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Class Information
Number: 156/915
Name: Adhesive bonding and miscellaneous chemical manufacture > Differential etching apparatus including focus ring surrounding a wafer for plasma apparatus
Description: Art collection involving differential etching apparatus having a focus ring surrounding a wafer for concentration of plasma.










Patents under this class:
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Patent Number Title Of Patent Date Issued
8545672 Plasma processing apparatus Oct. 1, 2013
8522715 Methods and apparatus for a wide conductance kit Sep. 3, 2013
8524005 Heat-transfer structure and substrate processing apparatus Sep. 3, 2013
8500952 Plasma confinement rings having reduced polymer deposition characteristics Aug. 6, 2013
8491751 Plasma processing apparatus Jul. 23, 2013
8409355 Low profile process kit Apr. 2, 2013
8404050 Plasma processing apparatus and method Mar. 26, 2013
8357265 Cleaning method and a vacuum processing apparatus Jan. 22, 2013
8197635 Plasma processing apparatus including etching processing apparatus and ashing processing apparatus and plasma processing method using plasma processing apparatus Jun. 12, 2012
8192577 Focus ring, plasma etching apparatus and plasma etching method Jun. 5, 2012
7988816 Plasma processing apparatus and method Aug. 2, 2011
7882800 Ring mechanism, and plasma processing device using the ring mechanism Feb. 8, 2011
7867356 Apparatus for reducing polymer deposition on a substrate and substrate support Jan. 11, 2011
7837827 Edge ring arrangements for substrate processing Nov. 23, 2010
7718559 Erosion resistance enhanced quartz used in plasma etch chamber May. 18, 2010
7713380 Method and apparatus for backside polymer reduction in dry-etch process May. 11, 2010
7674353 Apparatus to confine plasma and to enhance flow conductance Mar. 9, 2010
7670436 Support ring assembly Mar. 2, 2010
7632375 Electrically enhancing the confinement of plasma Dec. 15, 2009
7632377 Dry etching apparatus capable of monitoring motion of WAP ring thereof Dec. 15, 2009
7618516 Method and apparatus to confine plasma and to enhance flow conductance Nov. 17, 2009
7430986 Plasma confinement ring assemblies having reduced polymer deposition characteristics Oct. 7, 2008
7396432 Composite shadow ring assembled with dowel pins and method of using Jul. 8, 2008
7381293 Convex insert ring for etch chamber Jun. 3, 2008
7364623 Confinement ring drive Apr. 29, 2008
7338578 Step edge insert ring for etch chamber Mar. 4, 2008
7335278 Plasma processing apparatus and plasma processing method Feb. 26, 2008
7252738 Apparatus for reducing polymer deposition on a substrate and substrate support Aug. 7, 2007
7211170 Twist-N-Lock wafer area pressure ring and assembly May. 1, 2007
7102872 Electrostatic chuck Sep. 5, 2006
7025858 Apparatus for supporting wafer in semiconductor process Apr. 11, 2006
6955720 Plasma deposition of spin chucks to reduce contamination of Silicon wafers Oct. 18, 2005
6936135 Twist-N-Lock wafer area pressure ring and assembly for reducing particulate contaminant in a plasma processing chamber Aug. 30, 2005
6926803 Confinement ring support assembly Aug. 9, 2005
6830622 Cerium oxide containing ceramic components and coatings in semiconductor processing equipment and methods of manufacture thereof Dec. 14, 2004
6733829 Anti-binding deposition ring May. 11, 2004
6709547 Moveable barrier for multiple etch processes Mar. 23, 2004
6663714 CVD apparatus Dec. 16, 2003
6656286 Pedestal with a thermally controlled platen Dec. 2, 2003
6649077 Method and apparatus for removing coating layers from alignment marks on a wafer Nov. 18, 2003
6623597 Focus ring and apparatus for processing a semiconductor wafer comprising the same Sep. 23, 2003
6506687 Dry etching device and method of producing semiconductor devices Jan. 14, 2003
6489249 Elimination/reduction of black silicon in DT etch Dec. 3, 2002
6344105 Techniques for improving etch rate uniformity Feb. 5, 2002
6306244 Apparatus for reducing polymer deposition on substrate support Oct. 23, 2001
6290806 Plasma reactor Sep. 18, 2001
6284093 Shield or ring surrounding semiconductor workpiece in plasma chamber Sep. 4, 2001
6257168 Elevated stationary uniformity ring design Jul. 10, 2001
6189483 Process kit Feb. 20, 2001
6178919 Perforated plasma confinement ring in plasma reactors Jan. 30, 2001

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