| |
 |
|
Class Information
Number: 156/345.52
Name: Adhesive bonding and miscellaneous chemical manufacture > Differential fluid etching apparatus > With workpiece support > With means to heat the workpiece support
Description: Apparatus wherein the holding means includes a heating device to heat the holding means.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 6464794 |
Process chamber used in manufacture of semiconductor device, capable of reducing contamination by particulates |
Oct. 15, 2002 |
| 6444086 |
Device for vacuum coating slide bearings |
Sep. 3, 2002 |
| 6432208 |
Plasma processing apparatus |
Aug. 13, 2002 |
| 6423178 |
Apparatus for plasma process |
Jul. 23, 2002 |
| 6416618 |
Wafer processing apparatus |
Jul. 9, 2002 |
| 6406545 |
Semiconductor workpiece processing apparatus and method |
Jun. 18, 2002 |
| 6391148 |
Cobalt silicide etch process and apparatus |
May. 21, 2002 |
| 6323454 |
Apparatus employable for ashing |
Nov. 27, 2001 |
| 6235146 |
Vacuum treatment system and its stage |
May. 22, 2001 |
| 6214121 |
Pedestal with a thermally controlled platen |
Apr. 10, 2001 |
| 6200415 |
Load controlled rapid assembly clamp ring |
Mar. 13, 2001 |
| 6174371 |
Substrate treating method and apparatus |
Jan. 16, 2001 |
| 6167834 |
Thermal CVD/PECVD reactor and use for thermal chemical vapor deposition of silicon dioxide and in-situ multi-step planarized process |
Jan. 2, 2001 |
| 6120610 |
Plasma etch system |
Sep. 19, 2000 |
| 6113704 |
Substrate-supporting device for semiconductor processing |
Sep. 5, 2000 |
| 6110322 |
Prevention of ground fault interrupts in a semiconductor processing system |
Aug. 29, 2000 |
| 6077451 |
Method and apparatus for etching of silicon materials |
Jun. 20, 2000 |
| 6048434 |
Substrate holding system including an electrostatic chuck |
Apr. 11, 2000 |
| 6024828 |
Spin-on-glass etchback uniformity improvement using hot backside helium |
Feb. 15, 2000 |
| 6022418 |
Vacuum processing method |
Feb. 8, 2000 |
| 6007635 |
Platform for supporting a semiconductor substrate and method of supporting a substrate during rapid high temperature processing |
Dec. 28, 1999 |
| 5993595 |
Ozone asher |
Nov. 30, 1999 |
| 5958139 |
Plasma etch system |
Sep. 28, 1999 |
| 5958140 |
One-by-one type heat-processing apparatus |
Sep. 28, 1999 |
| 5948283 |
Method and apparatus for enhancing outcome uniformity of direct-plasma processes |
Sep. 7, 1999 |
| 5897740 |
Plasma processing system |
Apr. 27, 1999 |
| 5851298 |
Susceptor structure for mounting processing object thereon |
Dec. 22, 1998 |
| 5846375 |
Area specific temperature control for electrode plates and chucks used in semiconductor processing equipment |
Dec. 8, 1998 |
| 5834730 |
Plasma processing equipment and gas discharging device |
Nov. 10, 1998 |
| 5775416 |
Temperature controlled chuck for vacuum processing |
Jul. 7, 1998 |
| 5763326 |
Etching process and device for cleaning semiconductor components, in particular power diodes |
Jun. 9, 1998 |
| 5676205 |
Quasi-infinite heat source/sink |
Oct. 14, 1997 |
| 5673750 |
Vacuum processing method and apparatus |
Oct. 7, 1997 |
| 5618350 |
Processing apparatus |
Apr. 8, 1997 |
| 5580421 |
Apparatus for surface conditioning |
Dec. 3, 1996 |
| 5567267 |
Method of controlling temperature of susceptor |
Oct. 22, 1996 |
| 5478401 |
Apparatus and method for surface treatment |
Dec. 26, 1995 |
| 5468326 |
Apparatus for polishing a diamond or carbon nitride film by reaction with oxygen transported to the film through a superionic conductor in contact with the film |
Nov. 21, 1995 |
| 5445677 |
Apparatus for manufacturing semiconductor and method of manufacturing semiconductor |
Aug. 29, 1995 |
| 5302209 |
Apparatus for manufacturing semiconductor device |
Apr. 12, 1994 |
| 5290381 |
Plasma etching apparatus |
Mar. 1, 1994 |
| 5288684 |
Photochemical vapor phase reaction apparatus and method of causing a photochemical vapor phase reaction |
Feb. 22, 1994 |
| 5248370 |
Apparatus for heating and cooling semiconductor wafers in semiconductor wafer processing equipment |
Sep. 28, 1993 |
| 5226056 |
Plasma ashing method and apparatus therefor |
Jul. 6, 1993 |
| 5223113 |
Apparatus for forming reduced pressure and for processing object |
Jun. 29, 1993 |
| 5174881 |
Apparatus for forming a thin film on surface of semiconductor substrate |
Dec. 29, 1992 |
| 5085750 |
Plasma treating method and apparatus therefor |
Feb. 4, 1992 |
| 4971653 |
Temperature controlled chuck for elevated temperature etch processing |
Nov. 20, 1990 |
| 4956043 |
Dry etching apparatus |
Sep. 11, 1990 |
| 4885047 |
Apparatus for photoresist stripping |
Dec. 5, 1989 |
|
|
|
