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Class Information
Number: 156/345.49
Name: Adhesive bonding and miscellaneous chemical manufacture > Differential fluid etching apparatus > With radio frequency (rf) antenna or inductive coil gas energizing means > With magnetic field generating means for control of the etchant gas
Description: Apparatus including means for creating a magnetic field for control of the etchant gas.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7591935 |
Enhanced reliability deposition baffle for iPVD |
Sep. 22, 2009 |
| 7585385 |
Plasma processing apparatus, control method thereof and program for performing same |
Sep. 8, 2009 |
| 7478609 |
Plasma process apparatus and its processor |
Jan. 20, 2009 |
| 7458335 |
Uniform magnetically enhanced reactive ion etching using nested electromagnetic coils |
Dec. 2, 2008 |
| 7444955 |
Apparatus for directing plasma flow to coat internal passageways |
Nov. 4, 2008 |
| 7430984 |
Method to drive spatially separate resonant structure with spatially distinct plasma secondaries using a single generator and switching elements |
Oct. 7, 2008 |
| 7419567 |
Plasma processing apparatus and method |
Sep. 2, 2008 |
| 7392760 |
Microwave-excited plasma processing apparatus |
Jul. 1, 2008 |
| 7325511 |
Microwave plasma processing apparatus, microwave processing method and microwave feeding apparatus |
Feb. 5, 2008 |
| 7320331 |
In-situ plasma cleaning device for cylindrical surfaces |
Jan. 22, 2008 |
| 7316199 |
Method and apparatus for controlling the magnetic field intensity in a plasma enhanced semiconductor wafer processing chamber |
Jan. 8, 2008 |
| 7234413 |
Plasma processing apparatus |
Jun. 26, 2007 |
| 7226524 |
Plasma processing apparatus |
Jun. 5, 2007 |
| 7217337 |
Plasma process chamber and system |
May. 15, 2007 |
| 7210424 |
High-density plasma processing apparatus |
May. 1, 2007 |
| 7183716 |
Charged particle source and operation thereof |
Feb. 27, 2007 |
| 7171919 |
Diamond film depositing apparatus using microwaves and plasma |
Feb. 6, 2007 |
| 7090742 |
Device for producing inductively coupled plasma and method thereof |
Aug. 15, 2006 |
| 7067034 |
Method and apparatus for plasma forming inner magnetic bucket to control a volume of a plasma |
Jun. 27, 2006 |
| 6899817 |
Device and method for etching a substrate using an inductively coupled plasma |
May. 31, 2005 |
| 6863835 |
Magnetic barrier for plasma in chamber exhaust |
Mar. 8, 2005 |
| 6805770 |
Technique for improving uniformity of magnetic fields that rotate or oscillate about an axis |
Oct. 19, 2004 |
| 6773544 |
Magnetic barrier for plasma in chamber exhaust |
Aug. 10, 2004 |
| 6764575 |
Magnetron plasma processing apparatus |
Jul. 20, 2004 |
| 6736931 |
Inductively coupled RF plasma reactor and plasma chamber enclosure structure therefor |
May. 18, 2004 |
| 6733617 |
Direct detection of dielectric etch system magnet driver and coil malfunctions |
May. 11, 2004 |
| 6719875 |
Plasma process apparatus |
Apr. 13, 2004 |
| 6709546 |
Device and method for etching a substrate by using an inductively coupled plasma |
Mar. 23, 2004 |
| 6682630 |
Uniform gas distribution in large area plasma source |
Jan. 27, 2004 |
| 6679981 |
Inductive plasma loop enhancing magnetron sputtering |
Jan. 20, 2004 |
| 6673199 |
Shaping a plasma with a magnetic field to control etch rate uniformity |
Jan. 6, 2004 |
| 6656540 |
Method for forming metallic film and apparatus for forming the same |
Dec. 2, 2003 |
| 6583064 |
Low contamination high density plasma etch chambers and methods for making the same |
Jun. 24, 2003 |
| 6568346 |
Distributed inductively-coupled plasma source and circuit for coupling induction coils to RF power supply |
May. 27, 2003 |
| 6545468 |
Calibration method for magnetically enhanced reactive ion etcher |
Apr. 8, 2003 |
| 6523493 |
Ring-shaped high-density plasma source and method |
Feb. 25, 2003 |
| 6506686 |
Plasma processing apparatus and plasma processing method |
Jan. 14, 2003 |
| 6503367 |
Magnetically enhanced inductively coupled plasma reactor with magnetically confined plasma |
Jan. 7, 2003 |
| 6503364 |
Plasma processing apparatus |
Jan. 7, 2003 |
| 6488807 |
Magnetic confinement in a plasma reactor having an RF bias electrode |
Dec. 3, 2002 |
| 6475333 |
Discharge plasma processing device |
Nov. 5, 2002 |
| 6471822 |
Magnetically enhanced inductively coupled plasma reactor with magnetically confined plasma |
Oct. 29, 2002 |
| 6453842 |
Externally excited torroidal plasma source using a gas distribution plate |
Sep. 24, 2002 |
| 6439154 |
Plasma processing apparatus for semiconductors |
Aug. 27, 2002 |
| 6436230 |
Process device |
Aug. 20, 2002 |
| 6432260 |
Inductively coupled ring-plasma source apparatus for processing gases and materials and method thereof |
Aug. 13, 2002 |
| 6432261 |
Plasma etching system |
Aug. 13, 2002 |
| 6418874 |
Toroidal plasma source for plasma processing |
Jul. 16, 2002 |
| 6413359 |
Plasma reactor with high selectivity and reduced damage |
Jul. 2, 2002 |
| 6403490 |
Method of producing a plasma by capacitive-type discharges with a multipole barrier, and apparatus for implementing such a method |
Jun. 11, 2002 |
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