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Class Information
Number: 156/345.38
Name: Adhesive bonding and miscellaneous chemical manufacture > Differential fluid etching apparatus > With multiple gas energizing means associated with one workpiece etching
Description: Apparatus including a plurality of separate gas energizing means arranged to simultaneously or sequentially energize a gas to render it effective to conduct etching of a workpiece.

Patents under this class:
1 2 3

Patent Number Title Of Patent Date Issued
8653405 Method for operating a vacuum plasma process system Feb. 18, 2014
8635971 Tunable uniformity in a plasma processing system Jan. 28, 2014
8268118 Critical dimension reduction and roughness control Sep. 18, 2012
8262801 Vacuum processing method Sep. 11, 2012
8211324 Methods and arrangements for controlling plasma processing parameters Jul. 3, 2012
8142607 High density helicon plasma source for wide ribbon ion beam generation Mar. 27, 2012
8133347 Vacuum plasma generator Mar. 13, 2012
8021514 Remote plasma source for pre-treatment of substrates prior to deposition Sep. 20, 2011
7879184 Apparatuses, systems and methods for rapid cleaning of plasma confinement rings with minimal erosion of other chamber parts Feb. 1, 2011
7850819 Plasma reactor with high productivity Dec. 14, 2010
7824520 Plasma treatment apparatus Nov. 2, 2010
7789992 Neutral beam etching device for separating and accelerating plasma Sep. 7, 2010
7767054 Plasma processing apparatus Aug. 3, 2010
7758764 Methods and apparatus for substrate processing Jul. 20, 2010
7592564 Plasma generation and processing with multiple radiation sources Sep. 22, 2009
7586099 Vacuum plasma generator Sep. 8, 2009
7452443 Vacuum plasma generator Nov. 18, 2008
7444955 Apparatus for directing plasma flow to coat internal passageways Nov. 4, 2008
7430984 Method to drive spatially separate resonant structure with spatially distinct plasma secondaries using a single generator and switching elements Oct. 7, 2008
7264688 Plasma reactor apparatus with independent capacitive and toroidal plasma sources Sep. 4, 2007
7256134 Selective etching of carbon-doped low-k dielectrics Aug. 14, 2007
7227097 Plasma generation and processing with multiple radiation sources Jun. 5, 2007
7217337 Plasma process chamber and system May. 15, 2007
7186314 Plasma processor and plasma processing method Mar. 6, 2007
7166167 Laser CVD device and laser CVD method Jan. 23, 2007
7137354 Plasma immersion ion implantation apparatus including a plasma source having low dissociation and low minimum plasma voltage Nov. 21, 2006
7015415 Higher power density downstream plasma Mar. 21, 2006
6930292 Method of controlling the temperature of a specimen in or on a solid support member Aug. 16, 2005
6884317 Method and installation for etching a substrate Apr. 26, 2005
6882704 Radiation source for generating extreme ultraviolet radiation Apr. 19, 2005
6827870 Method and apparatus for etching and deposition using micro-plasmas Dec. 7, 2004
6815633 Inductively-coupled toroidal plasma source Nov. 9, 2004
6808592 High throughput plasma treatment system Oct. 26, 2004
6802933 Apparatus for performing self cleaning method of forming deep trenches in silicon substrates Oct. 12, 2004
6787010 Non-thermionic sputter material transport device, methods of use, and materials produced thereby Sep. 7, 2004
6783627 Reactor with remote plasma system and method of processing a semiconductor substrate Aug. 31, 2004
6764658 Plasma generator Jul. 20, 2004
6761796 Method and apparatus for micro-jet enabled, low-energy ion generation transport in plasma processing Jul. 13, 2004
6673197 Chemical plasma cathode Jan. 6, 2004
6623596 Plasma reactor having an inductive antenna coupling power through a parallel plate electrode Sep. 23, 2003
6610169 Semiconductor processing system and method Aug. 26, 2003
6503366 Chemical plasma cathode Jan. 7, 2003
6497803 Unbalanced plasma generating apparatus having cylindrical symmetry Dec. 24, 2002
6475334 Dry etching device and dry etching method Nov. 5, 2002
6432260 Inductively coupled ring-plasma source apparatus for processing gases and materials and method thereof Aug. 13, 2002
6427621 Plasma processing device and plasma processing method Aug. 6, 2002
6312554 Apparatus and method for controlling the ratio of reactive to non-reactive ions in a semiconductor wafer processing chamber Nov. 6, 2001
6308654 Inductively coupled parallel-plate plasma reactor with a conical dome Oct. 30, 2001
6263830 Microwave choke for remote plasma generator Jul. 24, 2001
6263831 Downstream plasma using oxygen gas mixtures Jul. 24, 2001

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