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Class Information
Number: 156/345.53
Name: Adhesive bonding and miscellaneous chemical manufacture > Differential fluid etching apparatus > With workpiece support > With means to cool the workpiece support
Description: Apparatus wherein the holding means includes a cooling device to cool the holding device.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7449071 |
Wafer holder with peripheral lift ring |
Nov. 11, 2008 |
| 7427329 |
Temperature control for single substrate semiconductor processing reactor |
Sep. 23, 2008 |
| 7422637 |
Processing chamber configured for uniform gas flow |
Sep. 9, 2008 |
| 7422655 |
Apparatus for performing semiconductor processing on target substrate |
Sep. 9, 2008 |
| 7396432 |
Composite shadow ring assembled with dowel pins and method of using |
Jul. 8, 2008 |
| 7393433 |
Plasma processing apparatus, semiconductor manufacturing apparatus and electrostatic chucking unit used thereof |
Jul. 1, 2008 |
| 7393418 |
Susceptor |
Jul. 1, 2008 |
| 7381276 |
Susceptor pocket with beveled projection sidewall |
Jun. 3, 2008 |
| 7381293 |
Convex insert ring for etch chamber |
Jun. 3, 2008 |
| RE40264 |
Multi-temperature processing |
Apr. 29, 2008 |
| 7361230 |
Substrate processing apparatus |
Apr. 22, 2008 |
| 7347901 |
Thermally zoned substrate holder assembly |
Mar. 25, 2008 |
| 7338578 |
Step edge insert ring for etch chamber |
Mar. 4, 2008 |
| 7335278 |
Plasma processing apparatus and plasma processing method |
Feb. 26, 2008 |
| 7329328 |
Method for etch processing with end point detection thereof |
Feb. 12, 2008 |
| 7320733 |
Electron bombardment heating apparatus and temperature controlling apparatus and control method thereof |
Jan. 22, 2008 |
| 7311797 |
Productivity enhancing thermal sprayed yttria-containing coating for plasma reactor |
Dec. 25, 2007 |
| 7311782 |
Apparatus for active temperature control of susceptors |
Dec. 25, 2007 |
| 7300537 |
Productivity enhancing thermal sprayed yttria-containing coating for plasma reactor |
Nov. 27, 2007 |
| 7279068 |
Temperature control assembly for use in etching processes |
Oct. 9, 2007 |
| 7279048 |
Semiconductor manufacturing apparatus |
Oct. 9, 2007 |
| 7252737 |
Pedestal with integral shield |
Aug. 7, 2007 |
| 7244311 |
Heat transfer system for improved semiconductor processing uniformity |
Jul. 17, 2007 |
| 7235137 |
Conductor treating single-wafer type treating device and method for semi-conductor treating |
Jun. 26, 2007 |
| 7220319 |
Electrostatic chucking stage and substrate processing apparatus |
May. 22, 2007 |
| 7211170 |
Twist-N-Lock wafer area pressure ring and assembly |
May. 1, 2007 |
| 7211154 |
Electrode-built-in susceptor |
May. 1, 2007 |
| 7208066 |
Substrate processing apparatus and substrate processing method |
Apr. 24, 2007 |
| 7208067 |
Method and system for monitoring RF impedance to determine conditions of a wafer on an electrostatic chuck |
Apr. 24, 2007 |
| 7204888 |
Lift pin assembly for substrate processing |
Apr. 17, 2007 |
| 7204913 |
In-situ pre-coating of plasma etch chamber for improved productivity and chamber condition control |
Apr. 17, 2007 |
| 7175737 |
Electrostatic chucking stage and substrate processing apparatus |
Feb. 13, 2007 |
| 7169234 |
Apparatus and methods for preventing rotational slippage between a vertical shaft and a support structure for a semiconductor wafer holder |
Jan. 30, 2007 |
| 7166166 |
Method and apparatus for an improved baffle plate in a plasma processing system |
Jan. 23, 2007 |
| 7166187 |
Segmented cold plate for rapid thermal processing (RTP) tool for conduction cooling |
Jan. 23, 2007 |
| 7156951 |
Multiple zone gas distribution apparatus for thermal control of semiconductor wafer |
Jan. 2, 2007 |
| 7153367 |
Drive mechanism for a vacuum treatment apparatus |
Dec. 26, 2006 |
| 7147719 |
Double slit-valve doors for plasma processing |
Dec. 12, 2006 |
| 7087119 |
Atomic layer deposition with point of use generated reactive gas species |
Aug. 8, 2006 |
| 7067178 |
Substrate table, production method therefor and plasma treating device |
Jun. 27, 2006 |
| 7033443 |
Gas-cooled clamp for RTP |
Apr. 25, 2006 |
| 7033444 |
Plasma processing apparatus, and electrode structure and table structure of processing apparatus |
Apr. 25, 2006 |
| 7033445 |
Gridded susceptor |
Apr. 25, 2006 |
| 7025858 |
Apparatus for supporting wafer in semiconductor process |
Apr. 11, 2006 |
| 7017658 |
Heat processing device |
Mar. 28, 2006 |
| 6991701 |
Plasma treatment method and apparatus |
Jan. 31, 2006 |
| 6960263 |
Shadow frame with cross beam for semiconductor equipment |
Nov. 1, 2005 |
| 6958098 |
Semiconductor wafer support lift-pin assembly |
Oct. 25, 2005 |
| 6955741 |
Semiconductor-processing reaction chamber |
Oct. 18, 2005 |
| 6955720 |
Plasma deposition of spin chucks to reduce contamination of Silicon wafers |
Oct. 18, 2005 |
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