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Class Information
Number: 156/916
Name: Adhesive bonding and miscellaneous chemical manufacture > Differential etching apparatus including chamber cleaning means or shield for preventing deposits
Description: Art collection involving differential etching apparatus constructed with means to clean a processing chamber or prevent deposits therein.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7566379 |
Method and apparatus for an improved upper electrode plate with deposition shield in a plasma processing system |
Jul. 28, 2009 |
| 7527658 |
Method of manufacturing displays and apparatus for manufacturing displays |
May. 5, 2009 |
| 7416633 |
Plasma processing apparatus |
Aug. 26, 2008 |
| 7338699 |
Island projection-modified part, method for producing the same, and apparatus comprising the same |
Mar. 4, 2008 |
| 7293526 |
Plasma reaction chamber liner consisting essentially of osmium |
Nov. 13, 2007 |
| 7294224 |
Magnet assembly for plasma containment |
Nov. 13, 2007 |
| 7182816 |
Particulate reduction using temperature-controlled chamber shield |
Feb. 27, 2007 |
| 7147749 |
Method and apparatus for an improved upper electrode plate with deposition shield in a plasma processing system |
Dec. 12, 2006 |
| 7137353 |
Method and apparatus for an improved deposition shield in a plasma processing system |
Nov. 21, 2006 |
| 7055212 |
Clean gas injector system for reactor chamber |
Jun. 6, 2006 |
| 6984288 |
Plasma processor in plasma confinement region within a vacuum chamber |
Jan. 10, 2006 |
| 6933025 |
Chamber having components with textured surfaces and method of manufacture |
Aug. 23, 2005 |
| 6802933 |
Apparatus for performing self cleaning method of forming deep trenches in silicon substrates |
Oct. 12, 2004 |
| 6777045 |
Chamber components having textured surfaces and method of manufacture |
Aug. 17, 2004 |
| 6733829 |
Anti-binding deposition ring |
May. 11, 2004 |
| 6647918 |
Double slit-valve doors for plasma processing |
Nov. 18, 2003 |
| 6645585 |
Container for treating with corrosive-gas and plasma and method for manufacturing the same |
Nov. 11, 2003 |
| 6394026 |
Low contamination high density plasma etch chambers and methods for making the same |
May. 28, 2002 |
| 6329297 |
Dilute remote plasma clean |
Dec. 11, 2001 |
| 6328041 |
Universal cleaning wafer for a plasma chamber |
Dec. 11, 2001 |
| 6312569 |
Chemical vapor deposition apparatus and cleaning method thereof |
Nov. 6, 2001 |
| 6286453 |
Shield design for IBC deposition |
Sep. 11, 2001 |
| 6277237 |
Chamber liner for semiconductor process chambers |
Aug. 21, 2001 |
| 6264788 |
Plasma treatment method and apparatus |
Jul. 24, 2001 |
| 6251216 |
Apparatus and method for plasma processing |
Jun. 26, 2001 |
| 6231674 |
Wafer edge deposition elimination |
May. 15, 2001 |
| 6223684 |
Film deposition apparatus |
May. 1, 2001 |
| 6221202 |
Efficient plasma containment structure |
Apr. 24, 2001 |
| 6200412 |
Chemical vapor deposition system including dedicated cleaning gas injection |
Mar. 13, 2001 |
| 6187132 |
Substrate treatment device and substrate transporting method |
Feb. 13, 2001 |
| 6184489 |
Particle-removing apparatus for a semiconductor device manufacturing apparatus and method of removing particles |
Feb. 6, 2001 |
| 6173674 |
Plasma reactor with a deposition shield |
Jan. 16, 2001 |
| 6170431 |
Plasma reactor with a deposition shield |
Jan. 9, 2001 |
| 6159333 |
Substrate processing system configurable for deposition or cleaning |
Dec. 12, 2000 |
| 6143128 |
Apparatus for preparing and metallizing high aspect ratio silicon semiconductor device contacts to reduce the resistivity thereof |
Nov. 7, 2000 |
| 6139681 |
Plasma assisted process vessel cleaner |
Oct. 31, 2000 |
| 6132566 |
Apparatus and method for sputtering ionized material in a plasma |
Oct. 17, 2000 |
| 6125859 |
Method for improved cleaning of substrate processing systems |
Oct. 3, 2000 |
| 6117244 |
Deposition resistant lining for CVD chamber |
Sep. 12, 2000 |
| 6109206 |
Remote plasma source for chamber cleaning |
Aug. 29, 2000 |
| 6079426 |
Method and apparatus for determining the endpoint in a plasma cleaning process |
Jun. 27, 2000 |
| 6071375 |
Gas purge protection of sensors and windows in a gas phase processing reactor |
Jun. 6, 2000 |
| 6017414 |
Method of and apparatus for detecting and controlling in situ cleaning time of vacuum processing chambers |
Jan. 25, 2000 |
| 6006694 |
Plasma reactor with a deposition shield |
Dec. 28, 1999 |
| 6007673 |
Apparatus and method of producing an electronic device |
Dec. 28, 1999 |
| 5972161 |
Dry etcher apparatus for preventing residual reaction gas from condensing on wafers after etching |
Oct. 26, 1999 |
| 5961724 |
Techniques for reducing particulate contamination on a substrate during processing |
Oct. 5, 1999 |
| 5951772 |
Vacuum processing apparatus |
Sep. 14, 1999 |
| 5942039 |
Self-cleaning focus ring |
Aug. 24, 1999 |
| 5914001 |
In-situ etch of CVD chamber |
Jun. 22, 1999 |
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