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Class Information
Number: 156/345.5
Name: Adhesive bonding and miscellaneous chemical manufacture > Differential fluid etching apparatus > With means for photochemical energization of a gas using ultraviolet, visible, or x-ray radiation
Description: Apparatus including means to energize a gas through absorption of ultraviolet, visible, or x-ray radiation to render it effective as an etchant gas.










Patents under this class:
1 2 3

Patent Number Title Of Patent Date Issued
8536550 Method and apparatus for cleaning collector mirror in EUV light generator Sep. 17, 2013
8525139 Method and apparatus of halogen removal Sep. 3, 2013
8434423 Substrate carrying apparatus having circumferential sidewall and substrate processing system May. 7, 2013
8398816 Method and apparatuses for reducing porogen accumulation from a UV-cure chamber Mar. 19, 2013
8354657 Extreme ultra violet light source apparatus Jan. 15, 2013
8298372 Quartz window having gas feed and processing equipment incorporating same Oct. 30, 2012
8232538 Method and apparatus of halogen removal using optimal ozone and UV exposure Jul. 31, 2012
8163129 Method and apparatus for cleaning a substrate Apr. 24, 2012
8075732 EUV collector debris management Dec. 13, 2011
7935218 Optical apparatus, lithographic apparatus and device manufacturing method May. 3, 2011
7872245 Systems and methods for target material delivery in a laser produced plasma EUV light source Jan. 18, 2011
7705333 Extreme ultra violet light source apparatus Apr. 27, 2010
7612353 Lithographic apparatus, contaminant trap, and device manufacturing method Nov. 3, 2009
7566368 Method and apparatus for an improved upper electrode plate in a plasma processing system Jul. 28, 2009
7514015 Method for surface cleaning Apr. 7, 2009
7442274 Plasma etching method and apparatus therefor Oct. 28, 2008
7435983 Device for injecting electromagnetic radiation into a reactor Oct. 14, 2008
7332731 Radiation system and lithographic apparatus Feb. 19, 2008
7323060 Substrate treating apparatus Jan. 29, 2008
7297895 Apparatus for removal of minute particles from a surface using thermophoresis to prevent particle redeposition Nov. 20, 2007
7270724 Scanning plasma reactor Sep. 18, 2007
7230258 Plasma-based debris mitigation for extreme ultraviolet (EUV) light source Jun. 12, 2007
7182819 Methods for cleaning a chamber of semiconductor device manufacturing equipment Feb. 27, 2007
7166186 Laser decapsulation apparatus and method Jan. 23, 2007
7087119 Atomic layer deposition with point of use generated reactive gas species Aug. 8, 2006
7025831 Apparatus for surface conditioning Apr. 11, 2006
7001481 Method and system providing high flux of point of use activated reactive species for semiconductor processing Feb. 21, 2006
6968850 In-situ cleaning of light source collector optics Nov. 29, 2005
6949147 In situ module for particle removal from solid-state surfaces Sep. 27, 2005
6926801 Laser machining method and apparatus Aug. 9, 2005
6890387 Method and device for correcting pattern film on a semiconductor substrate May. 10, 2005
6878303 Substrate processing apparatus and substrate processing method Apr. 12, 2005
6866721 Apparatus and method for photo-induced process Mar. 15, 2005
6858695 Curable hot melt adhesive for casemaking Feb. 22, 2005
6833047 Alarm apparatus for exchanging lamps of wafer etching equipment Dec. 21, 2004
6821906 Method and apparatus for treating surface of substrate plate Nov. 23, 2004
6805751 Method and apparatus for removal of minute particles from a surface using thermophoresis to prevent particle redeposition Oct. 19, 2004
6752900 Vacuum loadlock ultraviolet bake for plasma etch Jun. 22, 2004
6726805 Pedestal with integral shield Apr. 27, 2004
6648973 Process for the treatment of a fiber Nov. 18, 2003
6610169 Semiconductor processing system and method Aug. 26, 2003
6537422 Single-substrate-heat-processing apparatus for semiconductor process Mar. 25, 2003
6467491 Processing apparatus and processing method Oct. 22, 2002
6464793 Semiconductor crystal growth apparatus Oct. 15, 2002
6461437 Apparatus used for fabricating liquid crystal device and method of fabricating the same Oct. 8, 2002
6450116 Apparatus for exposing a substrate to plasma radicals Sep. 17, 2002
6348125 Removal of copper oxides from integrated interconnects Feb. 19, 2002
6287413 Apparatus for processing both sides of a microelectronic device precursor Sep. 11, 2001
6190458 Apparatus for eliminating impurities by ozone generated in space above substrate surface and film forming method and system therewith Feb. 20, 2001
6187133 Gas manifold for uniform gas distribution and photochemistry Feb. 13, 2001

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