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Class Information
Number: 156/345.52
Name: Adhesive bonding and miscellaneous chemical manufacture > Differential fluid etching apparatus > With workpiece support > With means to heat the workpiece support
Description: Apparatus wherein the holding means includes a heating device to heat the holding means.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7396432 |
Composite shadow ring assembled with dowel pins and method of using |
Jul. 8, 2008 |
| 7393418 |
Susceptor |
Jul. 1, 2008 |
| 7393417 |
Semiconductor-manufacturing apparatus |
Jul. 1, 2008 |
| 7393433 |
Plasma processing apparatus, semiconductor manufacturing apparatus and electrostatic chucking unit used thereof |
Jul. 1, 2008 |
| 7390366 |
Apparatus for chemical vapor deposition |
Jun. 24, 2008 |
| 7390367 |
Housing assembly for an induction heating device including liner or susceptor coating |
Jun. 24, 2008 |
| 7381276 |
Susceptor pocket with beveled projection sidewall |
Jun. 3, 2008 |
| 7381293 |
Convex insert ring for etch chamber |
Jun. 3, 2008 |
| 7364624 |
Wafer handling apparatus and method of manufacturing thereof |
Apr. 29, 2008 |
| RE40264 |
Multi-temperature processing |
Apr. 29, 2008 |
| 7361230 |
Substrate processing apparatus |
Apr. 22, 2008 |
| 7347901 |
Thermally zoned substrate holder assembly |
Mar. 25, 2008 |
| 7338578 |
Step edge insert ring for etch chamber |
Mar. 4, 2008 |
| 7337745 |
Electrode, susceptor, plasma processing apparatus and method of making the electrode and the susceptor |
Mar. 4, 2008 |
| 7335267 |
Heat treating apparatus having rotatable heating unit |
Feb. 26, 2008 |
| 7335278 |
Plasma processing apparatus and plasma processing method |
Feb. 26, 2008 |
| 7332038 |
Device for depositing in particular crystalline layers on one or more, in particular likewise crystalline substrates |
Feb. 19, 2008 |
| 7320733 |
Electron bombardment heating apparatus and temperature controlling apparatus and control method thereof |
Jan. 22, 2008 |
| 7311797 |
Productivity enhancing thermal sprayed yttria-containing coating for plasma reactor |
Dec. 25, 2007 |
| 7311782 |
Apparatus for active temperature control of susceptors |
Dec. 25, 2007 |
| 7304264 |
Micro thermal chamber having proximity control temperature management for devices under test |
Dec. 4, 2007 |
| 7303998 |
Plasma processing method |
Dec. 4, 2007 |
| 7300537 |
Productivity enhancing thermal sprayed yttria-containing coating for plasma reactor |
Nov. 27, 2007 |
| 7297894 |
Method for multi-step temperature control of a substrate |
Nov. 20, 2007 |
| 7297895 |
Apparatus for removal of minute particles from a surface using thermophoresis to prevent particle redeposition |
Nov. 20, 2007 |
| 7279048 |
Semiconductor manufacturing apparatus |
Oct. 9, 2007 |
| 7252737 |
Pedestal with integral shield |
Aug. 7, 2007 |
| 7252738 |
Apparatus for reducing polymer deposition on a substrate and substrate support |
Aug. 7, 2007 |
| 7250094 |
Heat treatment apparatus |
Jul. 31, 2007 |
| 7244311 |
Heat transfer system for improved semiconductor processing uniformity |
Jul. 17, 2007 |
| 7241346 |
Apparatus for vapor deposition |
Jul. 10, 2007 |
| 7230204 |
Method and system for temperature control of a substrate |
Jun. 12, 2007 |
| 7211154 |
Electrode-built-in susceptor |
May. 1, 2007 |
| 7211153 |
Ceramic joined body, substrate holding structure and substrate processing apparatus |
May. 1, 2007 |
| 7208066 |
Substrate processing apparatus and substrate processing method |
Apr. 24, 2007 |
| 7208421 |
Method and apparatus for production of metal film or the like |
Apr. 24, 2007 |
| 7208422 |
Plasma processing method |
Apr. 24, 2007 |
| 7204888 |
Lift pin assembly for substrate processing |
Apr. 17, 2007 |
| 7204913 |
In-situ pre-coating of plasma etch chamber for improved productivity and chamber condition control |
Apr. 17, 2007 |
| 7195693 |
Lateral temperature equalizing system for large area surfaces during processing |
Mar. 27, 2007 |
| 7175737 |
Electrostatic chucking stage and substrate processing apparatus |
Feb. 13, 2007 |
| 7169234 |
Apparatus and methods for preventing rotational slippage between a vertical shaft and a support structure for a semiconductor wafer holder |
Jan. 30, 2007 |
| 7166187 |
Segmented cold plate for rapid thermal processing (RTP) tool for conduction cooling |
Jan. 23, 2007 |
| 7166166 |
Method and apparatus for an improved baffle plate in a plasma processing system |
Jan. 23, 2007 |
| 7153367 |
Drive mechanism for a vacuum treatment apparatus |
Dec. 26, 2006 |
| 7147719 |
Double slit-valve doors for plasma processing |
Dec. 12, 2006 |
| 7108753 |
Staggered ribs on process chamber to reduce thermal effects |
Sep. 19, 2006 |
| 7087119 |
Atomic layer deposition with point of use generated reactive gas species |
Aug. 8, 2006 |
| 7077913 |
Apparatus for fabricating a semiconductor device |
Jul. 18, 2006 |
| 7077912 |
Semiconductor manufacturing system |
Jul. 18, 2006 |
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