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Class Information
Number: 156/914
Name: Adhesive bonding and miscellaneous chemical manufacture > Differential etching apparatus including particular materials of construction
Description: Art collection involving differential etching apparatus constructed from particular materials of patentable significance.










Patents under this class:
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Patent Number Title Of Patent Date Issued
8409399 Reduced maintenance chemical oxide removal (COR) processing system Apr. 2, 2013
7713380 Method and apparatus for backside polymer reduction in dry-etch process May. 11, 2010
RE41266 Composite electrode for plasma processes Apr. 27, 2010
7699957 Plasma processing apparatus Apr. 20, 2010
7430986 Plasma confinement ring assemblies having reduced polymer deposition characteristics Oct. 7, 2008
7338699 Island projection-modified part, method for producing the same, and apparatus comprising the same Mar. 4, 2008
7281491 Dielectric-coated electrode, plasma discharge treatment apparatus and method for forming thin film Oct. 16, 2007
7270715 Chemical vapor deposition apparatus Sep. 18, 2007
7229522 Substrate processing apparatus and substrate processing method Jun. 12, 2007
6933025 Chamber having components with textured surfaces and method of manufacture Aug. 23, 2005
6777045 Chamber components having textured surfaces and method of manufacture Aug. 17, 2004
6743729 Etching method and etching apparatus of carbon thin film Jun. 1, 2004
6645585 Container for treating with corrosive-gas and plasma and method for manufacturing the same Nov. 11, 2003
6235120 Coating for parts used in semiconductor processing chambers May. 22, 2001
6235146 Vacuum treatment system and its stage May. 22, 2001
6221200 Instrument for production of semiconductor device and process for production thereof Apr. 24, 2001
6200388 Substrate support for a thermal processing chamber Mar. 13, 2001
6129808 Low contamination high density plasma etch chambers and methods for making the same Oct. 10, 2000
6123791 Ceramic composition for an apparatus and method for processing a substrate Sep. 26, 2000
6120640 Boron carbide parts and coatings in a plasma reactor Sep. 19, 2000
6120661 Apparatus for processing glass substrate Sep. 19, 2000
6117244 Deposition resistant lining for CVD chamber Sep. 12, 2000
6027606 Center gas feed apparatus for a high density plasma reactor Feb. 22, 2000
5997685 Corrosion-resistant apparatus Dec. 7, 1999
5993596 Plasma-etching electrode plate Nov. 30, 1999
5993597 Plasma etching electrode Nov. 30, 1999
5980764 Gas injecting gadget for semiconductor production facilities and wafer-mounting susceptor, production method thereof and chemical composition therefor Nov. 9, 1999
5951814 Electrode for plasma etching Sep. 14, 1999
5951773 Inductively coupled plasma chemical vapor deposition apparatus Sep. 14, 1999
5942454 Highly corrosion-resistant silicon carbide product Aug. 24, 1999
5910221 Bonded silicon carbide parts in a plasma reactor Jun. 8, 1999
5908799 Apparatus for producing semiconductor using aluminum nitride bodies as substrates Jun. 1, 1999
5904778 Silicon carbide composite article particularly useful for plasma reactors May. 18, 1999
5895586 Plasma processing apparatus and plasma processing method in which a part of the processing chamber is formed using a pre-fluorinated material of aluminum Apr. 20, 1999
5879523 Ceramic coated metallic insulator particularly useful in a plasma sputter reactor Mar. 9, 1999
5871609 Electrode plate and jig for use in plasma etching Feb. 16, 1999
5798016 Apparatus for hot wall reactive ion etching using a dielectric or metallic liner with temperature control to achieve process stability Aug. 25, 1998
5792562 Electrostatic chuck with polymeric impregnation and method of making Aug. 11, 1998
5785878 RF antenna having high temperature, oxidation resistant coating Jul. 28, 1998
5779848 Corrosion-resistant aluminum nitride coating for a semiconductor chamber window Jul. 14, 1998
5762748 Lid and door for a vacuum chamber and pretreatment therefor Jun. 9, 1998
5738752 System and method for plasma etching Apr. 14, 1998
5698035 Heat-resistant electrode material, electrode using the same, and apparatus having plasma generating unit using this electrode Dec. 16, 1997
5669977 Shape memory alloy lift pins for semiconductor processing equipment Sep. 23, 1997
5639341 Dry etching with less particles Jun. 17, 1997
5628883 Method for generating and activating plasma process of treatment using same, and apparatus therefor May. 13, 1997
5593916 Processing of glass substrates using holding container and holding container Jan. 14, 1997
5575883 Apparatus and process for fabricating semiconductor devices Nov. 19, 1996
5567255 Solid annular gas discharge electrode Oct. 22, 1996
5562774 Coated quartz glass component Oct. 8, 1996

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