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Class Information
Number: 156/345.43
Name: Adhesive bonding and miscellaneous chemical manufacture > Differential fluid etching apparatus > Having glow discharge electrode gas energizing means
Description: Apparatus including means to energize a gas through electron glow discharge from at least one electrode to render it effective as an etchant gas.










Sub-classes under this class:

Class Number Class Name Patents
156/345.44 Electrically coupled to a power supply or matching circuit 344
156/345.45 Including more than two electrodes (e.g., triode reactors) 152
156/345.47 Parallel plate electrodes 490
156/345.46 With magnetic field generating means for control of the etchant gas 220


Patents under this class:
1 2 3 4 5 6 7 8 9 10

Patent Number Title Of Patent Date Issued
8701268 Composite showerhead electrode assembly for a plasma processing apparatus Apr. 22, 2014
8702866 Showerhead electrode assembly with gas flow modification for extended electrode life Apr. 22, 2014
8689733 Plasma processor Apr. 8, 2014
8683943 Plasma process apparatus and plasma process method Apr. 1, 2014
8686711 High-frequency measuring device and high-frequency measuring device calibration method Apr. 1, 2014
8679288 Showerhead electrode assemblies for plasma processing apparatuses Mar. 25, 2014
8671882 Plasma processing apparatus Mar. 18, 2014
8651049 Plasma processing apparatus Feb. 18, 2014
8652297 Symmetric VHF plasma power coupler with active uniformity steering Feb. 18, 2014
8643281 Signal generation system Feb. 4, 2014
8636871 Plasma processing apparatus, plasma processing method and storage medium Jan. 28, 2014
8622021 High lifetime consumable silicon nitride-silicon dioxide plasma processing components Jan. 7, 2014
8617349 Showerhead assembly for plasma processing chamber Dec. 31, 2013
8617352 Electrode assembly for the removal of surface oxides by electron attachment Dec. 31, 2013
8613827 Plasma treatment system Dec. 24, 2013
8608900 Plasma reactor with feed forward thermal control system using a thermal model for accommodating RF power changes or wafer temperature changes Dec. 17, 2013
8603293 Plasma processing apparatus and method Dec. 10, 2013
8597461 Reduced isotropic etchant material consumption and waste generation Dec. 3, 2013
8578879 Apparatus for VHF impedance match tuning Nov. 12, 2013
8580078 Bevel etcher with vacuum chuck Nov. 12, 2013
8580079 Electrode carrier assemblies Nov. 12, 2013
8573153 Multi-part electrode for a semiconductor processing plasma reactor and method of replacing a portion of a multi-part electrode Nov. 5, 2013
8573152 Showerhead electrode Nov. 5, 2013
8568554 Movable gas introduction structure and substrate processing apparatus having same Oct. 29, 2013
8561572 Gas supply system, substrate processing apparatus and gas supply method Oct. 22, 2013
8547085 Plasma-facing probe arrangement including vacuum gap for use in a plasma processing chamber Oct. 1, 2013
8540844 Plasma confinement structures in plasma processing systems Sep. 24, 2013
8536071 Gasket with positioning feature for clamped monolithic showerhead electrode Sep. 17, 2013
8528498 Integrated steerability array arrangement for minimizing non-uniformity Sep. 10, 2013
8529730 Plasma processing apparatus Sep. 10, 2013
8518209 Apparatus for determining the endpoint of a cleaning or conditioning process in a plasma processing system Aug. 27, 2013
8512511 Mounting table and plasma processing apparatus Aug. 20, 2013
8506710 Apparatus for fabricating semiconductor device Aug. 13, 2013
8500952 Plasma confinement rings having reduced polymer deposition characteristics Aug. 6, 2013
8500953 Edge ring assembly with dielectric spacer ring Aug. 6, 2013
8496781 Plasma processing apparatus Jul. 30, 2013
8491750 Adjustable confinement ring assembly Jul. 23, 2013
8486798 Variable capacitance chamber component incorporating a semiconductor junction and methods of manufacturing and using thereof Jul. 16, 2013
8484846 Method of joining components for a composite showerhead electrode assembly for a plasma processing apparatus Jul. 16, 2013
8480850 Plasma treatment system Jul. 9, 2013
8481434 Method of manufacturing a semiconductor device and processing apparatus Jul. 9, 2013
8475624 Method and system for distributing gas for a bevel edge etcher Jul. 2, 2013
8470127 Cam-locked showerhead electrode and assembly Jun. 25, 2013
8470126 Wiggling control for pseudo-hardmask Jun. 25, 2013
8470095 Process and installation for surface preparation by dielectric barrier discharge Jun. 25, 2013
8460508 Synchronous pulse plasma etching equipment and method of fabricating a semiconductor device Jun. 11, 2013
8453600 Substrate processing apparatus Jun. 4, 2013
8449715 Internal member of a plasma processing vessel May. 28, 2013
8443756 Showerhead electrodes and showerhead electrode assemblies having low-particle performance for semiconductor material processing apparatuses May. 21, 2013
8435379 Substrate cleaning chamber and cleaning and conditioning methods May. 7, 2013

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