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Class Information
Number: 156/345.38
Name: Adhesive bonding and miscellaneous chemical manufacture > Differential fluid etching apparatus > With multiple gas energizing means associated with one workpiece etching
Description: Apparatus including a plurality of separate gas energizing means arranged to simultaneously or sequentially energize a gas to render it effective to conduct etching of a workpiece.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7592564 |
Plasma generation and processing with multiple radiation sources |
Sep. 22, 2009 |
| 7586099 |
Vacuum plasma generator |
Sep. 8, 2009 |
| 7452443 |
Vacuum plasma generator |
Nov. 18, 2008 |
| 7444955 |
Apparatus for directing plasma flow to coat internal passageways |
Nov. 4, 2008 |
| 7430984 |
Method to drive spatially separate resonant structure with spatially distinct plasma secondaries using a single generator and switching elements |
Oct. 7, 2008 |
| 7264688 |
Plasma reactor apparatus with independent capacitive and toroidal plasma sources |
Sep. 4, 2007 |
| 7256134 |
Selective etching of carbon-doped low-k dielectrics |
Aug. 14, 2007 |
| 7227097 |
Plasma generation and processing with multiple radiation sources |
Jun. 5, 2007 |
| 7217337 |
Plasma process chamber and system |
May. 15, 2007 |
| 7186314 |
Plasma processor and plasma processing method |
Mar. 6, 2007 |
| 7166167 |
Laser CVD device and laser CVD method |
Jan. 23, 2007 |
| 7137354 |
Plasma immersion ion implantation apparatus including a plasma source having low dissociation and low minimum plasma voltage |
Nov. 21, 2006 |
| 7015415 |
Higher power density downstream plasma |
Mar. 21, 2006 |
| 6930292 |
Method of controlling the temperature of a specimen in or on a solid support member |
Aug. 16, 2005 |
| 6884317 |
Method and installation for etching a substrate |
Apr. 26, 2005 |
| 6882704 |
Radiation source for generating extreme ultraviolet radiation |
Apr. 19, 2005 |
| 6827870 |
Method and apparatus for etching and deposition using micro-plasmas |
Dec. 7, 2004 |
| 6815633 |
Inductively-coupled toroidal plasma source |
Nov. 9, 2004 |
| 6808592 |
High throughput plasma treatment system |
Oct. 26, 2004 |
| 6802933 |
Apparatus for performing self cleaning method of forming deep trenches in silicon substrates |
Oct. 12, 2004 |
| 6787010 |
Non-thermionic sputter material transport device, methods of use, and materials produced thereby |
Sep. 7, 2004 |
| 6783627 |
Reactor with remote plasma system and method of processing a semiconductor substrate |
Aug. 31, 2004 |
| 6764658 |
Plasma generator |
Jul. 20, 2004 |
| 6761796 |
Method and apparatus for micro-jet enabled, low-energy ion generation transport in plasma processing |
Jul. 13, 2004 |
| 6673197 |
Chemical plasma cathode |
Jan. 6, 2004 |
| 6623596 |
Plasma reactor having an inductive antenna coupling power through a parallel plate electrode |
Sep. 23, 2003 |
| 6610169 |
Semiconductor processing system and method |
Aug. 26, 2003 |
| 6503366 |
Chemical plasma cathode |
Jan. 7, 2003 |
| 6497803 |
Unbalanced plasma generating apparatus having cylindrical symmetry |
Dec. 24, 2002 |
| 6475334 |
Dry etching device and dry etching method |
Nov. 5, 2002 |
| 6432260 |
Inductively coupled ring-plasma source apparatus for processing gases and materials and method thereof |
Aug. 13, 2002 |
| 6427621 |
Plasma processing device and plasma processing method |
Aug. 6, 2002 |
| 6312554 |
Apparatus and method for controlling the ratio of reactive to non-reactive ions in a semiconductor wafer processing chamber |
Nov. 6, 2001 |
| 6308654 |
Inductively coupled parallel-plate plasma reactor with a conical dome |
Oct. 30, 2001 |
| 6263831 |
Downstream plasma using oxygen gas mixtures |
Jul. 24, 2001 |
| 6263830 |
Microwave choke for remote plasma generator |
Jul. 24, 2001 |
| 6225745 |
Dual plasma source for plasma process chamber |
May. 1, 2001 |
| 6220201 |
High density plasma CVD reactor with combined inductive and capacitive coupling |
Apr. 24, 2001 |
| 6217704 |
Plasma processing apparatus |
Apr. 17, 2001 |
| 6095084 |
High density plasma process chamber |
Aug. 1, 2000 |
| 6095085 |
Photo-assisted remote plasma apparatus and method |
Aug. 1, 2000 |
| 5997686 |
Process for setting a working rate distribution in an etching or plasma CVD apparatus |
Dec. 7, 1999 |
| 5958141 |
Dry etching device |
Sep. 28, 1999 |
| 5916455 |
Method and apparatus for generating a low pressure plasma |
Jun. 29, 1999 |
| 5897844 |
Photon-enhanced neutral beam etcher and cleaner |
Apr. 27, 1999 |
| 5897713 |
Plasma generating apparatus |
Apr. 27, 1999 |
| 5865896 |
High density plasma CVD reactor with combined inductive and capacitive coupling |
Feb. 2, 1999 |
| 5863376 |
Temperature controlling method and apparatus for a plasma processing chamber |
Jan. 26, 1999 |
| 5800621 |
Plasma source for HDP-CVD chamber |
Sep. 1, 1998 |
| 5795831 |
Cold processes for cleaning and stripping photoresist from surfaces of semiconductor wafers |
Aug. 18, 1998 |
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