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Class Information
Number: 156/916
Name: Adhesive bonding and miscellaneous chemical manufacture > Differential etching apparatus including chamber cleaning means or shield for preventing deposits
Description: Art collection involving differential etching apparatus constructed with means to clean a processing chamber or prevent deposits therein.

Patents under this class:
1 2 3

Patent Number Title Of Patent Date Issued
8500952 Plasma confinement rings having reduced polymer deposition characteristics Aug. 6, 2013
8388397 Liquid crystal cell manufacturing device and method thereof Mar. 5, 2013
8382938 Gate valve cleaning method and substrate processing system Feb. 26, 2013
8117986 Apparatus for an improved deposition shield in a plasma processing system Feb. 21, 2012
7972468 Semiconductor device fabricating system Jul. 5, 2011
7850819 Plasma reactor with high productivity Dec. 14, 2010
7674351 Plasma processing apparatus Mar. 9, 2010
7566379 Method and apparatus for an improved upper electrode plate with deposition shield in a plasma processing system Jul. 28, 2009
7527658 Method of manufacturing displays and apparatus for manufacturing displays May. 5, 2009
7416633 Plasma processing apparatus Aug. 26, 2008
7338699 Island projection-modified part, method for producing the same, and apparatus comprising the same Mar. 4, 2008
7293526 Plasma reaction chamber liner consisting essentially of osmium Nov. 13, 2007
7294224 Magnet assembly for plasma containment Nov. 13, 2007
7182816 Particulate reduction using temperature-controlled chamber shield Feb. 27, 2007
7147749 Method and apparatus for an improved upper electrode plate with deposition shield in a plasma processing system Dec. 12, 2006
7137353 Method and apparatus for an improved deposition shield in a plasma processing system Nov. 21, 2006
7055212 Clean gas injector system for reactor chamber Jun. 6, 2006
6984288 Plasma processor in plasma confinement region within a vacuum chamber Jan. 10, 2006
6933025 Chamber having components with textured surfaces and method of manufacture Aug. 23, 2005
6802933 Apparatus for performing self cleaning method of forming deep trenches in silicon substrates Oct. 12, 2004
6777045 Chamber components having textured surfaces and method of manufacture Aug. 17, 2004
6733829 Anti-binding deposition ring May. 11, 2004
6647918 Double slit-valve doors for plasma processing Nov. 18, 2003
6645585 Container for treating with corrosive-gas and plasma and method for manufacturing the same Nov. 11, 2003
6394026 Low contamination high density plasma etch chambers and methods for making the same May. 28, 2002
6329297 Dilute remote plasma clean Dec. 11, 2001
6328041 Universal cleaning wafer for a plasma chamber Dec. 11, 2001
6312569 Chemical vapor deposition apparatus and cleaning method thereof Nov. 6, 2001
6286453 Shield design for IBC deposition Sep. 11, 2001
6277237 Chamber liner for semiconductor process chambers Aug. 21, 2001
6264788 Plasma treatment method and apparatus Jul. 24, 2001
6251216 Apparatus and method for plasma processing Jun. 26, 2001
6231674 Wafer edge deposition elimination May. 15, 2001
6223684 Film deposition apparatus May. 1, 2001
6221202 Efficient plasma containment structure Apr. 24, 2001
6200412 Chemical vapor deposition system including dedicated cleaning gas injection Mar. 13, 2001
6187132 Substrate treatment device and substrate transporting method Feb. 13, 2001
6184489 Particle-removing apparatus for a semiconductor device manufacturing apparatus and method of removing particles Feb. 6, 2001
6173674 Plasma reactor with a deposition shield Jan. 16, 2001
6170431 Plasma reactor with a deposition shield Jan. 9, 2001
6159333 Substrate processing system configurable for deposition or cleaning Dec. 12, 2000
6143128 Apparatus for preparing and metallizing high aspect ratio silicon semiconductor device contacts to reduce the resistivity thereof Nov. 7, 2000
6139681 Plasma assisted process vessel cleaner Oct. 31, 2000
6132566 Apparatus and method for sputtering ionized material in a plasma Oct. 17, 2000
6125859 Method for improved cleaning of substrate processing systems Oct. 3, 2000
6117244 Deposition resistant lining for CVD chamber Sep. 12, 2000
6109206 Remote plasma source for chamber cleaning Aug. 29, 2000
6079426 Method and apparatus for determining the endpoint in a plasma cleaning process Jun. 27, 2000
6071375 Gas purge protection of sensors and windows in a gas phase processing reactor Jun. 6, 2000
6017414 Method of and apparatus for detecting and controlling in situ cleaning time of vacuum processing chambers Jan. 25, 2000

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