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Class Information
Number: 156/345.43
Name: Adhesive bonding and miscellaneous chemical manufacture > Differential fluid etching apparatus > Having glow discharge electrode gas energizing means
Description: Apparatus including means to energize a gas through electron glow discharge from at least one electrode to render it effective as an etchant gas.










Sub-classes under this class:

Class Number Class Name Patents
156/345.44 Electrically coupled to a power supply or matching circuit 335
156/345.45 Including more than two electrodes (e.g., triode reactors) 149
156/345.47 Parallel plate electrodes 483
156/345.46 With magnetic field generating means for control of the etchant gas 219


Patents under this class:
1 2 3 4 5 6 7 8 9

Patent Number Title Of Patent Date Issued
7094314 Atmospheric pressure non-thermal plasma device to clean and sterilize the surfaces of probes, cannulas, pin tools, pipettes and spray heads Aug. 22, 2006
7059267 Use of pulsed grounding source in a plasma reactor Jun. 13, 2006
7044078 Layer forming method, product comprising the layer, optical film, dielectric-coated electrode and plasma discharge apparatus May. 16, 2006
7033444 Plasma processing apparatus, and electrode structure and table structure of processing apparatus Apr. 25, 2006
RE39064 Electronic device manufacturing apparatus and method for manufacturing electronic device Apr. 18, 2006
7025856 Processing materials inside an atmospheric-pressure radiofrequency nonthermal plasma discharge Apr. 11, 2006
7017594 Atmospheric pressure non-thermal plasma device to clean and sterilize the surfaces of probes, cannulas, pin tools, pipettes and spray heads Mar. 28, 2006
7013834 Plasma treatment system Mar. 21, 2006
7004107 Method and apparatus for monitoring and adjusting chamber impedance Feb. 28, 2006
6998014 Apparatus and method for plasma assisted deposition Feb. 14, 2006
6992375 Anchor for device package Jan. 31, 2006
6974523 Hollow anode plasma reactor and method Dec. 13, 2005
6953531 Methods of etching silicon-oxide-containing materials Oct. 11, 2005
6948448 Apparatus and method for depositing large area coatings on planar surfaces Sep. 27, 2005
6949165 Plasma processing apparatus Sep. 27, 2005
6949204 Deformation reduction at the main chamber Sep. 27, 2005
6946053 Plasma reactor Sep. 20, 2005
6929712 Plasma processing apparatus capable of evaluating process performance Aug. 16, 2005
6923886 Apparatus for plasma treatment of golf balls Aug. 2, 2005
6916401 Adjustable segmented electrode apparatus and method Jul. 12, 2005
6902648 Plasma etching device Jun. 7, 2005
6899787 Plasma processing apparatus and plasma processing system with reduced feeding loss, and method for stabilizing the apparatus and system May. 31, 2005
6899786 Processing device and method of maintaining the device, mechanism and method for assembling processing device part, and lock mechanism and method for locking the lock mechanism May. 31, 2005
6899054 Device for hybrid plasma processing May. 31, 2005
6899798 Reusable ceramic-comprising component which includes a scrificial surface layer May. 31, 2005
6896775 High-power pulsed magnetically enhanced plasma processing May. 24, 2005
6892669 CVD apparatus May. 17, 2005
6884635 Control of power delivered to a multiple segment inject electrode Apr. 26, 2005
6878233 Workpiece holding mechanism Apr. 12, 2005
6872281 Chamber configuration for confining a plasma Mar. 29, 2005
6872259 Method of and apparatus for tunable gas injection in a plasma processing system Mar. 29, 2005
6863020 Segmented electrode apparatus for plasma processing Mar. 8, 2005
6863018 Ion plating device and ion plating method Mar. 8, 2005
6857387 Multiple frequency plasma chamber with grounding capacitor at cathode Feb. 22, 2005
6834613 Plasma-resistant member and plasma treatment apparatus using the same Dec. 28, 2004
6830007 Apparatus and method for forming low dielectric constant film Dec. 14, 2004
6830649 Apparatus and method for producing semiconductors Dec. 14, 2004
6827787 Conveyor device and film formation apparatus for a flexible substrate Dec. 7, 2004
6820570 Atomic layer deposition reactor Nov. 23, 2004
6821379 Portable apparatus and method for treating a workpiece Nov. 23, 2004
6818097 Highly heat-resistant plasma etching electrode and dry etching device including the same Nov. 16, 2004
6818096 Plasma reactor electrode Nov. 16, 2004
6793767 Wafer stage including electrostatic chuck and method for dechucking wafer using the wafer stage Sep. 21, 2004
6786175 Showerhead electrode design for semiconductor processing reactor Sep. 7, 2004
6783629 Plasma treatment apparatus with improved uniformity of treatment and method for improving uniformity of plasma treatment Aug. 31, 2004
6779483 Plasma CVD apparatus for large area CVD film Aug. 24, 2004
6779481 Electrical coupling between chamber parts in electronic device processing equipment Aug. 24, 2004
6779482 Plasma deposition device for forming thin film Aug. 24, 2004
6777880 Device for specific particle manipulation and deposition Aug. 17, 2004
6767429 Vacuum processing apparatus Jul. 27, 2004

1 2 3 4 5 6 7 8 9










 
 
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