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Class Information
Number: 156/345.44
Name: Adhesive bonding and miscellaneous chemical manufacture > Differential fluid etching apparatus > Having glow discharge electrode gas energizing means > Electrically coupled to a power supply or matching circuit
Description: Apparatus including a power supply or matching circuit electrically coupled with the glow discharge electrode to provide sufficient power to the electrode for energizing the gas.










Patents under this class:
1 2 3 4 5 6 7

Patent Number Title Of Patent Date Issued
8702902 Device for generating a plasma discharge for patterning the surface of a substrate Apr. 22, 2014
8689733 Plasma processor Apr. 8, 2014
8689734 Deposition of active films Apr. 8, 2014
8691047 Large area plasma processing chamber with at-electrode RF matching Apr. 8, 2014
8683943 Plasma process apparatus and plasma process method Apr. 1, 2014
8679307 Method and apparatus for preparing specimens for microscopy Mar. 25, 2014
8671882 Plasma processing apparatus Mar. 18, 2014
8652297 Symmetric VHF plasma power coupler with active uniformity steering Feb. 18, 2014
8652342 Semiconductor fabrication apparatuses to perform semiconductor etching and deposition processes and methods of forming semiconductor device using the same Feb. 18, 2014
8628640 Plasma processing unit and high-frequency electric power supplying unit Jan. 14, 2014
8622021 High lifetime consumable silicon nitride-silicon dioxide plasma processing components Jan. 7, 2014
8617352 Electrode assembly for the removal of surface oxides by electron attachment Dec. 31, 2013
8613827 Plasma treatment system Dec. 24, 2013
8603293 Plasma processing apparatus and method Dec. 10, 2013
8578879 Apparatus for VHF impedance match tuning Nov. 12, 2013
8573152 Showerhead electrode Nov. 5, 2013
8568554 Movable gas introduction structure and substrate processing apparatus having same Oct. 29, 2013
8545670 Plasma processing apparatus and plasma processing method Oct. 1, 2013
8545671 Plasma processing method and plasma processing apparatus Oct. 1, 2013
8547021 Plasma processing apparatus Oct. 1, 2013
8547085 Plasma-facing probe arrangement including vacuum gap for use in a plasma processing chamber Oct. 1, 2013
8536071 Gasket with positioning feature for clamped monolithic showerhead electrode Sep. 17, 2013
8528498 Integrated steerability array arrangement for minimizing non-uniformity Sep. 10, 2013
8529730 Plasma processing apparatus Sep. 10, 2013
8525417 Discharge electrode array for thin-film solar cell deposition Sep. 3, 2013
8518211 System and method for controlling plasma with an adjustable coupling to ground circuit Aug. 27, 2013
8513563 Plasma processing apparatus and plasma processing method Aug. 20, 2013
8496781 Plasma processing apparatus Jul. 30, 2013
8491750 Adjustable confinement ring assembly Jul. 23, 2013
8480849 Substrate processing apparatus and electrode structure Jul. 9, 2013
8480850 Plasma treatment system Jul. 9, 2013
8470095 Process and installation for surface preparation by dielectric barrier discharge Jun. 25, 2013
8470126 Wiggling control for pseudo-hardmask Jun. 25, 2013
8460508 Synchronous pulse plasma etching equipment and method of fabricating a semiconductor device Jun. 11, 2013
8453600 Substrate processing apparatus Jun. 4, 2013
8449715 Internal member of a plasma processing vessel May. 28, 2013
8450635 Method and apparatus for inducing DC voltage on wafer-facing electrode May. 28, 2013
8440050 Plasma processing apparatus and method, and storage medium May. 14, 2013
8431035 Plasma processing apparatus and method Apr. 30, 2013
8418649 Composite showerhead electrode assembly for a plasma processing apparatus Apr. 16, 2013
8419960 Plasma processing apparatus and method Apr. 16, 2013
8402918 Showerhead electrode with centering feature Mar. 26, 2013
8398815 Plasma processing apparatus Mar. 19, 2013
8397668 Plasma processing apparatus Mar. 19, 2013
8382939 Plasma processing chamber with enhanced gas delivery Feb. 26, 2013
8377255 Plasma processing apparatus and method of controlling distribution of a plasma therein Feb. 19, 2013
8357264 Plasma reactor with plasma load impedance tuning for engineered transients by synchronized modulation of a source power or bias power RF generator Jan. 22, 2013
8357265 Cleaning method and a vacuum processing apparatus Jan. 22, 2013
8349126 Apparatus for etching edge of wafer Jan. 8, 2013
8343592 Asymmetrical RF drive for electrode of plasma chamber Jan. 1, 2013

1 2 3 4 5 6 7










 
 
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