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Class Information
Number: 156/917
Name: Adhesive bonding and miscellaneous chemical manufacture > Differential etching apparatus having a barrel reactor
Description: Art collection involving differential etching apparatus constructed as a barrel reactor having a means for circumferentially mounting a plurality of workpieces on a cylinder.










Patents under this class:

Patent Number Title Of Patent Date Issued
7462246 Modified susceptor for barrel reactor Dec. 9, 2008
6315859 Apparatus and method for improving uniformity in batch processing of semiconductor wafers Nov. 13, 2001
5716484 Contaminant reduction improvements for plasma etch chambers Feb. 10, 1998
5480052 Domed extension for process chamber electrode Jan. 2, 1996
5474649 Plasma processing apparatus employing a textured focus ring Dec. 12, 1995
5458725 Gas distribution system Oct. 17, 1995
5362353 Faraday cage for barrel-style plasma etchers Nov. 8, 1994
5154773 Vapor phase epitaxial growth apparatus having exhaust unit for removing unwanted deposit Oct. 13, 1992
5015330 Film forming method and film forming device May. 14, 1991
4969416 Gas treatment apparatus and method Nov. 13, 1990
4786392 Fixture for cleaning a plasma etcher Nov. 22, 1988
4633812 Vacuum plasma treatment apparatus Jan. 6, 1987
4526670 Automatically loadable multifaceted electrode with load lock mechanism Jul. 2, 1985
4473455 Wafer holding apparatus and method Sep. 25, 1984
4468283 Method for etching and controlled chemical vapor deposition Aug. 28, 1984
4427516 Apparatus and method for plasma-assisted etching of wafers Jan. 24, 1984
4419201 Apparatus and method for plasma-assisted etching of wafers Dec. 6, 1983
4397724 Apparatus and method for plasma-assisted etching of wafers Aug. 9, 1983
4298443 High capacity etching apparatus and method Nov. 3, 1981











 
 
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