 |
|
 |
| |
 |
|
Class Information
Number: 156/915
Name: Adhesive bonding and miscellaneous chemical manufacture > Differential etching apparatus including focus ring surrounding a wafer for plasma apparatus
Description: Art collection involving differential etching apparatus having a focus ring surrounding a wafer for concentration of plasma.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7618516 |
Method and apparatus to confine plasma and to enhance flow conductance |
Nov. 17, 2009 |
| 7430986 |
Plasma confinement ring assemblies having reduced polymer deposition characteristics |
Oct. 7, 2008 |
| 7396432 |
Composite shadow ring assembled with dowel pins and method of using |
Jul. 8, 2008 |
| 7381293 |
Convex insert ring for etch chamber |
Jun. 3, 2008 |
| 7364623 |
Confinement ring drive |
Apr. 29, 2008 |
| 7338578 |
Step edge insert ring for etch chamber |
Mar. 4, 2008 |
| 7335278 |
Plasma processing apparatus and plasma processing method |
Feb. 26, 2008 |
| 7252738 |
Apparatus for reducing polymer deposition on a substrate and substrate support |
Aug. 7, 2007 |
| 7211170 |
Twist-N-Lock wafer area pressure ring and assembly |
May. 1, 2007 |
| 7102872 |
Electrostatic chuck |
Sep. 5, 2006 |
| 7025858 |
Apparatus for supporting wafer in semiconductor process |
Apr. 11, 2006 |
| 6955720 |
Plasma deposition of spin chucks to reduce contamination of Silicon wafers |
Oct. 18, 2005 |
| 6936135 |
Twist-N-Lock wafer area pressure ring and assembly for reducing particulate contaminant in a plasma processing chamber |
Aug. 30, 2005 |
| 6926803 |
Confinement ring support assembly |
Aug. 9, 2005 |
| 6830622 |
Cerium oxide containing ceramic components and coatings in semiconductor processing equipment and methods of manufacture thereof |
Dec. 14, 2004 |
| 6733829 |
Anti-binding deposition ring |
May. 11, 2004 |
| 6709547 |
Moveable barrier for multiple etch processes |
Mar. 23, 2004 |
| 6663714 |
CVD apparatus |
Dec. 16, 2003 |
| 6656286 |
Pedestal with a thermally controlled platen |
Dec. 2, 2003 |
| 6649077 |
Method and apparatus for removing coating layers from alignment marks on a wafer |
Nov. 18, 2003 |
| 6623597 |
Focus ring and apparatus for processing a semiconductor wafer comprising the same |
Sep. 23, 2003 |
| 6506687 |
Dry etching device and method of producing semiconductor devices |
Jan. 14, 2003 |
| 6489249 |
Elimination/reduction of black silicon in DT etch |
Dec. 3, 2002 |
| 6344105 |
Techniques for improving etch rate uniformity |
Feb. 5, 2002 |
| 6306244 |
Apparatus for reducing polymer deposition on substrate support |
Oct. 23, 2001 |
| 6290806 |
Plasma reactor |
Sep. 18, 2001 |
| 6284093 |
Shield or ring surrounding semiconductor workpiece in plasma chamber |
Sep. 4, 2001 |
| 6257168 |
Elevated stationary uniformity ring design |
Jul. 10, 2001 |
| 6189483 |
Process kit |
Feb. 20, 2001 |
| 6178919 |
Perforated plasma confinement ring in plasma reactors |
Jan. 30, 2001 |
| 6125788 |
Plasma reactor with enhanced plasma uniformity by gas addition, reduced chamber diameter and reduced RF wafer pedestal diameter |
Oct. 3, 2000 |
| 6096161 |
Dry etching apparatus having means for preventing micro-arcing |
Aug. 1, 2000 |
| 6039836 |
Focus rings |
Mar. 21, 2000 |
| 6019060 |
Cam-based arrangement for positioning confinement rings in a plasma processing chamber |
Feb. 1, 2000 |
| 6008130 |
Polymer adhesive plasma confinement ring |
Dec. 28, 1999 |
| 5976310 |
Plasma etch system |
Nov. 2, 1999 |
| 5942039 |
Self-cleaning focus ring |
Aug. 24, 1999 |
| 5919332 |
Plasma processing apparatus |
Jul. 6, 1999 |
| 5904779 |
Wafer electrical discharge control by wafer lifter system |
May. 18, 1999 |
| 5900064 |
Plasma process chamber |
May. 4, 1999 |
| 5891348 |
Process gas focusing apparatus and method |
Apr. 6, 1999 |
| 5868848 |
Plasma processing apparatus |
Feb. 9, 1999 |
| 5685914 |
Focus ring for semiconductor wafer processing in a plasma reactor |
Nov. 11, 1997 |
| 5660673 |
Apparatus for dry etching |
Aug. 26, 1997 |
| 5556500 |
Plasma etching apparatus |
Sep. 17, 1996 |
| 5552124 |
Stationary focus ring for plasma reactor |
Sep. 3, 1996 |
| 5529657 |
Plasma processing apparatus |
Jun. 25, 1996 |
| 5484486 |
Quick release process kit |
Jan. 16, 1996 |
| 5474649 |
Plasma processing apparatus employing a textured focus ring |
Dec. 12, 1995 |
| 5330607 |
Sacrificial metal etchback system |
Jul. 19, 1994 |
|
|
|
 |
|
 |
|
| |
Randomly Featured Patents |
|
