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Class Information
Number: 156/345.48
Name: Adhesive bonding and miscellaneous chemical manufacture > Differential fluid etching apparatus > With radio frequency (rf) antenna or inductive coil gas energizing means
Description: Apparatus including means for energizing a gas through radiated or inductively coupled radio frequency electromagnetic energy to render it effective as an etchant gas.










Sub-classes under this class:

Class Number Class Name Patents
156/345.49 With magnetic field generating means for control of the etchant gas 150


Patents under this class:
1 2 3 4 5 6 7 8 9 10 11 12 13

Patent Number Title Of Patent Date Issued
8702866 Showerhead electrode assembly with gas flow modification for extended electrode life Apr. 22, 2014
8702902 Device for generating a plasma discharge for patterning the surface of a substrate Apr. 22, 2014
8691048 Plasma stabilization method and plasma apparatus Apr. 8, 2014
8671878 Profile and CD uniformity control by plasma oxidation treatment Mar. 18, 2014
8669538 Method of improving ion beam quality in an implant system Mar. 11, 2014
8662010 Plasma processing apparatus, plasma processing method, plasma film deposition apparatus, and plasma film deposition method Mar. 4, 2014
8664560 Method and apparatus for abatement of reaction products from a vacuum processing chamber Mar. 4, 2014
8652298 Triode reactor design with multiple radiofrequency powers Feb. 18, 2014
8653405 Method for operating a vacuum plasma process system Feb. 18, 2014
8641862 High dose implantation strip (HDIS) in H2 base chemistry Feb. 4, 2014
8629370 Assembly for delivering RF power and DC voltage to a plasma processing chamber Jan. 14, 2014
8622021 High lifetime consumable silicon nitride-silicon dioxide plasma processing components Jan. 7, 2014
8623171 Plasma processing apparatus Jan. 7, 2014
8617352 Electrode assembly for the removal of surface oxides by electron attachment Dec. 31, 2013
8613828 Procedure and device for the production of a plasma Dec. 24, 2013
8607731 Cathode with inner and outer electrodes at different heights Dec. 17, 2013
8608902 Plasma processing apparatus Dec. 17, 2013
8608903 Plasma processing apparatus and plasma processing method Dec. 17, 2013
8597463 Inductively coupled plasma processing apparatus Dec. 3, 2013
8591711 Method and chamber for inductively coupled plasma processing for cylinderical material with three-dimensional surface Nov. 26, 2013
8590485 Small form factor plasma source for high density wide ribbon ion beam generation Nov. 26, 2013
8578879 Apparatus for VHF impedance match tuning Nov. 12, 2013
8580076 Plasma apparatus, gas distribution assembly for a plasma apparatus and processes therewith Nov. 12, 2013
8562785 Gas distribution showerhead for inductively coupled plasma etch reactor Oct. 22, 2013
8551289 Plasma processing apparatus Oct. 8, 2013
8540843 Plasma chamber top piece assembly Sep. 24, 2013
8522716 Protective coating for a plasma processing chamber part and a method of use Sep. 3, 2013
8524099 Methods for accessing a process chamber using a dual zone gas injector with improved optical access Sep. 3, 2013
8518209 Apparatus for determining the endpoint of a cleaning or conditioning process in a plasma processing system Aug. 27, 2013
8485128 Movable ground ring for a plasma processing chamber Jul. 16, 2013
8480914 Multiple gas plasma forming method and ICP source Jul. 9, 2013
8460508 Synchronous pulse plasma etching equipment and method of fabricating a semiconductor device Jun. 11, 2013
8453600 Substrate processing apparatus Jun. 4, 2013
8454794 Antenna for plasma processor and apparatus Jun. 4, 2013
8444806 Plasma generator, plasma control method and method of producing substrate May. 21, 2013
8444870 Inductive plasma source with high coupling efficiency May. 21, 2013
8430960 Deposition systems and susceptor assemblies for depositing a film on a substrate Apr. 30, 2013
8425719 Plasma generating apparatus Apr. 23, 2013
8419893 Shielded lid heater assembly Apr. 16, 2013
8419894 Plasma generator, plasma control method and method of producing substrate Apr. 16, 2013
8415885 Plasma processing apparatus and plasma processing method Apr. 9, 2013
8414736 Plasma reactor with tiltable overhead RF inductive source Apr. 9, 2013
8413604 Slotted electrostatic shield modification for improved etch and CVD process uniformity Apr. 9, 2013
8409400 Inductive plasma chamber having multi discharge tube bridge Apr. 2, 2013
8404080 Apparatus to treat a substrate Mar. 26, 2013
8404137 Plasma processing apparatus and plasma processing method Mar. 26, 2013
8394232 Plasma processing apparatus Mar. 12, 2013
8382940 Device and method for producing chlorine trifluoride and system for etching semiconductor substrates using this device Feb. 26, 2013
8383002 Method of processing a workpiece in a plasma reactor with independent wafer edge process gas injection Feb. 26, 2013
8372239 Plasma processing apparatus Feb. 12, 2013

1 2 3 4 5 6 7 8 9 10 11 12 13










 
 
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