode plate for plasma processing apparatus, and electrode plate manufacturing method |
Sep. 8, 2009 |
| 7582166 |
Holder for supporting wafers during semiconductor manufacture |
Sep. 1, 2009 |
| 7582194 |
Method and apparatus for forming fluoride thin film |
Sep. 1, 2009 |
| 7566888 |
Method and system for treating an interior surface of a workpiece using a charged particle beam |
Jul. 28, 2009 |
| 7563346 |
Molds having multilayer diamond-like carbon film and method for manufacturing same |
Jul. 21, 2009 |
| 7556720 |
Electrostatic charge-free container and method of manufacturing such a container |
Jul. 7, 2009 |
| 7556718 |
Highly ionized PVD with moving magnetic field envelope for uniform coverage of feature structure and wafer |
Jul. 7, 2009 |
| 7552533 |
Method of manufacturing a fluid ejector head |
Jun. 30, 2009 |
| 7550749 |
Methods and processing systems for using a gas cluster ion beam to offset systematic non-uniformities in workpieces processed in a process tool |
Jun. 23, 2009 |
| 7550174 |
Low contact resistance bonding method for bipolar plates in a PEM fuel cell |
Jun. 23, 2009 |
| 7550748 |
Apparatus and methods for systematic non-uniformity correction using a gas cluster ion beam |
Jun. 23, 2009 |
| 7544273 |
Deposition methods and stacked film formed thereby |
Jun. 9, 2009 |
| 7531068 |
Method for manufacturing silicon nanodot film for light emission in nano-size photonic devices |
May. 12, 2009 |
| 7531212 |
Process for producing an alumina coating comprised mainly of .alpha. crystal structure |
May. 12, 2009 |
| 7521089 |
Method and apparatus for controlling the movement of CVD reaction byproduct gases to adjacent process chambers |
Apr. 21, 2009 |
| 7517554 |
Process for producing nanostructure of mixed film of Al, Si, and/or Ge |
Apr. 14, 2009 |
| 7513982 |
Two dimensional magnetron scanning for flat panel sputtering |
Apr. 7, 2009 |
| 7514146 |
Multilayer substrate, method for producing a multilayer substrate, and device |
Apr. 7, 2009 |
| 7510608 |
Hard coating film |
Mar. 31, 2009 |
| 7488526 |
Sputtering target and manufacturing method therefor, and optical recording medium and manufacturing method therefor |
Feb. 10, 2009 |
| 7473332 |
Method for processing semiconductor |
Jan. 6, 2009 |
| 7465378 |
Method for reactive sputtering deposition |
Dec. 16, 2008 |
| 7461446 |
Method for repairing photoresist layer defects using index matching overcoat |
Dec. 9, 2008 |
| 7455904 |
Thermal infrared reflective pigments for coatings |
Nov. 25, 2008 |
| 7445814 |
Methods of making porous cermet and ceramic films |
Nov. 4, 2008 |
| 7438948 |
Method for coating a substrate with an undercoating and a functional coating |
Oct. 21, 2008 |
| 7435300 |
Dynamic film thickness control system/method and its utilization |
Oct. 14, 2008 |
| 7431807 |
Evaporation method using infrared guiding heater |
Oct. 7, 2008 |
| 7431811 |
Ruthenium oxide electrodes and fabrication method thereof |
Oct. 7, 2008 |
| 7429543 |
Method for the production of a substrate |
Sep. 30, 2008 |
| 7422655 |
Apparatus for performing semiconductor processing on target substrate |
Sep. 9, 2008 |
| 7416702 |
Hydrogen sensor and process for production thereof |
Aug. 26, 2008 |
| 7404879 |
Ionized physical vapor deposition apparatus using helical self-resonant coil |
Jul. 29, 2008 |
| 7398592 |
Manufacturable CMP assisted liftoff process to fabricate write pole for perpendicular recording heads |
Jul. 15, 2008 |
| 7387816 |
Scratch resistant coated glass article including layer(s) resistant to fluoride-based etchant(s), and method of making article using combustion CVD |
Jun. 17, 2008 |
| 7381397 |
Using condensed chemicals to precondition lithium niobate and lithium tantalate crystals |
Jun. 3, 2008 |
| 7374648 |
Single piece coil support assemblies, coil constructions and methods of assembling coil constructions |
May. 20, 2008 |
| 7370416 |
Method of manufacturing an injector plate |
May. 13, 2008 |
| 7357975 |
Carbon-containing hard coating and a method for depositing a hard coating onto a substrate |
Apr. 15, 2008 |
| 7354617 |
Fixing belt and method for evaluating it |
Apr. 8, 2008 |
| 7351986 |
Method and apparatus for reducing cross contamination of species during ion implantation |
Apr. 1, 2008 |
| 7344760 |
Wear-resistant electrically conductive body |
Mar. 18, 2008 |
| 7341644 |
Method for predicting consumption of consumable part, method for predicting deposited-film thickness, and plasma processor |
Mar. 11, 2008 |
| 7338581 |
Sputtering apparatus |
Mar. 4, 2008 |
| 7335278 |
Plasma processing apparatus and plasma processing method |
Feb. 26, 2008 |
| 7329328 |
Method for etch processing with end point detection thereof |
Feb. 12, 2008 |
| 7314650 |
Method for fabricating sputter targets |
Jan. 1, 2008 |
| 7311976 |
Glazing coated with at least one layer having thermochromic properties |
Dec. 25, 2007 |
| 7303648 |
Via etch process |
Dec. 4, 2007 |
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