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Class Information
Number: 156/345.53
Name: Adhesive bonding and miscellaneous chemical manufacture > Differential fluid etching apparatus > With workpiece support > With means to cool the workpiece support
Description: Apparatus wherein the holding means includes a cooling device to cool the holding device.










Patents under this class:
1 2 3 4 5 6

Patent Number Title Of Patent Date Issued
8702903 Thermally conductive sheet and substrate mounting device including same Apr. 22, 2014
8679254 Vapor phase epitaxy apparatus of group III nitride semiconductor Mar. 25, 2014
8679255 Gas supply device, substrate processing apparatus and substrate processing method Mar. 25, 2014
8663391 Electrostatic chuck having a plurality of heater coils Mar. 4, 2014
8641825 Substrate temperature regulation fixed apparatus Feb. 4, 2014
8623173 Substrate processing apparatus having electrode member Jan. 7, 2014
8608852 Temperature controlled plasma processing chamber component with zone dependent thermal efficiencies Dec. 17, 2013
8608900 Plasma reactor with feed forward thermal control system using a thermal model for accommodating RF power changes or wafer temperature changes Dec. 17, 2013
8592712 Mounting table structure and plasma film forming apparatus Nov. 26, 2013
8555810 Plasma dry etching apparatus having coupling ring with cooling and heating units Oct. 15, 2013
8540818 Polycrystalline silicon reactor Sep. 24, 2013
8540819 Ceramic heater Sep. 24, 2013
8491752 Substrate mounting table and method for manufacturing same, substrate processing apparatus, and fluid supply mechanism Jul. 23, 2013
8430962 Gas supply device, substrate processing apparatus and substrate processing method Apr. 30, 2013
8426764 Plasma processing apparatus and plasma processing method Apr. 23, 2013
8409355 Low profile process kit Apr. 2, 2013
8387562 Plasma processor and plasma processing method Mar. 5, 2013
8349127 Vacuum processing apparatus and plasma processing apparatus with temperature control function for wafer stage Jan. 8, 2013
8349128 Method and apparatus for stable plasma processing Jan. 8, 2013
8343280 Multi-zone substrate temperature control system and method of operating Jan. 1, 2013
8336891 Electrostatic chuck Dec. 25, 2012
8337660 Capacitively coupled plasma reactor having very agile wafer temperature control Dec. 25, 2012
8328942 Wafer heating and temperature control by backside fluid injection Dec. 11, 2012
RE43837 Substrate supporting apparatus Dec. 4, 2012
8323410 High throughput chemical treatment system and method of operating Dec. 4, 2012
8303716 High throughput processing system for chemical treatment and thermal treatment and method of operating Nov. 6, 2012
8302554 Apparatus and method for rapid cooling of large area substrates in vacuum Nov. 6, 2012
8303715 High throughput thermal treatment system and method of operating Nov. 6, 2012
8287688 Substrate support for high throughput chemical treatment system Oct. 16, 2012
8282767 Plasma processing apparatus Oct. 9, 2012
8257547 Surface activation device Sep. 4, 2012
8226769 Substrate support with electrostatic chuck having dual temperature zones Jul. 24, 2012
8222119 Apparatus and method of temperature control during cleaving processes of thick materials Jul. 17, 2012
8216486 Temperature control module using gas pressure to control thermal conductance between liquid coolant and component body Jul. 10, 2012
8157915 CVD reactor having a process-chamber ceiling which can be lowered Apr. 17, 2012
8157951 Capacitively coupled plasma reactor having very agile wafer temperature control Apr. 17, 2012
8142609 Plasma processing apparatus Mar. 27, 2012
8110045 Processing equipment for object to be processed Feb. 7, 2012
8092602 Thermally zoned substrate holder assembly Jan. 10, 2012
8092639 Plasma reactor with feed forward thermal control system using a thermal model for accommodating RF power changes or wafer temperature changes Jan. 10, 2012
8082977 Ceramic mounting for wafer apparatus with thermal expansion feature Dec. 27, 2011
8083855 Temperature control module using gas pressure to control thermal conductance between liquid coolant and component body Dec. 27, 2011
8056503 Plasma procesor and plasma processing method Nov. 15, 2011
8048228 Masking apparatus and method of fabricating electronic component Nov. 1, 2011
8038796 Apparatus for spatial and temporal control of temperature on a substrate Oct. 18, 2011
8016975 Etching system Sep. 13, 2011
8012304 Plasma reactor with a multiple zone thermal control feed forward control apparatus Sep. 6, 2011
8007591 Substrate holder having a fluid gap and method of fabricating the substrate holder Aug. 30, 2011
7993705 Film formation apparatus and method for using the same Aug. 9, 2011
7988816 Plasma processing apparatus and method Aug. 2, 2011

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