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Class Information
Number: 156/345.47
Name: Adhesive bonding and miscellaneous chemical manufacture > Differential fluid etching apparatus > Having glow discharge electrode gas energizing means > Parallel plate electrodes
Description: Apparatus including a pair of parallel planar glow discharge electrodes.










Patents under this class:
1 2 3 4 5 6 7 8 9 10

Patent Number Title Of Patent Date Issued
8689733 Plasma processor Apr. 8, 2014
8689734 Deposition of active films Apr. 8, 2014
8677590 Plasma confinement structures in plasma processing systems and methods thereof Mar. 25, 2014
8671882 Plasma processing apparatus Mar. 18, 2014
8664561 System and method for selectively controlling ion composition of ion sources Mar. 4, 2014
8652297 Symmetric VHF plasma power coupler with active uniformity steering Feb. 18, 2014
8652298 Triode reactor design with multiple radiofrequency powers Feb. 18, 2014
8641862 High dose implantation strip (HDIS) in H2 base chemistry Feb. 4, 2014
8636871 Plasma processing apparatus, plasma processing method and storage medium Jan. 28, 2014
8636872 Upper electrode and plasma processing apparatus Jan. 28, 2014
8622021 High lifetime consumable silicon nitride-silicon dioxide plasma processing components Jan. 7, 2014
8623171 Plasma processing apparatus Jan. 7, 2014
8623172 Gas flow path structure and substrate processing apparatus Jan. 7, 2014
8617349 Showerhead assembly for plasma processing chamber Dec. 31, 2013
8617352 Electrode assembly for the removal of surface oxides by electron attachment Dec. 31, 2013
8608900 Plasma reactor with feed forward thermal control system using a thermal model for accommodating RF power changes or wafer temperature changes Dec. 17, 2013
8608851 Plasma confinement apparatus, and method for confining a plasma Dec. 17, 2013
8603293 Plasma processing apparatus and method Dec. 10, 2013
8597461 Reduced isotropic etchant material consumption and waste generation Dec. 3, 2013
8591754 Plasma processing apparatus and plasma processing method Nov. 26, 2013
8578879 Apparatus for VHF impedance match tuning Nov. 12, 2013
8573152 Showerhead electrode Nov. 5, 2013
8574446 Apparatus and method for plasma processing Nov. 5, 2013
8561572 Gas supply system, substrate processing apparatus and gas supply method Oct. 22, 2013
8552334 Adjustable gap capacitively coupled RF plasma reactor including lateral bellows and non-contact particle seal Oct. 8, 2013
8545672 Plasma processing apparatus Oct. 1, 2013
8547021 Plasma processing apparatus Oct. 1, 2013
8547085 Plasma-facing probe arrangement including vacuum gap for use in a plasma processing chamber Oct. 1, 2013
8540844 Plasma confinement structures in plasma processing systems Sep. 24, 2013
8529730 Plasma processing apparatus Sep. 10, 2013
8522716 Protective coating for a plasma processing chamber part and a method of use Sep. 3, 2013
8518209 Apparatus for determining the endpoint of a cleaning or conditioning process in a plasma processing system Aug. 27, 2013
8518211 System and method for controlling plasma with an adjustable coupling to ground circuit Aug. 27, 2013
8519724 Electrode for use in measuring dielectric properties of parts Aug. 27, 2013
8513563 Plasma processing apparatus and plasma processing method Aug. 20, 2013
8512511 Mounting table and plasma processing apparatus Aug. 20, 2013
8506710 Apparatus for fabricating semiconductor device Aug. 13, 2013
8506753 Capacitive coupling plasma processing apparatus and method for using the same Aug. 13, 2013
8496781 Plasma processing apparatus Jul. 30, 2013
8491750 Adjustable confinement ring assembly Jul. 23, 2013
8484846 Method of joining components for a composite showerhead electrode assembly for a plasma processing apparatus Jul. 16, 2013
8480850 Plasma treatment system Jul. 9, 2013
8465620 Hollow anode plasma reactor and method Jun. 18, 2013
8460508 Synchronous pulse plasma etching equipment and method of fabricating a semiconductor device Jun. 11, 2013
8449679 Temperature controlled hot edge ring assembly May. 28, 2013
8449715 Internal member of a plasma processing vessel May. 28, 2013
8440051 Plasma processing chamber for bevel edge processing May. 14, 2013
8438990 Multi-electrode PECVD source May. 14, 2013
8435379 Substrate cleaning chamber and cleaning and conditioning methods May. 7, 2013
8431035 Plasma processing apparatus and method Apr. 30, 2013

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