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Class Information
Number: 156/917
Name: Adhesive bonding and miscellaneous chemical manufacture > Differential etching apparatus having a barrel reactor
Description: Art collection involving differential etching apparatus constructed as a barrel reactor having a means for circumferentially mounting a plurality of workpieces on a cylinder.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7462246 |
Modified susceptor for barrel reactor |
Dec. 9, 2008 |
| 6315859 |
Apparatus and method for improving uniformity in batch processing of semiconductor wafers |
Nov. 13, 2001 |
| 5716484 |
Contaminant reduction improvements for plasma etch chambers |
Feb. 10, 1998 |
| 5480052 |
Domed extension for process chamber electrode |
Jan. 2, 1996 |
| 5474649 |
Plasma processing apparatus employing a textured focus ring |
Dec. 12, 1995 |
| 5458725 |
Gas distribution system |
Oct. 17, 1995 |
| 5362353 |
Faraday cage for barrel-style plasma etchers |
Nov. 8, 1994 |
| 5154773 |
Vapor phase epitaxial growth apparatus having exhaust unit for removing unwanted deposit |
Oct. 13, 1992 |
| 5015330 |
Film forming method and film forming device |
May. 14, 1991 |
| 4969416 |
Gas treatment apparatus and method |
Nov. 13, 1990 |
| 4786392 |
Fixture for cleaning a plasma etcher |
Nov. 22, 1988 |
| 4633812 |
Vacuum plasma treatment apparatus |
Jan. 6, 1987 |
| 4526670 |
Automatically loadable multifaceted electrode with load lock mechanism |
Jul. 2, 1985 |
| 4473455 |
Wafer holding apparatus and method |
Sep. 25, 1984 |
| 4468283 |
Method for etching and controlled chemical vapor deposition |
Aug. 28, 1984 |
| 4427516 |
Apparatus and method for plasma-assisted etching of wafers |
Jan. 24, 1984 |
| 4419201 |
Apparatus and method for plasma-assisted etching of wafers |
Dec. 6, 1983 |
| 4397724 |
Apparatus and method for plasma-assisted etching of wafers |
Aug. 9, 1983 |
| 4298443 |
High capacity etching apparatus and method |
Nov. 3, 1981 |
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