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Class Information
Number: 156/345.51
Name: Adhesive bonding and miscellaneous chemical manufacture > Differential fluid etching apparatus > With workpiece support
Description: Apparatus including a heated, cooled, movable, or structurally defined means which holds the workpiece to be etched.










Sub-classes under this class:

Class Number Class Name Patents
156/345.53 With means to cool the workpiece support 270
156/345.52 With means to heat the workpiece support 348
156/345.54 With means to move the workpiece inside the etching chamber 223


Patents under this class:
1 2 3 4 5 6 7 8 9 10 11 12 13

Patent Number Title Of Patent Date Issued
8710401 Laser processing machine Apr. 29, 2014
8702867 Gas distribution plate and substrate treating apparatus including the same Apr. 22, 2014
8702903 Thermally conductive sheet and substrate mounting device including same Apr. 22, 2014
8687343 Substrate mounting table of substrate processing apparatus Apr. 1, 2014
8679254 Vapor phase epitaxy apparatus of group III nitride semiconductor Mar. 25, 2014
8673081 High throughput multi-wafer epitaxial reactor Mar. 18, 2014
8671882 Plasma processing apparatus Mar. 18, 2014
8673166 Plasma processing apparatus and plasma processing method Mar. 18, 2014
8663391 Electrostatic chuck having a plurality of heater coils Mar. 4, 2014
8664098 Plasma processing apparatus Mar. 4, 2014
8641825 Substrate temperature regulation fixed apparatus Feb. 4, 2014
8636873 Plasma processing apparatus and structure therein Jan. 28, 2014
8629370 Assembly for delivering RF power and DC voltage to a plasma processing chamber Jan. 14, 2014
8623142 Coating apparatus Jan. 7, 2014
8617352 Electrode assembly for the removal of surface oxides by electron attachment Dec. 31, 2013
8607731 Cathode with inner and outer electrodes at different heights Dec. 17, 2013
8608852 Temperature controlled plasma processing chamber component with zone dependent thermal efficiencies Dec. 17, 2013
8608854 CVD device Dec. 17, 2013
8608900 Plasma reactor with feed forward thermal control system using a thermal model for accommodating RF power changes or wafer temperature changes Dec. 17, 2013
8603249 Lift pin driving device and manufacturing apparatus having same Dec. 10, 2013
8591700 Susceptor support system Nov. 26, 2013
8580037 Method of depositing materials on a non-planar surface Nov. 12, 2013
8567421 Method and system for uniformly applying a multi-phase cleaning solution to a substrate Oct. 29, 2013
8562746 Sectional wafer carrier Oct. 22, 2013
8562745 Stable wafer-carrier system Oct. 22, 2013
8562744 Coating device Oct. 22, 2013
8552334 Adjustable gap capacitively coupled RF plasma reactor including lateral bellows and non-contact particle seal Oct. 8, 2013
8546270 Atomic layer deposition apparatus Oct. 1, 2013
8540818 Polycrystalline silicon reactor Sep. 24, 2013
8540819 Ceramic heater Sep. 24, 2013
8529730 Plasma processing apparatus Sep. 10, 2013
8529729 Plasma processing chamber component having adaptive thermal conductor Sep. 10, 2013
8524555 Susceptor with backside area of constant emissivity Sep. 3, 2013
8512511 Mounting table and plasma processing apparatus Aug. 20, 2013
8500953 Edge ring assembly with dielectric spacer ring Aug. 6, 2013
8491751 Plasma processing apparatus Jul. 23, 2013
8491752 Substrate mounting table and method for manufacturing same, substrate processing apparatus, and fluid supply mechanism Jul. 23, 2013
8480806 Bonding structure and semiconductor device manufacturing apparatus Jul. 9, 2013
8480850 Plasma treatment system Jul. 9, 2013
8475623 Substrate processing method, system and program Jul. 2, 2013
8475622 Method of reusing a consumable part for use in a plasma processing apparatus Jul. 2, 2013
8470128 Tray, tray support member, and vacuum processing apparatus Jun. 25, 2013
8458872 Low-pressure process apparatus Jun. 11, 2013
8449679 Temperature controlled hot edge ring assembly May. 28, 2013
8440019 Lower liner with integrated flow equalizer and improved conductance May. 14, 2013
8425682 High strip rate downstream chamber Apr. 23, 2013
8420168 Delivery device for deposition Apr. 16, 2013
8414735 Ring-shaped component for use in a plasma processing, plasma processing apparatus and outer ring-shaped member Apr. 9, 2013
8414704 Bonding structure and semiconductor device manufacturing apparatus Apr. 9, 2013
8409355 Low profile process kit Apr. 2, 2013

1 2 3 4 5 6 7 8 9 10 11 12 13










 
 
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