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Class Information
Number: 156/345.52
Name: Adhesive bonding and miscellaneous chemical manufacture > Differential fluid etching apparatus > With workpiece support > With means to heat the workpiece support
Description: Apparatus wherein the holding means includes a heating device to heat the holding means.










Patents under this class:
1 2 3 4 5 6 7

Patent Number Title Of Patent Date Issued
8679254 Vapor phase epitaxy apparatus of group III nitride semiconductor Mar. 25, 2014
8679255 Gas supply device, substrate processing apparatus and substrate processing method Mar. 25, 2014
8673081 High throughput multi-wafer epitaxial reactor Mar. 18, 2014
8663391 Electrostatic chuck having a plurality of heater coils Mar. 4, 2014
8652260 Apparatus for holding semiconductor wafers Feb. 18, 2014
8641825 Substrate temperature regulation fixed apparatus Feb. 4, 2014
8633423 Methods and apparatus for controlling substrate temperature in a process chamber Jan. 21, 2014
8623173 Substrate processing apparatus having electrode member Jan. 7, 2014
8608852 Temperature controlled plasma processing chamber component with zone dependent thermal efficiencies Dec. 17, 2013
8608854 CVD device Dec. 17, 2013
8608900 Plasma reactor with feed forward thermal control system using a thermal model for accommodating RF power changes or wafer temperature changes Dec. 17, 2013
8591754 Plasma processing apparatus and plasma processing method Nov. 26, 2013
8580585 Method and system for controlled isotropic etching on a plurality of etch systems Nov. 12, 2013
8569647 Heat treatment apparatus Oct. 29, 2013
8555810 Plasma dry etching apparatus having coupling ring with cooling and heating units Oct. 15, 2013
8546270 Atomic layer deposition apparatus Oct. 1, 2013
8540819 Ceramic heater Sep. 24, 2013
8540818 Polycrystalline silicon reactor Sep. 24, 2013
8505928 Substrate temperature control fixing apparatus Aug. 13, 2013
8506712 Wafer support jig, vertical heat treatment boat including wafer support jig, and method for manufacturing wafer support jig Aug. 13, 2013
8491752 Substrate mounting table and method for manufacturing same, substrate processing apparatus, and fluid supply mechanism Jul. 23, 2013
8475623 Substrate processing method, system and program Jul. 2, 2013
8430962 Gas supply device, substrate processing apparatus and substrate processing method Apr. 30, 2013
8430960 Deposition systems and susceptor assemblies for depositing a film on a substrate Apr. 30, 2013
8409355 Low profile process kit Apr. 2, 2013
8409399 Reduced maintenance chemical oxide removal (COR) processing system Apr. 2, 2013
8404048 Off-angled heating of the underside of a substrate using a lamp assembly Mar. 26, 2013
8398815 Plasma processing apparatus Mar. 19, 2013
8394201 Atomic layer deposition apparatus Mar. 12, 2013
8388755 Thermalization of gaseous precursors in CVD reactors Mar. 5, 2013
8388853 Non-contact substrate processing Mar. 5, 2013
8375891 Vacuum vapor processing apparatus Feb. 19, 2013
8378272 Heat treatment apparatus, heat treatment method and storage medium Feb. 19, 2013
8372203 Apparatus temperature control and pattern compensation Feb. 12, 2013
8371567 Pedestal covers Feb. 12, 2013
8349128 Method and apparatus for stable plasma processing Jan. 8, 2013
8343280 Multi-zone substrate temperature control system and method of operating Jan. 1, 2013
8337660 Capacitively coupled plasma reactor having very agile wafer temperature control Dec. 25, 2012
8328942 Wafer heating and temperature control by backside fluid injection Dec. 11, 2012
RE43837 Substrate supporting apparatus Dec. 4, 2012
8323413 Susceptor and semiconductor manufacturing apparatus including the same Dec. 4, 2012
8303712 Substrate processing apparatus, method for manufacturing semiconductor device, and process tube Nov. 6, 2012
8297224 Substrate processing apparatus Oct. 30, 2012
8293070 Oxygen ion implantation equipment Oct. 23, 2012
8293014 Substrate processing apparatus and reaction tube for processing substrate Oct. 23, 2012
8287688 Substrate support for high throughput chemical treatment system Oct. 16, 2012
8282767 Plasma processing apparatus Oct. 9, 2012
8257547 Surface activation device Sep. 4, 2012
8257601 Substrate processing method, system and program Sep. 4, 2012
8231798 Plasma processing apparatus and plasma processing method Jul. 31, 2012

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