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Class Information
Number: 156/345.49
Name: Adhesive bonding and miscellaneous chemical manufacture > Differential fluid etching apparatus > With radio frequency (rf) antenna or inductive coil gas energizing means > With magnetic field generating means for control of the etchant gas
Description: Apparatus including means for creating a magnetic field for control of the etchant gas.










Patents under this class:
1 2 3

Patent Number Title Of Patent Date Issued
8691048 Plasma stabilization method and plasma apparatus Apr. 8, 2014
8671878 Profile and CD uniformity control by plasma oxidation treatment Mar. 18, 2014
8597464 Inductively coupled plasma reactor with multiple magnetic cores Dec. 3, 2013
8590485 Small form factor plasma source for high density wide ribbon ion beam generation Nov. 26, 2013
8578879 Apparatus for VHF impedance match tuning Nov. 12, 2013
8551289 Plasma processing apparatus Oct. 8, 2013
8540843 Plasma chamber top piece assembly Sep. 24, 2013
8486242 Deposition apparatus and methods to reduce deposition asymmetry Jul. 16, 2013
8444870 Inductive plasma source with high coupling efficiency May. 21, 2013
8440051 Plasma processing chamber for bevel edge processing May. 14, 2013
8425719 Plasma generating apparatus Apr. 23, 2013
8419893 Shielded lid heater assembly Apr. 16, 2013
8419960 Plasma processing apparatus and method Apr. 16, 2013
8414736 Plasma reactor with tiltable overhead RF inductive source Apr. 9, 2013
8336490 Plasma processing apparatus Dec. 25, 2012
8317971 Plasma processing apparatus and method of manufacturing magnetic recording medium Nov. 27, 2012
8293069 Inductively coupled plasma apparatus Oct. 23, 2012
8251012 Substrate processing apparatus and semiconductor device producing method Aug. 28, 2012
8246798 Substrate processing apparatus and apparatus and method of manufacturing magnetic device Aug. 21, 2012
8179050 Helicon plasma source with permanent magnets May. 15, 2012
8157976 Apparatus for cathodic vacuum-arc coating deposition Apr. 17, 2012
8114245 Plasma etching device Feb. 14, 2012
8083892 Apparatus for generating gas plasma, gas composition for generating plasma and method for manufacturing semiconductor device using the same Dec. 27, 2011
8021515 Inductively coupled plasma processing apparatus Sep. 20, 2011
7955986 Capacitively coupled plasma reactor with magnetic plasma control Jun. 7, 2011
7922865 Magnetic field generator for magnetron plasma, and plasma etching apparatus and method comprising the magnetic field generator Apr. 12, 2011
7837826 Hybrid RF capacitively and inductively coupled plasma source using multifrequency RF powers and methods of use thereof Nov. 23, 2010
7828927 Plasma processing device Nov. 9, 2010
7789992 Neutral beam etching device for separating and accelerating plasma Sep. 7, 2010
7771562 Etch system with integrated inductive coupling Aug. 10, 2010
7695983 Independent control of ion density, ion energy distribution and ion dissociation in a plasma reactor Apr. 13, 2010
7673583 Locally-efficient inductive plasma coupling for plasma processing system Mar. 9, 2010
7651587 Two-piece dome with separate RF coils for inductively coupled plasma reactors Jan. 26, 2010
7591935 Enhanced reliability deposition baffle for iPVD Sep. 22, 2009
7585385 Plasma processing apparatus, control method thereof and program for performing same Sep. 8, 2009
7478609 Plasma process apparatus and its processor Jan. 20, 2009
7458335 Uniform magnetically enhanced reactive ion etching using nested electromagnetic coils Dec. 2, 2008
7444955 Apparatus for directing plasma flow to coat internal passageways Nov. 4, 2008
7430984 Method to drive spatially separate resonant structure with spatially distinct plasma secondaries using a single generator and switching elements Oct. 7, 2008
7419567 Plasma processing apparatus and method Sep. 2, 2008
7392760 Microwave-excited plasma processing apparatus Jul. 1, 2008
7325511 Microwave plasma processing apparatus, microwave processing method and microwave feeding apparatus Feb. 5, 2008
7320331 In-situ plasma cleaning device for cylindrical surfaces Jan. 22, 2008
7316199 Method and apparatus for controlling the magnetic field intensity in a plasma enhanced semiconductor wafer processing chamber Jan. 8, 2008
7234413 Plasma processing apparatus Jun. 26, 2007
7226524 Plasma processing apparatus Jun. 5, 2007
7217337 Plasma process chamber and system May. 15, 2007
7210424 High-density plasma processing apparatus May. 1, 2007
7183716 Charged particle source and operation thereof Feb. 27, 2007
7171919 Diamond film depositing apparatus using microwaves and plasma Feb. 6, 2007

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