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Class Information
Number: 156/345.44
Name: Adhesive bonding and miscellaneous chemical manufacture > Differential fluid etching apparatus > Having glow discharge electrode gas energizing means > Electrically coupled to a power supply or matching circuit
Description: Apparatus including a power supply or matching circuit electrically coupled with the glow discharge electrode to provide sufficient power to the electrode for energizing the gas.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7625460 |
Multifrequency plasma reactor |
Dec. 1, 2009 |
| 7615132 |
Plasma processing apparatus having high frequency power source with sag compensation function and plasma processing method |
Nov. 10, 2009 |
| 7611585 |
Plasma reaction chamber with a built-in magnetic core |
Nov. 3, 2009 |
| 7611603 |
Plasma processing apparatus having impedance varying electrodes |
Nov. 3, 2009 |
| 7611993 |
Plasma processing method and plasma processing apparatus |
Nov. 3, 2009 |
| 7608162 |
Plasma processing apparatus and method |
Oct. 27, 2009 |
| 7587989 |
Plasma processing method and apparatus |
Sep. 15, 2009 |
| 7585685 |
Method of determining wafer voltage in a plasma reactor from applied bias voltage and current and a pair of constants |
Sep. 8, 2009 |
| 7586099 |
Vacuum plasma generator |
Sep. 8, 2009 |
| 7582184 |
Plasma processing member |
Sep. 1, 2009 |
| 7582185 |
Plasma-processing apparatus |
Sep. 1, 2009 |
| 7582186 |
Method and apparatus for an improved focus ring in a plasma processing system |
Sep. 1, 2009 |
| 7575638 |
Apparatus for defining regions of process exclusion and process performance in a process chamber |
Aug. 18, 2009 |
| 7553679 |
Method of determining plasma ion density, wafer voltage, etch rate and wafer current from applied bias voltage and current |
Jun. 30, 2009 |
| 7527016 |
Plasma processing apparatus |
May. 5, 2009 |
| 7520244 |
Plasma treatment apparatus |
Apr. 21, 2009 |
| 7517437 |
RF powered target for increasing deposition uniformity in sputtering systems |
Apr. 14, 2009 |
| 7513954 |
Plasma processing apparatus and substrate mounting table employed therein |
Apr. 7, 2009 |
| 7503996 |
Multiple frequency plasma chamber, switchable RF system, and processes using same |
Mar. 17, 2009 |
| 7479207 |
Adjustable height PIF probe |
Jan. 20, 2009 |
| 7467598 |
System for, and method of, etching a surface on a wafer |
Dec. 23, 2008 |
| 7464663 |
Roll-vortex plasma chemical vapor deposition system |
Dec. 16, 2008 |
| 7452443 |
Vacuum plasma generator |
Nov. 18, 2008 |
| 7446479 |
High-density plasma source |
Nov. 4, 2008 |
| 7442273 |
Apparatus using hybrid coupled plasma |
Oct. 28, 2008 |
| 7438765 |
Adjustable shielding plate for adjusting an etching area of a semiconductor wafer and related apparatus and methods |
Oct. 21, 2008 |
| 7426900 |
Integrated electrostatic inductive coupling for plasma processing |
Sep. 23, 2008 |
| 7415940 |
Plasma processor |
Aug. 26, 2008 |
| 7404874 |
Method and apparatus for treating wafer edge region with toroidal plasma |
Jul. 29, 2008 |
| 7393432 |
RF ground switch for plasma processing system |
Jul. 1, 2008 |
| 7374635 |
Forming method and forming system for insulation film |
May. 20, 2008 |
| 7288166 |
Plasma processing apparatus |
Oct. 30, 2007 |
| 7270713 |
Tunable gas distribution plate assembly |
Sep. 18, 2007 |
| 7256134 |
Selective etching of carbon-doped low-k dielectrics |
Aug. 14, 2007 |
| 7244475 |
Plasma treatment apparatus and control method thereof |
Jul. 17, 2007 |
| 7230202 |
Plasma processing apparatus, electrode unit, feeder member and radio frequency feeder rod |
Jun. 12, 2007 |
| 7225754 |
Plasma processing apparatus including a plurality of plasma processing units having reduced variation |
Jun. 5, 2007 |
| 7204913 |
In-situ pre-coating of plasma etch chamber for improved productivity and chamber condition control |
Apr. 17, 2007 |
| 7199328 |
Apparatus and method for plasma processing |
Apr. 3, 2007 |
| 7190119 |
Methods and apparatus for optimizing a substrate in a plasma processing system |
Mar. 13, 2007 |
| 7166185 |
Forming system for insulation film |
Jan. 23, 2007 |
| 7164236 |
Method and apparatus for improved plasma processing uniformity |
Jan. 16, 2007 |
| 7156949 |
Plasma processing apparatus |
Jan. 2, 2007 |
| 7153444 |
Apparatus and method for radio frequency de-coupling and bias voltage control in a plasma reactor |
Dec. 26, 2006 |
| 7150805 |
Plasma process device |
Dec. 19, 2006 |
| 7141757 |
Plasma reactor with overhead RF source power electrode having a resonance that is virtually pressure independent |
Nov. 28, 2006 |
| 7132040 |
Matching unit for semiconductor plasma processing apparatus |
Nov. 7, 2006 |
| 7115185 |
Pulsed excitation of inductively coupled plasma sources |
Oct. 3, 2006 |
| 7112926 |
Matching unit and plasma processing system |
Sep. 26, 2006 |
| 7093560 |
Techniques for reducing arcing-related damage in a clamping ring of a plasma processing system |
Aug. 22, 2006 |
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