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Class Information
Number: 156/914
Name: Adhesive bonding and miscellaneous chemical manufacture > Differential etching apparatus including particular materials of construction
Description: Art collection involving differential etching apparatus constructed from particular materials of patentable significance.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7430986 |
Plasma confinement ring assemblies having reduced polymer deposition characteristics |
Oct. 7, 2008 |
| 7338699 |
Island projection-modified part, method for producing the same, and apparatus comprising the same |
Mar. 4, 2008 |
| 7281491 |
Dielectric-coated electrode, plasma discharge treatment apparatus and method for forming thin film |
Oct. 16, 2007 |
| 7270715 |
Chemical vapor deposition apparatus |
Sep. 18, 2007 |
| 7229522 |
Substrate processing apparatus and substrate processing method |
Jun. 12, 2007 |
| 6933025 |
Chamber having components with textured surfaces and method of manufacture |
Aug. 23, 2005 |
| 6777045 |
Chamber components having textured surfaces and method of manufacture |
Aug. 17, 2004 |
| 6743729 |
Etching method and etching apparatus of carbon thin film |
Jun. 1, 2004 |
| 6645585 |
Container for treating with corrosive-gas and plasma and method for manufacturing the same |
Nov. 11, 2003 |
| 6235146 |
Vacuum treatment system and its stage |
May. 22, 2001 |
| 6235120 |
Coating for parts used in semiconductor processing chambers |
May. 22, 2001 |
| 6221200 |
Instrument for production of semiconductor device and process for production thereof |
Apr. 24, 2001 |
| 6200388 |
Substrate support for a thermal processing chamber |
Mar. 13, 2001 |
| 6129808 |
Low contamination high density plasma etch chambers and methods for making the same |
Oct. 10, 2000 |
| 6123791 |
Ceramic composition for an apparatus and method for processing a substrate |
Sep. 26, 2000 |
| 6120640 |
Boron carbide parts and coatings in a plasma reactor |
Sep. 19, 2000 |
| 6120661 |
Apparatus for processing glass substrate |
Sep. 19, 2000 |
| 6117244 |
Deposition resistant lining for CVD chamber |
Sep. 12, 2000 |
| 6027606 |
Center gas feed apparatus for a high density plasma reactor |
Feb. 22, 2000 |
| 5997685 |
Corrosion-resistant apparatus |
Dec. 7, 1999 |
| 5993596 |
Plasma-etching electrode plate |
Nov. 30, 1999 |
| 5993597 |
Plasma etching electrode |
Nov. 30, 1999 |
| 5980764 |
Gas injecting gadget for semiconductor production facilities and wafer-mounting susceptor, production method thereof and chemical composition therefor |
Nov. 9, 1999 |
| 5951814 |
Electrode for plasma etching |
Sep. 14, 1999 |
| 5951773 |
Inductively coupled plasma chemical vapor deposition apparatus |
Sep. 14, 1999 |
| 5942454 |
Highly corrosion-resistant silicon carbide product |
Aug. 24, 1999 |
| 5910221 |
Bonded silicon carbide parts in a plasma reactor |
Jun. 8, 1999 |
| 5908799 |
Apparatus for producing semiconductor using aluminum nitride bodies as substrates |
Jun. 1, 1999 |
| 5904778 |
Silicon carbide composite article particularly useful for plasma reactors |
May. 18, 1999 |
| 5895586 |
Plasma processing apparatus and plasma processing method in which a part of the processing chamber is formed using a pre-fluorinated material of aluminum |
Apr. 20, 1999 |
| 5879523 |
Ceramic coated metallic insulator particularly useful in a plasma sputter reactor |
Mar. 9, 1999 |
| 5871609 |
Electrode plate and jig for use in plasma etching |
Feb. 16, 1999 |
| 5798016 |
Apparatus for hot wall reactive ion etching using a dielectric or metallic liner with temperature control to achieve process stability |
Aug. 25, 1998 |
| 5792562 |
Electrostatic chuck with polymeric impregnation and method of making |
Aug. 11, 1998 |
| 5785878 |
RF antenna having high temperature, oxidation resistant coating |
Jul. 28, 1998 |
| 5779848 |
Corrosion-resistant aluminum nitride coating for a semiconductor chamber window |
Jul. 14, 1998 |
| 5762748 |
Lid and door for a vacuum chamber and pretreatment therefor |
Jun. 9, 1998 |
| 5738752 |
System and method for plasma etching |
Apr. 14, 1998 |
| 5698035 |
Heat-resistant electrode material, electrode using the same, and apparatus having plasma generating unit using this electrode |
Dec. 16, 1997 |
| 5669977 |
Shape memory alloy lift pins for semiconductor processing equipment |
Sep. 23, 1997 |
| 5639341 |
Dry etching with less particles |
Jun. 17, 1997 |
| 5628883 |
Method for generating and activating plasma process of treatment using same, and apparatus therefor |
May. 13, 1997 |
| 5593916 |
Processing of glass substrates using holding container and holding container |
Jan. 14, 1997 |
| 5575883 |
Apparatus and process for fabricating semiconductor devices |
Nov. 19, 1996 |
| 5567255 |
Solid annular gas discharge electrode |
Oct. 22, 1996 |
| 5562774 |
Coated quartz glass component |
Oct. 8, 1996 |
| 5505780 |
High-density plasma-processing tool with toroidal magnetic field |
Apr. 9, 1996 |
| 5494713 |
Method for treating surface of aluminum material and plasma treating apparatus |
Feb. 27, 1996 |
| 5447595 |
Electrodes for plasma etching apparatus and plasma etching apparatus using the same |
Sep. 5, 1995 |
| 5366585 |
Method and apparatus for protection of conductive surfaces in a plasma processing reactor |
Nov. 22, 1994 |
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