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Class Information
Number: 156/345.33
Name: Adhesive bonding and miscellaneous chemical manufacture > Differential fluid etching apparatus > With gas inlet structure (e.g., inlet nozzle, gas distributor)
Description: Apparatus including a structurally defined means located inside an etching chamber for the introduction and dispersal of an etchant gas into the body of the chamber.










Sub-classes under this class:

Class Number Class Name Patents
156/345.34 Showerhead-type 461


Patents under this class:
1 2 3 4 5 6 7 8 9 10 11

Patent Number Title Of Patent Date Issued
8702866 Showerhead electrode assembly with gas flow modification for extended electrode life Apr. 22, 2014
8702867 Gas distribution plate and substrate treating apparatus including the same Apr. 22, 2014
8679254 Vapor phase epitaxy apparatus of group III nitride semiconductor Mar. 25, 2014
8679255 Gas supply device, substrate processing apparatus and substrate processing method Mar. 25, 2014
8673080 Temperature controlled showerhead Mar. 18, 2014
8668776 Gas delivery apparatus and method for atomic layer deposition Mar. 11, 2014
8668775 Machine CVD shower head Mar. 11, 2014
8663424 Plasma processing apparatus and gas supply member support device Mar. 4, 2014
8652258 Substrate treatment device Feb. 18, 2014
8652296 Side gas injector for plasma reaction chamber Feb. 18, 2014
8636847 Chemical vapor deposition flow inlet elements and methods Jan. 28, 2014
8632634 Coating apparatus and coating method Jan. 21, 2014
8628616 Vapor-phase process apparatus, vapor-phase process method, and substrate Jan. 14, 2014
8628622 Gas driven rotation apparatus and method for forming crystalline layers Jan. 14, 2014
8623172 Gas flow path structure and substrate processing apparatus Jan. 7, 2014
8623142 Coating apparatus Jan. 7, 2014
8617347 Vacuum processing chambers incorporating a moveable flow equalizer Dec. 31, 2013
8617349 Showerhead assembly for plasma processing chamber Dec. 31, 2013
8617350 Linear plasma system Dec. 31, 2013
8608854 CVD device Dec. 17, 2013
8603292 Quartz window for a degas chamber Dec. 10, 2013
8597462 Movable chamber liner plasma confinement screen combination for plasma processing apparatuses Dec. 3, 2013
8591655 Apparatus for the preparation of film Nov. 26, 2013
8580076 Plasma apparatus, gas distribution assembly for a plasma apparatus and processes therewith Nov. 12, 2013
8574445 Method for generating hollow cathode plasma and method for treating large area substrate using hollow cathode plasma Nov. 5, 2013
8573154 Plasma film forming apparatus Nov. 5, 2013
8568553 Method and apparatus for photomask plasma etching Oct. 29, 2013
8568554 Movable gas introduction structure and substrate processing apparatus having same Oct. 29, 2013
8562742 Apparatus for radial delivery of gas to a chamber and methods of use thereof Oct. 22, 2013
8562743 Method and apparatus for atomic layer deposition Oct. 22, 2013
8562785 Gas distribution showerhead for inductively coupled plasma etch reactor Oct. 22, 2013
8552334 Adjustable gap capacitively coupled RF plasma reactor including lateral bellows and non-contact particle seal Oct. 8, 2013
8551288 Apparatus and method for removing a photoresist structure from a substrate Oct. 8, 2013
8551248 Showerhead for CVD depositions Oct. 8, 2013
8546270 Atomic layer deposition apparatus Oct. 1, 2013
8539908 Film forming apparatus, film forming method and storage medium Sep. 24, 2013
8535443 Gas line weldment design and process for CVD aluminum Sep. 17, 2013
8536071 Gasket with positioning feature for clamped monolithic showerhead electrode Sep. 17, 2013
8529730 Plasma processing apparatus Sep. 10, 2013
8529729 Plasma processing chamber component having adaptive thermal conductor Sep. 10, 2013
8529701 Substrate processing apparatus Sep. 10, 2013
8528498 Integrated steerability array arrangement for minimizing non-uniformity Sep. 10, 2013
8518210 Purging of porogen from UV cure chamber Aug. 27, 2013
8512472 Method and apparatus to enhance process gas temperature in a CVD reactor Aug. 20, 2013
8512509 Plasma reactor gas distribution plate with radially distributed path splitting manifold Aug. 20, 2013
8506754 Cross flow CVD reactor Aug. 13, 2013
8506713 Film deposition apparatus and film deposition method Aug. 13, 2013
8506710 Apparatus for fabricating semiconductor device Aug. 13, 2013
8500952 Plasma confinement rings having reduced polymer deposition characteristics Aug. 6, 2013
8491720 HVPE precursor source hardware Jul. 23, 2013

1 2 3 4 5 6 7 8 9 10 11










 
 
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