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Class Information
Number: 156/345.4
Name: Adhesive bonding and miscellaneous chemical manufacture > Differential fluid etching apparatus > With means to direct electron beam or ion beam to a gas to energize the gas
Description: Apparatus including means to create an ion or electron beam and to direct the beam at a gas to energize the gas and render it effective as an etchant.










Patents under this class:

Patent Number Title Of Patent Date Issued
8607732 In-liquid plasma film-forming apparatus, electrode for in-liquid plasma, and film-forming method using in-liquid plasma Dec. 17, 2013
8530006 Localized plasma processing Sep. 10, 2013
8277603 Move mechanism for moving target object and charged particle beam writing apparatus Oct. 2, 2012
8087379 Localized plasma processing Jan. 3, 2012
7997227 Vacuum coater device and mechanism for supporting and manipulating workpieces in same Aug. 16, 2011
7935218 Optical apparatus, lithographic apparatus and device manufacturing method May. 3, 2011
7917241 Method and system for increasing throughput during location specific processing of a plurality of substrates Mar. 29, 2011
7833381 Optical emission interferometry for PECVD using a gas injection hole Nov. 16, 2010
7789992 Neutral beam etching device for separating and accelerating plasma Sep. 7, 2010
7777197 Vacuum reaction chamber with x-lamp heater Aug. 17, 2010
7713377 Apparatus and method for plasma treating a substrate May. 11, 2010
7444955 Apparatus for directing plasma flow to coat internal passageways Nov. 4, 2008
7367138 Devices and methods for thermophoretic and electrophoretic reduction of particulate contamination of lithographic reticles May. 6, 2008
H2212 Method and apparatus for producing an ion-ion plasma continuous in time Apr. 1, 2008
7276140 Plasma accelerating apparatus for semiconductor substrate processing and plasma processing system having the same Oct. 2, 2007
7201824 Hybrid optical multi-axis beam steering apparatus Apr. 10, 2007
7132621 Plasma catalyst Nov. 7, 2006
6936144 High frequency plasma source Aug. 30, 2005
6843927 Method and apparatus for endpoint detection in electron beam assisted etching Jan. 18, 2005
6843893 Metal dry etch using electronic field Jan. 18, 2005
6375790 Adaptive GCIB for smoothing surfaces Apr. 23, 2002
6273991 Apparatus for plasma ion trimming of frequency devices Aug. 14, 2001
6114811 Electromagnetic high-frequency apparatus with a transmission wall having antennas Sep. 5, 2000
6101972 Plasma processing system and method Aug. 15, 2000
5976328 Pattern forming method using charged particle beam process and charged particle beam processing system Nov. 2, 1999
5885354 Method and apparatus for processing a specimen Mar. 23, 1999
5853521 Multi-cathode electron beam plasma etcher Dec. 29, 1998
5851413 Gas delivery systems for particle beam processing Dec. 22, 1998
5639308 Plasma apparatus Jun. 17, 1997
5565036 Apparatus and method for igniting plasma in a process module Oct. 15, 1996
5563416 Processing apparatus using fast atom beam Oct. 8, 1996
5413663 Plasma processing apparatus May. 9, 1995
5368676 Plasma processing apparatus comprising electron supply chamber and high frequency electric field generation means Nov. 29, 1994
5342448 Apparatus for processing a sample using a charged beam and reactive gases Aug. 30, 1994
5328556 Wafer fabrication Jul. 12, 1994
4851097 Apparatus for repairing a pattern film Jul. 25, 1989











 
 
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