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Class Information
Number: 156/345.5
Name: Adhesive bonding and miscellaneous chemical manufacture > Differential fluid etching apparatus > With means for photochemical energization of a gas using ultraviolet, visible, or x-ray radiation
Description: Apparatus including means to energize a gas through absorption of ultraviolet, visible, or x-ray radiation to render it effective as an etchant gas.


Patents under this class:
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Patent Number Title Of Patent Date Issued
7435983 Device for injecting electromagnetic radiation into a reactor Oct. 14, 2008
7332731 Radiation system and lithographic apparatus Feb. 19, 2008
7323060 Substrate treating apparatus Jan. 29, 2008
7297895 Apparatus for removal of minute particles from a surface using thermophoresis to prevent particle redeposition Nov. 20, 2007
7270724 Scanning plasma reactor Sep. 18, 2007
7230258 Plasma-based debris mitigation for extreme ultraviolet (EUV) light source Jun. 12, 2007
7182819 Methods for cleaning a chamber of semiconductor device manufacturing equipment Feb. 27, 2007
7166186 Laser decapsulation apparatus and method Jan. 23, 2007
7087119 Atomic layer deposition with point of use generated reactive gas species Aug. 8, 2006
7025831 Apparatus for surface conditioning Apr. 11, 2006
7001481 Method and system providing high flux of point of use activated reactive species for semiconductor processing Feb. 21, 2006
6968850 In-situ cleaning of light source collector optics Nov. 29, 2005
6949147 In situ module for particle removal from solid-state surfaces Sep. 27, 2005
6926801 Laser machining method and apparatus Aug. 9, 2005
6890387 Method and device for correcting pattern film on a semiconductor substrate May. 10, 2005
6878303 Substrate processing apparatus and substrate processing method Apr. 12, 2005
6866721 Apparatus and method for photo-induced process Mar. 15, 2005
6858695 Curable hot melt adhesive for casemaking Feb. 22, 2005
6833047 Alarm apparatus for exchanging lamps of wafer etching equipment Dec. 21, 2004
6821906 Method and apparatus for treating surface of substrate plate Nov. 23, 2004
6805751 Method and apparatus for removal of minute particles from a surface using thermophoresis to prevent particle redeposition Oct. 19, 2004
6752900 Vacuum loadlock ultraviolet bake for plasma etch Jun. 22, 2004
6726805 Pedestal with integral shield Apr. 27, 2004
6648973 Process for the treatment of a fiber Nov. 18, 2003
6610169 Semiconductor processing system and method Aug. 26, 2003
6537422 Single-substrate-heat-processing apparatus for semiconductor process Mar. 25, 2003
6467491 Processing apparatus and processing method Oct. 22, 2002
6464793 Semiconductor crystal growth apparatus Oct. 15, 2002
6461437 Apparatus used for fabricating liquid crystal device and method of fabricating the same Oct. 8, 2002
6450116 Apparatus for exposing a substrate to plasma radicals Sep. 17, 2002
6348125 Removal of copper oxides from integrated interconnects Feb. 19, 2002
6287413 Apparatus for processing both sides of a microelectronic device precursor Sep. 11, 2001
6190458 Apparatus for eliminating impurities by ozone generated in space above substrate surface and film forming method and system therewith Feb. 20, 2001
6187133 Gas manifold for uniform gas distribution and photochemistry Feb. 13, 2001
6165273 Equipment for UV wafer heating and photochemistry Dec. 26, 2000
6123803 Laser processing chamber with cassette cell Sep. 26, 2000
6098637 In situ cleaning of the surface inside a vacuum processing chamber Aug. 8, 2000
6095085 Photo-assisted remote plasma apparatus and method Aug. 1, 2000
6015759 Surface modification of semiconductors using electromagnetic radiation Jan. 18, 2000
6015503 Method and apparatus for surface conditioning Jan. 18, 2000
5753886 Plasma treatment apparatus and method May. 19, 1998
5647946 Structure and method including dry etching techniques for forming an array of thermal sensitive elements Jul. 15, 1997
5580421 Apparatus for surface conditioning Dec. 3, 1996
5563416 Processing apparatus using fast atom beam Oct. 8, 1996
5547642 Light ozone asher, light ashing method, and manufacturing method of semiconductor device Aug. 20, 1996
5531857 Removal of surface contaminants by irradiation from a high energy source Jul. 2, 1996
5478401 Apparatus and method for surface treatment Dec. 26, 1995
5443676 Method and apparatus for etching round templates Aug. 22, 1995
5419798 Suppression of graphite formation during laser etching of diamond May. 30, 1995
5413664 Apparatus for preparing a semiconductor device, photo treatment apparatus, pattern forming apparatus and fabrication apparatus May. 9, 1995

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